Patents by Inventor Kunio Ogasawara
Kunio Ogasawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240081770Abstract: A medical image processing apparatus according to an embodiment includes processing circuitry. The processing circuitry acquires a plurality of projection data based on an output signal from an X-ray detector that rotates around a subject, performs reconstruction filter processing on the plurality of acquired projection data, the reconstruction filter processing being included in reconstruction regarding the plurality of projection data, generates correction information on a sensitivity difference area formed in the plurality of projection data due to differences in sensitivity of the X-ray detector, on the basis of a processing result of the reconstruction filter processing, performs correction processing on the plurality of projection data on the basis of the correction information, and performs reconstruction processing including the reconstruction filter processing on the plurality of projection data subjected to the correction processing.Type: ApplicationFiled: September 1, 2023Publication date: March 14, 2024Applicant: CANON MEDICAL SYSTEMS CORPORATIONInventors: Jumpei OGASAWARA, Hajime YOSHIDA, Yasuto HAYATSU, Kunio SHIRAISHI
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Patent number: 8288804Abstract: Provided is a carbon nanotube field effect transistor manufacturing method wherein carbon nanotube field effect transistors having excellent stable electric conduction property are manufactured with excellent reproducibility. After arranging carbon nanotubes to be a channel on a substrate, the carbon nanotubes are covered with an insulating protection film. Then, a source electrode and a drain electrode are formed on the insulating protection film. At this time, a contact hole is formed on the protection film, and the carbon nanotubes are connected with the source electrode and the drain electrode. Then, a wiring protection film, a conductive film and a plasma CVD film are sequentially formed on the insulating protection film, the source electrode and the drain electrode. In the field effect transistor thus manufactured, since the carbon nanotubes to be the channel are not contaminated and not damaged, excellent stable electric conductive property is exhibited.Type: GrantFiled: May 22, 2009Date of Patent: October 16, 2012Assignee: Mitsumi Electric Co., Ltd.Inventors: Hiroaki Kikuchi, Osamu Takahashi, Katsunori Kondo, Tomoaki Yamabayashi, Kunio Ogasawara, Tadashi Ishigaki, Yutaka Hienuki, Motonori Nakamura, Agus Subagyo
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Patent number: 8173824Abstract: There are provided a novel process for producing [{(5Z,7E)-(1S,3R,20S)-1,3-dihydroxy-9,10-secopregna-5,7,10(19),16-tetraen-20-yl}oxy]-N-(2,2,3,3,3-pentafluoropropyl)acetamide, which process is shown in the following reaction scheme: an intermediate useful for carrying out the process, and a process for producing the intermediate.Type: GrantFiled: December 4, 2006Date of Patent: May 8, 2012Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Kunio Ogasawara, Takashi Emura, Akira Kawase, Koji Takano, Keisuke Yamamoto, Yoshiaki Kato
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Publication number: 20110062419Abstract: Provided is a carbon nanotube field effect transistor manufacturing method wherein carbon nanotube field effect transistors having excellent stable electric conduction property are manufactured with excellent reproducibility. After arranging carbon nanotubes to be a channel on a substrate, the carbon nanotubes are covered with an insulating protection film. Then, a source electrode and a drain electrode are formed on the insulating protection film. At this time, a contact hole is formed on the protection film, and the carbon nanotubes are connected with the source electrode and the drain electrode. Then, a wiring protection film, a conductive film and a plasma CVD film are sequentially formed on the insulating protection film, the source electrode and the drain electrode. In the field effect transistor thus manufactured, since the carbon nanotubes to be the channel are not contaminated and not damaged, excellent stable electric conductive property is exhibited.Type: ApplicationFiled: May 22, 2009Publication date: March 17, 2011Inventors: Hiroaki Kikuchi, Osamu Takahashi, Katsunori Kondo, Tomoaki Yamabayashi, Kunio Ogasawara, Tadashi Ishigaki, Yutaka Hienuki, Motonori Nakamura, Agus Subagyo
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Publication number: 20100217020Abstract: There are provided a novel process for producing [{(5Z,7E)-(1S,3R,20S)-1,3-dihydroxy-9,10-secopregna-5,7,10(19),16-tetraen-20-yl}oxy]-N-(2,2,3,3,3-pentafluoropropyl)acetamide, which process is shown in the following reaction scheme: an intermediate useful for carrying out the process, and a process for producing the intermediate.Type: ApplicationFiled: December 4, 2006Publication date: August 26, 2010Inventors: Kunio Ogasawara, Takashi Emura, Akira Kawase, Koji Takano, Keisuke Yamamoto, Yoshiaki Kato
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Patent number: 7510933Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.Type: GrantFiled: May 23, 2007Date of Patent: March 31, 2009Assignee: Renesas Technology Corp.Inventors: Osamu Takahashi, Kunio Ogasawara
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Publication number: 20070287241Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.Type: ApplicationFiled: May 23, 2007Publication date: December 13, 2007Inventors: Osamu Takahashi, Kunio Ogasawara
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Publication number: 20070232821Abstract: A composition containing 100 parts by mass of a siloxane compound having —HSiRO— (wherein R is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms or a phenoxy group) and 0.0001 to 1 part by mass of at least one phenol compound of general formula (1) or (2) as a stabilizer. wherein a and b are each an integer of 0 to 4; m is 0 or 1; p and q are each 1 or 2; R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms; X1 and X2 each represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogen atom; Y is an alkanediyl group having 1 to 4 carbon atoms; and a plurality of R1s, R2s, R3s, R4s, X1s, X2s or Ys, where present per molecule, may be the same or different.Type: ApplicationFiled: December 21, 2005Publication date: October 4, 2007Inventors: Kunio Ogasawara, Kazuhisa Onozawa, Hiroki Sato, Takashi Higashino
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Patent number: 7253011Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.Type: GrantFiled: February 22, 2005Date of Patent: August 7, 2007Assignees: Renesas Technology Corp., Hitachi Hokkai Semiconductor, Ltd.Inventors: Osamu Takahashi, Kunio Ogasawara
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Patent number: 7102018Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.Type: GrantFiled: February 21, 2003Date of Patent: September 5, 2006Assignee: Chisso CorporationInventors: Naoyuki Yoshida, Kunio Ogasawara
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Patent number: 7053224Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.Type: GrantFiled: February 21, 2003Date of Patent: May 30, 2006Assignee: Chisso CorporationInventors: Naoyuki Yoshida, Kunio Ogasawara
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Patent number: 7053225Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.Type: GrantFiled: February 21, 2003Date of Patent: May 30, 2006Assignee: Chisso CorporationInventors: Naoyuki Yoshida, Kunio Ogasawara
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Patent number: 7015119Abstract: A method of fabrication of a semiconductor integrated circuit device, calls for disposing, in an ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, it is possible to prevent run-off of ionized amine into the ultrapure water.Type: GrantFiled: November 26, 2004Date of Patent: March 21, 2006Assignees: Renesas Technology Corp., Hitachi Hokkai Semiconductor, Ltd.Inventors: Osamu Takahashi, Kunio Ogasawara
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Patent number: 6949553Abstract: The present invention relates to aliphatic compounds of the formula I, or stereoisomers thereof, or their pharmaceutically acceptable salts: wherein A represents an optionally substituted CH3CnH(2n-2m)— (wherein n denotes an integer of 4 to 22, and m represents an unsaturation number which is an integer of 0 to 7), l represents an integer of 0 to 10, s represents 0 or 1, provided that when s is 0, p+q=4 or 5, but when s is 1, p+q=3 or 4, and in each case, either p or q is an integer of 1 or more, R represents an alkyl group having 1 to 10 carbon atoms which may be straight-chain or branched-chain, and RA represents hydrogen or an alkyl group having 1 to 10 carbon atoms which may be straight-chain or branched-chain, and their use in suppression of platelet aggregation, in suppression of inflammation, and in prevention and treatment of circulatory diseases.Type: GrantFiled: June 18, 2002Date of Patent: September 27, 2005Assignee: Maruha CorporationInventors: Tadakazu Tamai, Kazuyoshi Yoshikai, Masazumi Nishikawa, Kunio Ogasawara, Itsuki Murota
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Publication number: 20050142674Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.Type: ApplicationFiled: February 22, 2005Publication date: June 30, 2005Inventors: Osamu Takahashi, Kunio Ogasawara
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Publication number: 20050087493Abstract: A method of fabrication of a semiconductor integrated circuit device, calls for disposing, in an ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, it is possible to prevent run-off of ionized amine into the ultrapure water.Type: ApplicationFiled: November 26, 2004Publication date: April 28, 2005Inventors: Osamu Takahashi, Kunio Ogasawara
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Publication number: 20040235248Abstract: Provided is a fabrication method of a semiconductor integrated circuit device, which comprises disposing, in a ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fiber membranes composed of a polysulfone membrane or polyimide membrane, bonding the plurality of hollow fiber membranes at end portions thereof by hot welding, and by this hot welding, simultaneously adhering the hollow fiber membranes to the body. Upon preparation of ultrapure water to be used for the fabrication of the semiconductor integrated circuit device, the present invention makes it possible to prevent run-off of ionized amine into the ultrapure water.Type: ApplicationFiled: June 17, 2004Publication date: November 25, 2004Inventors: Osamu Takahashi, Kunio Ogasawara
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Publication number: 20040162435Abstract: The present invention relates to aliphatic compounds of the formula I, or stereoisomers thereof, or their pharmaceutically acceptable salts: 1Type: ApplicationFiled: December 17, 2003Publication date: August 19, 2004Inventors: Tadakazu Tamai, Kazuyoshi Yoshikai, Masazumi Nishikawa, Kunio Ogasawara, Itsuki Murota
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Patent number: 6642424Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6]dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.Type: GrantFiled: May 7, 2001Date of Patent: November 4, 2003Assignee: Chisso CorporationInventors: Naoyuki Yoshida, Kunio Ogasawara
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Publication number: 20030175943Abstract: Intermediate compounds, including 2-(t-butyldimethylsilyloxymethyl)-3,4-[(dimethylmethylene)dioxy]-5-hydroxy-tricyclo[5.2.1.02,6dec-8-ene, which are useful for the synthesis of neplanocin A having strong antitumor activity. Improved processes for the preparation of neplanocin A, starting from optically active 2-hydroxymethyl-5-hydroxy-tricyclo[5.2.1.02,6]deca-3,8-diene and via a key step comprising a retro-Diels-Alder reaction of the above intermediate.Type: ApplicationFiled: February 21, 2003Publication date: September 18, 2003Applicant: CHISSO CORPORATIONInventors: Naoyuki Yoshida, Kunio Ogasawara