Patents by Inventor Kuo-Chang Tien

Kuo-Chang Tien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
    Patent number: 9530731
    Abstract: A method of optical proximity correction executed by a computer system for modifying line patterns includes the following steps. First, providing an integrated circuit layout with parallel line patterns and interconnect patterns disposed corresponding to the parallel line patterns. Then, using the computer to modify the integrated circuit layout based on a position of the interconnect patterns so as to generate a convex portion and a concave portion respectively on two sides of each of the parallel line patterns. Portions of the line pattern in front of and behind the convex portion and the concave portion are straight lines and have an identical critical dimension.
    Type: Grant
    Filed: January 27, 2015
    Date of Patent: December 27, 2016
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Kuan-Wen Fang, Chin-Lung Lin, Kuo-Chang Tien, Yi-Hsiu Lee, Chien-Hsiung Wang
  • METHOD OF OPTICAL PROXIMITY CORRECTION FOR MODIFYING LINE PATTERNS AND INTEGRATED CIRCUITS WITH LINE PATTERNS MODIFIED BY THE SAME
    Publication number: 20150137369
    Abstract: A method of optical proximity correction executed by a computer system for modifying line patterns includes the following steps. First, providing an integrated circuit layout with parallel line patterns and interconnect patterns disposed corresponding to the parallel line patterns. Then, using the computer to modify the integrated circuit layout based on a position of the interconnect patterns so as to generate a convex portion and a concave portion respectively on two sides of each of the parallel line patterns. Portions of the line pattern in front of and behind the convex portion and the concave portion are straight lines and have an identical critical dimension.
    Type: Application
    Filed: January 27, 2015
    Publication date: May 21, 2015
    Inventors: Kuan-Wen Fang, Chin-Lung Lin, Kuo-Chang Tien, Yi-Hsiu Lee, Chien-Hsiung Wang
  • Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
    Patent number: 8977988
    Abstract: A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
    Type: Grant
    Filed: April 9, 2013
    Date of Patent: March 10, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Kuan-Wen Fang, Chin-Lung Lin, Kuo-Chang Tien, Yi-Hsiu Lee, Chien-Hsiung Wang
  • METHOD OF OPTICAL PROXIMITY CORRECTION FOR MODIFYING LINE PATTERNS AND INTEGRATED CIRCUTS WITH LINE PATTERNS MODIFIED BY THE SAME
    Publication number: 20140304666
    Abstract: A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
    Type: Application
    Filed: April 9, 2013
    Publication date: October 9, 2014
    Applicant: United Microelectronics Corp.
    Inventors: Kuan-Wen Fang, Chin-Lung Lin, Kuo-Chang Tien, Yi-Hsiu Lee, Chien-Hsiung Wang