Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. Apart of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. Apart of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. A part of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. A part of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device (10) has a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a transparent conductive material and the like. In addition, the second conductive film (130) that constitutes the joining structure is constituted by a metal material. A transition region, in which the transparent conductive material and the metal material are mixed, exists between the first conductive film (110) and the second conductive film (130). The transparent conductive material includes, for example, a conductive polymer.

Abstract: An optical device (10) has a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a transparent conductive material and the like. In addition, the second conductive film (130) that constitutes the joining structure is constituted by a metal material. A transition region, in which the transparent conductive material and the metal material are mixed, exists between the first conductive film (110) and the second conductive film (130). The transparent conductive material includes, for example, a conductive polymer.

Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. A part of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110), which constitutes the joining structure, is constituted by a transparent conductive material and the like. The second conductive film (130), which constitutes the joining structure, is constituted by a metal material. A dispersing agent, which is constituted by a material different from the transparent conductive material, exists at a portion of the first conductive film (110) which is located at the periphery of the second conductive film (130).

Abstract: An organic EL element (10) includes a first electrode (110), an organic layer (120), and a second electrode (130). The organic layer (120) is located between the first electrode (110) and the second electrode (130). The second electrode (130) includes Ga in the vicinity of an interface with the organic layer (120). The second electrode (130) includes, for example, a Ga-containing layer (132) and a conductive layer (134). In the Ga-containing layer (132), an element having a highest content rate is Ga. The Ga-containing layer (132) is, for example, a thin Ga layer.

Abstract: An organic EL element (10) includes a first electrode (110), an organic layer (120), and a second electrode (130). The organic layer (120) is located between the first electrode (110) and the second electrode (130). The second electrode (130) includes Ga in the vicinity of an interface with the organic layer (120). The second electrode (130) includes, for example, a Ga-containing layer (132) and a conductive layer (134). In the Ga-containing layer (132), an element having a highest content rate is Ga. The Ga-containing layer (132) is, for example, a thin Ga layer.

Abstract: An optical device (10) includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a conductive material. The second conductive film (130) that constitutes the joining structure is constituted by a metal material. Apart of the second conductive film (130) comes into contact with the first conductive film (110). A plurality of concave portions are provided in a contact surface of the second conductive film (130) which comes into contact with the first conductive film (110). The contact surface has a surface roughness greater than a surface roughness of a non-contact surface of the second conductive film (130) which does not come into contact with the first conductive film (110).

Abstract: An optical device includes a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110), which constitutes the joining structure, is constituted by a transparent conductive material and the like. The second conductive film (130), which constitutes the joining structure, is constituted by a metal material. A dispersing agent, which is constituted by a material different from the transparent conductive material, exists at a portion of the first conductive film (110) which is located at the periphery of the second conductive film (130).

Abstract: An optical device (10) has a joining structure in which a first conductive film (110) and a second conductive film (130) are joined to each other. The first conductive film (110) that constitutes the joining structure is constituted by a transparent conductive material and the like. In addition, the second conductive film (130) that constitutes the joining structure is constituted by a metal material. A transition region, in which the transparent conductive material and the metal material are mixed, exists between the first conductive film (110) and the second conductive film (130). The transparent conductive material includes, for example, a conductive polymer.

Abstract: An organic EL panel and a method of forming the same, in which a bottom electrode of an organic EL device is flattened at the surface so that organic layers deposited thereon have uniform thicknesses, thereby avoiding the occurrence of leak currents and allowing favorable luminescence characteristics. The organic EL panel has an organic EL device formed on a substrate, the device comprising the bottom electrode, the organic layers including at least an organic luminescent layer, and a top electrode. The bottom electrode has an etched surface obtained by chemically etching a polished surface of an electrode material film. The organic layers are formed on the etched surface.

Abstract: A laminate for forming a substrate with wires in which a silver type material is used for a conductor layer and the layer is covered with a conductive protection layer for protection, the laminate for forming a substrate with wires exhibiting an extremely low contact resistance between the conductive protection layer and a cathode superposed thereon, is presented. A laminate for forming a substrate with wires, which comprises a substrate, a conductor layer comprising silver or a silver alloy, formed on the substrate, and a conductive protection layer comprising indium zinc oxide, formed on the conductor layer to cover the conductor layer, wherein the conductive protection layer is a conductive protection layer formed by sputtering in an atmosphere wherein the oxidizing gas content in the sputtering gas is not more than 1.5 vol %.

Abstract: A laminate for forming a substrate with wires in which a silver type material is used for a conductor layer and the layer is covered with a conductive protection layer for protection, the laminate for forming a substrate with wires exhibiting an extremely low contact resistance between the conductive protection layer and a cathode superposed thereon, is presented. A laminate for forming a substrate with wires, which comprises a substrate, a conductor layer comprising silver or a silver alloy, formed on the substrate, and a conductive protection layer comprising indium zinc oxide, formed on the conductor layer to cover the conductor layer, wherein the conductive protection layer is a conductive protection layer formed by sputtering in an atmosphere wherein the oxidizing gas content in the sputtering gas is not more than 1.5 vol %.

Abstract: A first electrode is formed above a substrate, organic material layers are stacked above the first electrode, and a second electrode is formed above the organic material layers. Among the organic material layers, at least two organic material layers having interfaces which electrons or holes traverse are formed by layers which are heat-treated at a temperature that is equal to or higher than the glass transition points of materials respectively constituting the organic material layers and equal to or lower than the melting points of the materials.

Abstract: An organic EL display apparatus which can improve the reliability thereof, by avoiding a leak current which occurs after an operating time, without reducing the product yield. The organic EL display apparatus is comprised of an organic EL panel section, and a driving section which has a reverse voltage restriction unit (means for restricting a reverse voltage) for restricting a reverse voltage which is applied when organic EL devices are not lighted. When a breakdown voltage with respect to a preset thickness do of the organic material layer has been Vb, the reverse voltage restriction unit will not only set the reverse voltage Vm (to be applied during a non-lighting period) to Vm<(½)·Vb, but also restrict the continuous applying time of this reverse voltage Vm within a preset period.

Abstract: An organic EL panel and a method of forming the same, in which a bottom electrode of an organic EL device is flattened at the surface so that organic layers deposited thereon have uniform thicknesses, thereby avoiding the occurrence of leak currents and allowing favorable luminescence characteristics. The organic EL panel has an organic EL device formed on a substrate, the device comprising the bottom electrode, the organic layers including at least an organic luminescent layer, and a top electrode. The bottom electrode has an etched surface obtained by chemically etching a polished surface of an electrode material film. The organic layers are formed on the etched surface.

Abstract: An organic EL display apparatus which can improve the reliability thereof, by avoiding a leak current which occurs after an operating time, without reducing the product yield. The organic EL display apparatus is comprised of an organic EL panel section, and a driving section which has a reverse voltage restriction unit (means for restricting a reverse voltage) for restricting a reverse voltage which is applied when organic EL devices are not lighted. When a breakdown voltage with respect to a preset thickness do of the organic material layer has been Vb, the reverse voltage restriction unit will not only set the reverse voltage Vm (to be applied during a non-lighting period) to Vm<(½)·Vb, but also restrict the continuous applying time of this reverse voltage Vm within a preset period.