Patents by Inventor Kunitaka Ozawa

Kunitaka Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5226523
    Abstract: A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.
    Type: Grant
    Filed: October 20, 1992
    Date of Patent: July 13, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Eigo Kawakami, Koji Uda, Kunitaka Ozawa, Shunichi Uzawa, Mitsutoshi Kuno, Kazunori Iwamoto, Takao Kariya
  • Patent number: 5182615
    Abstract: An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.
    Type: Grant
    Filed: August 7, 1990
    Date of Patent: January 26, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Kurosawa, Koji Uda, Kunitaka Ozawa, Shunichi Uzawa, Nobutoshi Mizusawa, Shigeyuki Suda, Noriyuki Nose, Takao Kariya
  • Patent number: 5161176
    Abstract: An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
    Type: Grant
    Filed: December 6, 1991
    Date of Patent: November 3, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryuichi Ebinuma, Kunitaka Ozawa, Takao Kariya, Shunichi Uzawa, Noriyuki Nose
  • Patent number: 5157700
    Abstract: An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.
    Type: Grant
    Filed: August 31, 1989
    Date of Patent: October 20, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Kurosawa, Mitsuaki Amemiya, Shigeru Terashima, Koji Uda, Isamu Shimoda, Shunichi Uzawa, Kunitaka Ozawa, Makiko Mori, Ryuichi Ebinuma, Shinichi Hara, Nobutoshi Mizusawa, Eigo Kawakami
  • Patent number: 5142156
    Abstract: An alignment method for use in an exposure apparatus for printing a pattern of an original onto different surface areas of a substrate, the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage; providing a reference mark on an X-Y stage for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors which are provided to be associated with the alignment marks of the original, respectively
    Type: Grant
    Filed: September 27, 1990
    Date of Patent: August 25, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kunitaka Ozawa, Shunichi Uzawa, Hirohisa Ohta, Makiko Mori, Noriyuki Nose
  • Patent number: 5112133
    Abstract: An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move a corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of a corresponding one of the position detecting devices, along the plane and facing the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of the contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.
    Type: Grant
    Filed: October 1, 1991
    Date of Patent: May 12, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Kurosawa, Koji Uda, Kunitaka Ozawa, Shunichi Uzawa, Ryuichi Ebinuma, Takao Kariya
  • Patent number: 5063582
    Abstract: The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed.
    Type: Grant
    Filed: February 20, 1991
    Date of Patent: November 5, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuzo Mori, Eiji Sakamoto, Shinichi Hara, Koji Uda, Isamu Shimoda, Shunichi Uzawa, Kunitaka Ozawa
  • Patent number: 5008703
    Abstract: Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation in the aligning operation or the exposure operation, is prohibited. This ensures high-precision pattern printing.
    Type: Grant
    Filed: September 6, 1989
    Date of Patent: April 16, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Eigo Kawakami, Kunitaka Ozawa, Koji Uda, Isamu Shimoda, Shunichi Uzawa
  • Patent number: 4998134
    Abstract: An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed.
    Type: Grant
    Filed: July 21, 1989
    Date of Patent: March 5, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junji Isohata, Koichi Matsushita, Hironori Yamamoto, Makoto Miyazaki, Kunitaka Ozawa, Hideki Yoshinari
  • Patent number: 4922267
    Abstract: A recorder comprises a recording device housing for housing a device for forming a record on record medium at a record position and a relatively movable stacker for stacking record media recorded by the recording device and having an open side for removing the stacked media. A convex ara on the bottom of the stacker extends othogonally to the length of the stacker at a position spaced from the lengthwise center of the stacker toward the open side.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: May 1, 1990
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masakazu Ozawa, Kunitaka Ozawa, Katsunori Hatanaka, Tetsuo Suzuki, Tetsuzo Mori, Tadashi Shiina, Ryuichi Ebinuma
  • Patent number: 4894668
    Abstract: A recorder comprises a recording device housing for housing recording device for making a record on a continuous record medium at a record position, and a device for supporting the weight of the record medium over its entire width upstream of a pinch position thereof formed by pinch and press rollers.
    Type: Grant
    Filed: November 28, 1988
    Date of Patent: January 16, 1990
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masa K. Ozawa, Kunitaka Ozawa, Katsunori Hatanaka, Tetsuo Suzuki, Tetsuzo Mori, Tadashi Shiina, Ryuichi Ebinuma
  • Patent number: 4884085
    Abstract: A recorder has a recording device for recording on a record medium and a feed unit for feeding the medium to the recording position. Feed and press rollers are provided with apparatus for urging the press roller to and from the feed roller and a locking device can lock the press roller at a pressing position.
    Type: Grant
    Filed: January 19, 1989
    Date of Patent: November 28, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masakazu Ozawa, Kunitaka Ozawa, Katsunori Hatanaka, Tetsuo Suzuki, Tetsuzo Mori, Tadashi Shiina, Ryuichi Ebinuna
  • Patent number: 4866532
    Abstract: A printing apparatus or system has CCDs for reading out image data from an original or originals, a memory for storing the image data, a plurality of recording sections with recording heads, a control for controlling the overall circuitry and mechanical parts. A desired number of copies in black or in color can be produced within a short period of time in accordance with the size of the original image and/or color. A red image which does not require high resolution as much as a black image is automatically reproduced with lower resolution while maintaining high resolution at black portion of the same image. A plurality of recording sections may be equally used for printing only a small number of copies.
    Type: Grant
    Filed: December 10, 1987
    Date of Patent: September 12, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Naoki Ayata, Seiji Saito, Hidetoshi Suzuki, Kunitaka Ozawa, Noboru Koumura
  • Patent number: 4864360
    Abstract: An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed.
    Type: Grant
    Filed: April 5, 1988
    Date of Patent: September 5, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junji Isohata, Koichi Matsushita, Hironori Yamamoto, Makoto Miyazaki, Kunitaka Ozawa, Hideki Yoshinari
  • Patent number: 4802989
    Abstract: A system for purifying dye comprising a means for producing a dye solution and a means for treating the dye solution which captures metal ions in said dye solution by carrying out ion-exchange separation.
    Type: Grant
    Filed: October 29, 1986
    Date of Patent: February 7, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiro Haruta, Kunitaka Ozawa, Takashi Hamamoto
  • Patent number: 4749867
    Abstract: An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented.
    Type: Grant
    Filed: April 28, 1986
    Date of Patent: June 7, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koichi Matsushita, Junji Isohata, Hironori Yamamoto, Makoto Miyazaki, Kunitaka Ozawa, Hideki Yoshinari
  • Patent number: 4748477
    Abstract: An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The exposure apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member. Also, the exposure apparatus includes a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging optical system and a stage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. The stage is mounted on the carriage, and the movement of the carriage is guided by linear air-bearings.
    Type: Grant
    Filed: April 28, 1986
    Date of Patent: May 31, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junji Isohata, Koichi Matsushita, Hironori Yamamoto, Makoto Miyazaki, Kunitaka Ozawa, Hideki Yoshinari
  • Patent number: 4721968
    Abstract: A process for recording an image by depositing droplets of a recording liquid onto a light-transmitting recording material is provided which comprises depositing at least two droplets of a recording liquid of the same color per image element onto the recording material. An apparatus for the process is also provided which comprises an image-forming means or a recording means useful for a reflective recording material and a light transmitting material.
    Type: Grant
    Filed: September 13, 1984
    Date of Patent: January 26, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryuichi Arai, Shigeo Toganoh, Kunitaka Ozawa
  • Patent number: 4718040
    Abstract: A printing apparatus or system has CCDs for reading out image data from an original or originals, a memory for storing the image data, a plurality of recording sections with recording heads, a control for controlling the overall circuitry and mechanical parts. A desired number of copies in black or in color can be produced within a short period of time in accordance with the size of the original image and/or color. A red image which does not require high resolution as much as a black image is automatically reproduced with lower resolution while maintaining high resolution at black portion of the same image. A plurality of recording sections may be equally used for printing only a small number of copies.
    Type: Grant
    Filed: November 12, 1986
    Date of Patent: January 5, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Naoki Ayata, Seiji Saito, Hidetoshi Suzuki, Kunitaka Ozawa, Noboru Koumura
  • Patent number: 4716421
    Abstract: A recording apparatus, such as an ink jet printer, with plural recording heads is described. Each recording head has a mark which is read by a detector to generate a corresponding signal. The signals from plural recording heads are utilized for registering these heads.
    Type: Grant
    Filed: October 14, 1986
    Date of Patent: December 29, 1987
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kunitaka Ozawa, Takashi Nakamura, Akira Katayama, Katsunori Hatanaka, Tetsuzo Mori, Makoto Takaoka