Patents by Inventor Kunio Ogasawara

Kunio Ogasawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240081770
    Abstract: A medical image processing apparatus according to an embodiment includes processing circuitry. The processing circuitry acquires a plurality of projection data based on an output signal from an X-ray detector that rotates around a subject, performs reconstruction filter processing on the plurality of acquired projection data, the reconstruction filter processing being included in reconstruction regarding the plurality of projection data, generates correction information on a sensitivity difference area formed in the plurality of projection data due to differences in sensitivity of the X-ray detector, on the basis of a processing result of the reconstruction filter processing, performs correction processing on the plurality of projection data on the basis of the correction information, and performs reconstruction processing including the reconstruction filter processing on the plurality of projection data subjected to the correction processing.
    Type: Application
    Filed: September 1, 2023
    Publication date: March 14, 2024
    Applicant: CANON MEDICAL SYSTEMS CORPORATION
    Inventors: Jumpei OGASAWARA, Hajime YOSHIDA, Yasuto HAYATSU, Kunio SHIRAISHI
  • Patent number: 8288804
    Abstract: Provided is a carbon nanotube field effect transistor manufacturing method wherein carbon nanotube field effect transistors having excellent stable electric conduction property are manufactured with excellent reproducibility. After arranging carbon nanotubes to be a channel on a substrate, the carbon nanotubes are covered with an insulating protection film. Then, a source electrode and a drain electrode are formed on the insulating protection film. At this time, a contact hole is formed on the protection film, and the carbon nanotubes are connected with the source electrode and the drain electrode. Then, a wiring protection film, a conductive film and a plasma CVD film are sequentially formed on the insulating protection film, the source electrode and the drain electrode. In the field effect transistor thus manufactured, since the carbon nanotubes to be the channel are not contaminated and not damaged, excellent stable electric conductive property is exhibited.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: October 16, 2012
    Assignee: Mitsumi Electric Co., Ltd.
    Inventors: Hiroaki Kikuchi, Osamu Takahashi, Katsunori Kondo, Tomoaki Yamabayashi, Kunio Ogasawara, Tadashi Ishigaki, Yutaka Hienuki, Motonori Nakamura, Agus Subagyo
  • Patent number: 8173824
    Abstract: There are provided a novel process for producing [{(5Z,7E)-(1S,3R,20S)-1,3-dihydroxy-9,10-secopregna-5,7,10(19),16-tetraen-20-yl}oxy]-N-(2,2,3,3,3-pentafluoropropyl)acetamide, which process is shown in the following reaction scheme: an intermediate useful for carrying out the process, and a process for producing the intermediate.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: May 8, 2012
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Kunio Ogasawara, Takashi Emura, Akira Kawase, Koji Takano, Keisuke Yamamoto, Yoshiaki Kato
  • Publication number: 20110062419
    Abstract: Provided is a carbon nanotube field effect transistor manufacturing method wherein carbon nanotube field effect transistors having excellent stable electric conduction property are manufactured with excellent reproducibility. After arranging carbon nanotubes to be a channel on a substrate, the carbon nanotubes are covered with an insulating protection film. Then, a source electrode and a drain electrode are formed on the insulating protection film. At this time, a contact hole is formed on the protection film, and the carbon nanotubes are connected with the source electrode and the drain electrode. Then, a wiring protection film, a conductive film and a plasma CVD film are sequentially formed on the insulating protection film, the source electrode and the drain electrode. In the field effect transistor thus manufactured, since the carbon nanotubes to be the channel are not contaminated and not damaged, excellent stable electric conductive property is exhibited.
    Type: Application
    Filed: May 22, 2009
    Publication date: March 17, 2011
    Inventors: Hiroaki Kikuchi, Osamu Takahashi, Katsunori Kondo, Tomoaki Yamabayashi, Kunio Ogasawara, Tadashi Ishigaki, Yutaka Hienuki, Motonori Nakamura, Agus Subagyo
  • Publication number: 20100217020
    Abstract: There are provided a novel process for producing [{(5Z,7E)-(1S,3R,20S)-1,3-dihydroxy-9,10-secopregna-5,7,10(19),16-tetraen-20-yl}oxy]-N-(2,2,3,3,3-pentafluoropropyl)acetamide, which process is shown in the following reaction scheme: an intermediate useful for carrying out the process, and a process for producing the intermediate.
    Type: Application
    Filed: December 4, 2006
    Publication date: August 26, 2010
    Inventors: Kunio Ogasawara, Takashi Emura, Akira Kawase, Koji Takano, Keisuke Yamamoto, Yoshiaki Kato
  • Patent number: 7510933
    Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: March 31, 2009
    Assignee: Renesas Technology Corp.
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Publication number: 20070287241
    Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Application
    Filed: May 23, 2007
    Publication date: December 13, 2007
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Publication number: 20070232821
    Abstract: A composition containing 100 parts by mass of a siloxane compound having —HSiRO— (wherein R is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms or a phenoxy group) and 0.0001 to 1 part by mass of at least one phenol compound of general formula (1) or (2) as a stabilizer. wherein a and b are each an integer of 0 to 4; m is 0 or 1; p and q are each 1 or 2; R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms; X1 and X2 each represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogen atom; Y is an alkanediyl group having 1 to 4 carbon atoms; and a plurality of R1s, R2s, R3s, R4s, X1s, X2s or Ys, where present per molecule, may be the same or different.
    Type: Application
    Filed: December 21, 2005
    Publication date: October 4, 2007
    Inventors: Kunio Ogasawara, Kazuhisa Onozawa, Hiroki Sato, Takashi Higashino
  • Patent number: 7253011
    Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: August 7, 2007
    Assignees: Renesas Technology Corp., Hitachi Hokkai Semiconductor, Ltd.
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Patent number: 7102018
    Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: September 5, 2006
    Assignee: Chisso Corporation
    Inventors: Naoyuki Yoshida, Kunio Ogasawara
  • Patent number: 7053224
    Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: May 30, 2006
    Assignee: Chisso Corporation
    Inventors: Naoyuki Yoshida, Kunio Ogasawara
  • Patent number: 7053225
    Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: May 30, 2006
    Assignee: Chisso Corporation
    Inventors: Naoyuki Yoshida, Kunio Ogasawara
  • Patent number: 7015119
    Abstract: A method of fabrication of a semiconductor integrated circuit device, calls for disposing, in an ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, it is possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Grant
    Filed: November 26, 2004
    Date of Patent: March 21, 2006
    Assignees: Renesas Technology Corp., Hitachi Hokkai Semiconductor, Ltd.
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Patent number: 6949553
    Abstract: The present invention relates to aliphatic compounds of the formula I, or stereoisomers thereof, or their pharmaceutically acceptable salts: wherein A represents an optionally substituted CH3CnH(2n-2m)— (wherein n denotes an integer of 4 to 22, and m represents an unsaturation number which is an integer of 0 to 7), l represents an integer of 0 to 10, s represents 0 or 1, provided that when s is 0, p+q=4 or 5, but when s is 1, p+q=3 or 4, and in each case, either p or q is an integer of 1 or more, R represents an alkyl group having 1 to 10 carbon atoms which may be straight-chain or branched-chain, and RA represents hydrogen or an alkyl group having 1 to 10 carbon atoms which may be straight-chain or branched-chain, and their use in suppression of platelet aggregation, in suppression of inflammation, and in prevention and treatment of circulatory diseases.
    Type: Grant
    Filed: June 18, 2002
    Date of Patent: September 27, 2005
    Assignee: Maruha Corporation
    Inventors: Tadakazu Tamai, Kazuyoshi Yoshikai, Masazumi Nishikawa, Kunio Ogasawara, Itsuki Murota
  • Publication number: 20050142674
    Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Application
    Filed: February 22, 2005
    Publication date: June 30, 2005
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Publication number: 20050087493
    Abstract: A method of fabrication of a semiconductor integrated circuit device, calls for disposing, in an ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, it is possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Application
    Filed: November 26, 2004
    Publication date: April 28, 2005
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Publication number: 20040235248
    Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.
    Type: Application
    Filed: June 17, 2004
    Publication date: November 25, 2004
    Inventors: Osamu Takahashi, Kunio Ogasawara
  • Publication number: 20040162435
    Abstract: The present invention relates to aliphatic compounds of the formula I, or stereoisomers thereof, or their pharmaceutically acceptable salts: 1
    Type: Application
    Filed: December 17, 2003
    Publication date: August 19, 2004
    Inventors: Tadakazu Tamai, Kazuyoshi Yoshikai, Masazumi Nishikawa, Kunio Ogasawara, Itsuki Murota
  • Patent number: 6642424
    Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: November 4, 2003
    Assignee: Chisso Corporation
    Inventors: Naoyuki Yoshida, Kunio Ogasawara
  • Publication number: 20030175943
    Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.
    Type: Application
    Filed: February 21, 2003
    Publication date: September 18, 2003
    Applicant: CHISSO CORPORATION
    Inventors: Naoyuki Yoshida, Kunio Ogasawara