Abstract: An object of the present invention is to prevent a device portion from being electrostatically charged with the use of the high resistivity film, and at the same time prevent a leak current passing the device portion due to an existing high resistivity film, in an electron source with the use of a surface-conduction electron-emitting device. This process for manufacturing the electron-emitting device comprises the steps of: forming an electroconductive thin film 4 astride device electrodes; forming the high resistivity film 7 in a region except the electroconductive thin film 4 and a perimeter thereof; subjecting the electroconductive thin film 4 to forming processing, to form a fissure 5 therein; and depositing a carbon film 6 inside the fissure 5 and in a region reaching the high resistivity film 7 from the edge of the fissure 5, by applying voltage between device electrodes 2 and 3 under an atmosphere containing a carbon compound.

Abstract: An electron source substrate including: a substrate; an electron-emitting device having a pair of device electrodes locating on the substrate and an electroconductive thin film which is provided between the device electrodes and has an electron-emitting region; and an antistatic film which is come into contact with at least the pair of device electrodes and covers over an exposed surface of the substrate, wherein a leakage current flowing between the device electrodes in a non-driving mode at a low voltage is suppressed. A high-impedance portion which obstructs the current caused across the pair of device electrodes through the antistatic film is provided in the antistatic film.

Abstract: An object of the present invention is to prevent a device portion from being electrostatically charged with the use of the high resistivity film, and at the same time prevent a leak current passing the device portion due to an existing high resistivity film, in an electron source with the use of a surface-conduction electron-emitting device. This process for manufacturing the electron-emitting device comprises the steps of: forming an electroconductive thin film 4 astride device electrodes; forming the high resistivity film 7 in a region except the electroconductive thin film 4 and a perimeter thereof; subjecting the electroconductive thin film 4 to forming processing, to form a fissure 5 therein; and depositing a carbon film 6 inside the fissure 5 and in a region reaching the high resistivity film 7 from the edge of the fissure 5, by applying voltage between device electrodes 2 and 3 under an atmosphere containing a carbon compound.

Abstract: An electron source substrate including: a substrate; an electron-emitting device having a pair of device electrodes locating on the substrate and an electroconductive thin film which is provided between the device electrodes and has an electron-emitting region; and an antistatic film which is come into contact with at least the pair of device electrodes and covers over an exposed surface of the substrate, wherein a leakage current flowing between the device electrodes in a non-driving mode at a low voltage is suppressed. A high-impedance portion which obstructs the current caused across the pair of device electrodes through the antistatic film is provided in the antistatic film.

Abstract: A drainage water pumping system. A number of drainage pumps are positioned at two different levels. Drainage water flowing into a drainage water pumping system from an underground inflow main pipeline is pumped to a discharge destination. Preferably the drainage pumps installed at the lower installation level have a high pump head and a small capacity, while the drainage pumps installed at the higher installation level have a low pump head and a large capacity. The drainage pumps can be in a circular arrangement with a congregated delivery pipeline installed lengthwise at the center of the circular arrangement and having each of the drainage pumps connected to it.

Abstract: An underground water channel is provided in an underground of a large depth, and rain water and the like flow into this underground channel from flood control channels, conduits and rivers through vertical shafts. A pump well of a pump station is connected to a downstream end of the underground channel, and water flowing into the pump well is discharged by a pump to a discharge tank. The pump is disposed generally at a medium water level of the underground channel, and a lowest water level L.W.L enabling draining is the medium water level of the underground channel. In an open channel flow operation of an open channel-closed channel mixed flow operation, water level of the underground channel is maintained at the lowest water level L.W.L, so that the underground channel is in an open channel condition.

Abstract: A process for producing an optical recording medium is disclosed which has a substrate and a recording film and an inorganic dielectric film, which are superposed on said substrate. The inorganic dielectric film is formed using a plasma processing device including a microwave guide means provided with an endless ring waveguide.

Abstract: An underground water channel is provided in an underground of a large depth, and rain water and the like flow into this underground channel from flood control channels, conduits and rivers through vertical shafts. A pump well of a pump station is connected to a downstream end of the underground channel, and water flowing into the pump well is discharged by a pump to a discharge tank. The pump is disposed generally at a medium water level of the underground channel, and a lowest water level L.W.L enabling draining is the medium water level of the underground channel. In an open channel flow operation of an open channel-closed channel mixed flow operation, water level of the underground channel is maintained at the lowest water level L.W.L, so that the underground channel is in an open channel condition.

Abstract: Disclosed is a bearing unit which can be used in a drainage pump operated without supply of clean water or a hydraulic pump, which exhibits excellent wear resistance against water containing earth and sand and satisfactory assembling facility, and a method of manufacturing the bearing unit.The contact surface of a bearing made of stainless steel and/or that of a sleeve is applied with a sprayed coating, the main component of which is WC, and which contains one or more elements selected from a group consisting of nickel, chromium and cobalt as a binder material thereof, or a sprayed coating, the main component of which is Cr.sub.3 C.sub.2, and which contains NiCr as a binder material, after the sprayed coating has been formed, heating at from 300.degree. C. to 550.degree. C. is performed for one hour or longer so that hardness and wear resistance equivalent to those of a WC-12% sintered article is attained.

Abstract: A river management system for controllably operating devices of management facilities installed at pluralities of rivers and waterways to manage water volumes in a river network including the pluralities of rivers and waterways.

Abstract: In a drainage pump station, a driving machine has a capacity greater than a shaft power necessary for no-discharge operation of a pump, and during severe flooding the pump is operated at an overload exceeding its design capacity. During maintenance operation water is fed from a river on the delivery side of the pump station into the station. When an inflow of rainwater into the pump station is great the pump is operated at the necessary capacity, when it becomes small the water level is kept above a rated value, and when the inflow rate is zero the pump discharge is increased to a capacity at which sediment can be discharged. A suction blower is disposed at the top of a suction sump and interstage valves are disposed in entrances of vertical shafts to effect efficient ventilation of the underground waterway. A feed channel is operated as a pressure channel and the pump is of variable capacity and the water level in the underground waterway is controlled to be constant.

Abstract: A plural drainage pumps PH are disposed on the high floor gradation state at the circular shape. A plural drainage pumps PL are disposed on the low floor gradation state at the circular shape. The drainage pump PH disposed on the high floor gradation is installed at the high level. The drainage pump PH is set one having the low pump head and the large capacity in comparison with those of the drainage pump PL disposed on the low floor gradation. An outer shape of an underground pump construction building is formed a circular cone shape spreading toward an upper portion. The discharge water power can be reduced and the construction area for the underground pump construction building can be reduced and further the engineering working amount such as a digging working at the underground can be lessen.

Abstract: In a system where the same alarm is held and displayed in different apparatuses, alarm information held in either an alarm detection apparatus or an alarm processing apparatus for a predetermined time is subjected to synchronization with respect to transmission (holding), the alarm information being displayed in a display/transfer part.

Abstract: In a ceramic bearing device having a ceramic bearing slidably supporting a sleeve fixed to a pump main shaft, a bearing case mounting the ceramic bearing and a bearing casing elastically supporting the bearing case with rubber, a cylindrical container is fixed to the bearing casing so as to surround the lower surface and the outer peripheral side of the bearing casing, a water storage tank having a return plate in the top end portion being fixed to the pump main shaft so as to surround the cylindrical container, a passage being provided in the cylindrical container, distance pieces being provided between the outer peripheral portion of the bearing casing and the inner peripheral portion of the cylindrical container being provided, a passage being formed in the distance piece.

Abstract: An underground water channel is provided in an underground of a large depth, and rain water and the like flow into this underground channel from flood control channels, conduits and rivers through vertical shafts. A pump well of a pump station is connected to a downstream end of the underground channel, and water flowing into the pump well is discharged by a pump to a discharge tank. The pump is disposed generally at a medium water level of the underground channel, and a lowest water level L.W.L enabling draining is the medium water level of the underground channel. In an open channel flow operation of an open channel-closed channel mixed flow operation, water level of the underground channel is maintained at the lowest water level L.W.L, so that the underground channel is in an open channel condition.

Abstract: A plurality of drainage pumps are disposed on a high floor gradation state in a circular arrangement. A plurality of drainage pumps are disposed on a low floor gradation state in a circular arrangement. The drainage pumps disposed on the high floor gradation are installed at a high level, with the drainage pumps having a low pump head and a large capacity in comparison with the drainage pumps disposed at the low floor gradation. An outer shape of an underground pump construction building is in the form of a circular cone shape spreading toward an upper portion of the underground pump construction building. The amount of power for discharging the drainage can be reduced and the construction area for the underground pump construction building can be reduced thereby minimizing the necessary requirement for installation of the underground pump construction.

Abstract: A magneto-optical disc has a resin substrate and a magneto-optical film. A birefringence distribution of the substrate in a static state is so set that a disc phase difference during rotation of the disc is eliminated.

Abstract: The present invention relates to a process for manufacturing an optical recording medium comprising a substrate and a laminate of a recording film and an inorganic dielectric film thereon, and the optical recording medium. The process comprises forming the inorganic dielectric film by using a helicon wave plasma CVD method.

Abstract: A plural drainage pumps PH are disposed on the high floor gradation state at the circular shape. A plural drainage pumps PL are disposed on the low floor gradation state at the circular shape. The drainage pump PH disposed on the high floor gradation is installed at the high level. The drainage pump PH is set one having the low pump head and the large capacity in comparison with those of the drainage pump PL disposed on the low floor gradation. An outer shape of an underground pump construction building is formed a circular cone shape spreading toward an upper portion. The discharge water power can be reduced and the construction area for the underground pump construction building can be reduced and further the engineering working amount such as a digging working at the underground can be lessen.

Abstract: An underground water channel is provided in an underground of a large depth, and rain water and the like flow into this underground channel from flood control channels, conduits and rivers through vertical shafts. A pump well of a pump station is connected to a downstream end of the underground channel, and water flowing into the pump well is discharged by a pump to a discharge tank. The pump is disposed generally at a medium water level of the underground channel, and a lowest water level L.W.L enabling draining is the medium water level of the underground channel. In an open channel flow operation of an open channel-closed channel mixed flow operation, water level of the underground channel is maintained at the lowest water level L.W.L, so that the underground channel is in an open channel condition.