Patents by Inventor Kunihiko Aoyagi

Kunihiko Aoyagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9450161
    Abstract: A method of manufacturing a light-emitting device, includes: disposing a first conductive paste on a substrate and sintering the first conductive paste to forma first bonding layer; disposing a second conductive paste on a semiconductor light-emitting element and sintering the second conductive paste to form a second bonding layer; polishing surfaces of the first bonding layer and the second bonding layer; and causing a third conductive paste to intervene between the first bonding layer and the second bonding layer and sintering the third conductive paste to bond the first bonding layer and the second bonding layer together.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: September 20, 2016
    Assignee: Seiko Epson Corporation
    Inventors: Kunihiko Aoyagi, Shuichi Tanaka
  • Publication number: 20150280090
    Abstract: A method of manufacturing a light-emitting device, includes: disposing a first conductive paste on a substrate and sintering the first conductive paste to forma first bonding layer; disposing a second conductive paste on a semiconductor light-emitting element and sintering the second conductive paste to form a second bonding layer; polishing surfaces of the first bonding layer and the second bonding layer; and causing a third conductive paste to intervene between the first bonding layer and the second bonding layer and sintering the third conductive paste to bond the first bonding layer and the second bonding layer together.
    Type: Application
    Filed: March 25, 2015
    Publication date: October 1, 2015
    Inventors: Kunihiko AOYAGI, Shuichi TANAKA
  • Publication number: 20110311737
    Abstract: A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a piezoelectric body 11, a vacuum vapor deposition device 20 that vacuum-deposits at least two substances A and B on a surface of the surface acoustic wave device, and a high-frequency application device 30 that applies a high-frequency voltage between the electrodes of the surface acoustic wave device. In the state where a standing wave of surface acoustic waves is generated on the surface of the surface acoustic wave device by applying the high-frequency voltage, a plurality of thin film layers are formed, and a minute-structure is vapor-deposited at a specific position of the standing wave.
    Type: Application
    Filed: February 4, 2010
    Publication date: December 22, 2011
    Applicant: IHI CORPORATION
    Inventors: Yukichi Shigeta, Kunihiko Aoyagi, Hiroyuki Nose