Patents by Inventor Kuniyoshi Yokoh

Kuniyoshi Yokoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7741232
    Abstract: An electron-emitting woven fabric according to the present invention is intended to provide an electron emission source that can be produced extremely easily, readily shaped to have a large area, and used for a wide variety of applications including a display device. The electron-emitting woven fabric according to the present invention is characterized in that first linear bodies 3 composed of a conductive layer 1 and an insulating layer 2 covering the conductive layer 1 and second linear bodies 4 of a conductive material are crossed. Another mode of the electron-emitting woven fabric according to the present invention is characterized in that a carbonaceous material is provided on a surface of each of crossed parts of the second linear bodies crossing the first linear bodies at lifted portions and/or sunk portions of the first linear bodies.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: June 22, 2010
    Assignee: Ideal Star Inc.
    Inventors: Kuniyoshi Yokoh, Kenji Omote
  • Publication number: 20080296510
    Abstract: It is devised to transport plasma including charged particles made of containment target atom ions and charged particles of a polarity opposite to that of the containment target atom ions, up to an empty fullerene film on a deposition-assistance substrate by a uniform magnetic field, and to give acceleration energies to the containment target atoms by a bias voltage applied to the deposition-assistance substrate, thereby implanting the containment target atoms into the fullerene film. Since attractive forces act between the charged particles constituting the plasma so that the plasma is not diverged, it becomes possible to achieve a high density ion implantation to improve a yield of containing-fullerene even in ion implantation with a low energy.
    Type: Application
    Filed: January 6, 2005
    Publication date: December 4, 2008
    Inventors: Yasuhiko Kasama, Kenji Omote, Kuniyoshi Yokoh
  • Publication number: 20070117488
    Abstract: An electron-emitting woven fabric according to the present invention is intended to provide an electron emission source that can be produced extremely easily, readily shaped to have a large area, and used for a wide variety of applications including a display device. The electron-emitting woven fabric according to the present invention is characterized in that first linear bodies 3 composed of a conductive layer 1 and an insulating layer 2 covering the conductive layer 1 and second linear bodies 4 of a conductive material are crossed. Another mode of the electron-emitting woven fabric according to the present invention is characterized in that a carbonaceous material is provided on a surface of each of crossed parts of the second linear bodies crossing the first linear bodies at lifted portions and/or sunk portions of the first linear bodies.
    Type: Application
    Filed: June 30, 2004
    Publication date: May 24, 2007
    Inventors: Kuniyoshi Yokoh, Kenji Omote
  • Publication number: 20070110644
    Abstract: Provided is a system for manufacturing a fullerene derivative whereby it is possible to heat electrons in a plasma highly efficiently and to attain the improved yield of a fullerene derivative. The system can generate a high electron temperature plasma using plasma generating elements including a microwave generator, mirror field generating coil, and four phased helical antenna. Thus, with this system, the production efficiency of the ions of an atom which acts as a moiety in the production of a fullerene derivative is improved, and the yield of a fullerene derivative is also improved.
    Type: Application
    Filed: December 3, 2004
    Publication date: May 17, 2007
    Inventors: Yasuhiko Kasama, Kenji Omote, Kuniyoshi Yokoh
  • Publication number: 20060127597
    Abstract: A method for producing endohedral fullerenes at a higher yield and an apparatus therefor are disclosed. The apparatus includes a vacuum vessel (1), elements (3, 4) for generating a plasma current (2) of atoms to be contained, elements (8) for introducing fullerenes into the plasma current (2), a holding member (6) for holding a plurality of division plates (5a, 5b, 5c) concentrically divided and arranged in the downstream region of the plasma current (2), and a bias-applying unit (7a, 7b, 7c) for applying an arbitrary bias voltage to the division plates (5a, 5b, 5c).
    Type: Application
    Filed: September 22, 2003
    Publication date: June 15, 2006
    Inventors: Rikizo Hatakeyama, Takamichi Hirata, Kuniyoshi Yokoh, Yasuhiko Kasama, Kenji Omote