Patents by Inventor Kuo-Ching Wu

Kuo-Ching Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11978740
    Abstract: A layer stack including a first bonding dielectric material layer, a dielectric metal oxide layer, and a second bonding dielectric material layer is formed over a top surface of a substrate including a substrate semiconductor layer. A conductive material layer is formed by depositing a conductive material over the second bonding dielectric material layer. The substrate semiconductor layer is thinned by removing portions of the substrate semiconductor layer that are distal from the layer stack, whereby a remaining portion of the substrate semiconductor layer includes a top semiconductor layer. A semiconductor device may be formed on the top semiconductor layer.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: May 7, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Harry-Hak-Lay Chuang, Kuo-Ching Huang, Wei-Cheng Wu, Hsin Fu Lin, Henry Wang, Chien Hung Liu, Tsung-Hao Yeh, Hsien Jung Chen
  • Publication number: 20240139142
    Abstract: Provided is a method for preventing or treating a liver disease, including administering a therapeutically effective amount of pharmaceutical composition to a subject in need, and the pharmaceutical composition includes the isothiocyanate structural modified compound and a pharmaceutically acceptable carrier thereof.
    Type: Application
    Filed: September 14, 2023
    Publication date: May 2, 2024
    Applicants: TAIPEI VETERANS GENERAL HOSPITAL, NATIONAL YANG MING CHIAO TUNG UNIVERSITY, PHARMAESSENTIA CORPORATION
    Inventors: Jaw-Ching WU, Yung-Sheng CHANG, Kuo-Hsi KAO, Chan-Kou HWANG, Ko-Chung LIN
  • Publication number: 20240136346
    Abstract: A semiconductor die package includes an inductor-capacitor (LC) semiconductor die that is directly bonded with a logic semiconductor die. The LC semiconductor die includes inductors and capacitors that are integrated into a single die. The inductors and capacitors of the LC semiconductor die may be electrically connected with transistors and other logic components on the logic semiconductor die to form a voltage regulator circuit of the semiconductor die package. The integration of passive components (e.g., the inductors and capacitors) of the voltage regulator circuit into a single semiconductor die reduces signal propagation distances in the voltage regulator circuit, which may increase the operating efficiency of the voltage regulator circuit, may reduce the formfactor for the semiconductor die package, may reduce parasitic capacitance and/or may reduce parasitic inductance in the voltage regulator circuit (thereby improving the performance of the voltage regulator circuit), among other examples.
    Type: Application
    Filed: April 17, 2023
    Publication date: April 25, 2024
    Inventors: Chien Hung LIU, Yu-Sheng CHEN, Yi Ching ONG, Hsien Jung CHEN, Kuen-Yi CHEN, Kuo-Ching HUANG, Harry-HakLay CHUANG, Wei-Cheng WU, Yu-Jen WANG
  • Publication number: 20240088026
    Abstract: A semiconductor device according to embodiments of the present disclosure includes a first die including a first bonding layer and a second die including a second hybrid bonding layer. The first bonding layer includes a first dielectric layer and a first metal coil embedded in the first dielectric layer. The second bonding layer includes a second dielectric layer and a second metal coil embedded in the second dielectric layer. The second hybrid bonding layer is bonded to the first hybrid bonding layer such that the first dielectric layer is bonded to the second dielectric layer and the first metal coil is bonded to the second metal coil.
    Type: Application
    Filed: January 17, 2023
    Publication date: March 14, 2024
    Inventors: Yi Ching Ong, Wei-Cheng Wu, Chien Hung Liu, Harry-Haklay Chuang, Yu-Sheng Chen, Yu-Jen Wang, Kuo-Ching Huang
  • Patent number: 11827521
    Abstract: A method for selectively chemically reducing CO2 to form CO includes providing a catalyst, and contacting H2 and CO2 with the catalyst to chemically reduce CO2 to form CO. The catalyst includes a metal oxide having a chemical formula of FexCoyMn(1?x?y)Oz, in which 0.7?x?0.95, 0.01?y?0.25, and z is an oxidation coordination number.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: November 28, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching Wu, Hsi-Yen Hsu, Chao-Huang Chen, Yuan-Peng Du
  • Publication number: 20230348278
    Abstract: A method for selectively chemically reducing CO2 to form CO includes providing a catalyst, and contacting H2 and CO2 with the catalyst to chemically reduce CO2 to form CO. The catalyst includes a metal oxide having a chemical formula of FexCoyMn(1-x-y)Oz, in which 0.7?x?0.95, 0.01?y?0.25, and z is an oxidation coordination number.
    Type: Application
    Filed: July 3, 2023
    Publication date: November 2, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching WU, Hsi-Yen HSU, Chao-Huang CHEN, Yuan-Peng DU
  • Publication number: 20230183074
    Abstract: A method for selectively chemically reducing CO2 to form CO includes providing a catalyst, and contacting H2 and CO2 with the catalyst to chemically reduce CO2 to form CO. The catalyst includes a metal oxide having a chemical formula of FexCoyMn(1-x-y)Oz, in which 0.7?x?0.95, 0.01?y?0.25, and z is an oxidation coordination number.
    Type: Application
    Filed: December 14, 2021
    Publication date: June 15, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching WU, Hsi-Yen HSU, Chao-Huang CHEN, Yuan-Peng DU
  • Patent number: 11565244
    Abstract: A method of forming dialkyl carbonate is provided, which includes introducing carbon dioxide into a catalyst to form dialkyl carbonate, wherein the catalyst is formed by activating a catalyst precursor using alcohol, wherein alcohol is R3—OH, and R3 is C1-12 alkyl group or C5-12 aryl or heteroaryl group. The catalyst precursor is formed by reacting Sn(R1)2(L)2 and Ti(OR2)4, and Sn(R1)2(L)2 and Ti(OR2)4 have a molar ratio of 1:2 to 2:1. R1 is C1-10 alkyl group, R2 is H or C1-12 alkyl group, and L is O—(C?O)—R5, and R5 is C1-12 alkyl group.
    Type: Grant
    Filed: June 6, 2022
    Date of Patent: January 31, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Yao Yang, Kuo-Ching Wu, Hsi-Yen Hsu, Yu-Shan Chao
  • Publication number: 20220297099
    Abstract: A method of forming dialkyl carbonate is provided, which includes introducing carbon dioxide into a catalyst to form dialkyl carbonate, wherein the catalyst is formed by activating a catalyst precursor using alcohol, wherein alcohol is R3—OH, and R3 is C1-12 alkyl group or C5-12 aryl or heteroaryl group. The catalyst precursor is formed by reacting Sn(R1)2(L)2 and Ti(OR2)4, and Sn(R1)2(L)2 and Ti(OR2)4 have a molar ratio of 1:2 to 2:1. R1 is C1-10 alkyl group, R2 is H or C1-12 alkyl group, and L is O—(C?O)—R5, and R5 is C1-12 alkyl group.
    Type: Application
    Filed: June 6, 2022
    Publication date: September 22, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Yao YANG, Kuo-Ching WU, Hsi-Yen HSU, Yu-Shan CHAO
  • Patent number: 11400440
    Abstract: A method of forming dialkyl carbonate is provided, which includes introducing carbon dioxide into a catalyst to form dialkyl carbonate, wherein the catalyst is formed by activating a catalyst precursor using alcohol, wherein alcohol is R3—OH, and R3 is C1-12 alkyl group or C5-12 aryl or heteroaryl group. The catalyst precursor is formed by reacting Sn(R1)2(L)2 and Ti(OR2)4, and Sn(R1)2(L)2 and Ti(OR2)4 have a molar ratio of 1:2 to 2:1. R1 is C1-10 alkyl group, R2 is H or C1-12 alkyl group, and L is O—(C?O)—R5, and R5 is C1-12 alkyl group.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: August 2, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Yao yang, Kuo-Ching Wu, Hsi-Yen Hsu, Yu-Shan Chao
  • Publication number: 20210178374
    Abstract: A method of forming dialkyl carbonate is provided, which includes introducing carbon dioxide into a catalyst to form dialkyl carbonate, wherein the catalyst is formed by activating a catalyst precursor using alcohol, wherein alcohol is R3—OH, and R3 is C1-12 alkyl group or C5-12 aryl or heteroaryl group. The catalyst precursor is formed by reacting Sn(R1)2(L)2 and Ti(OR2)4, and Sn(R1)2(L)2 and Ti(OR2)4 have a molar ratio of 1:2 to 2:1. R1 is C1-10 alkyl group, R2 is H or C1-12 alkyl group, and L is O—(C?O)—R5, and R5 is C1-12 alkyl group.
    Type: Application
    Filed: December 26, 2019
    Publication date: June 17, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Yao YANG, Kuo-Ching WU, Hsi-Yen HSU, Yu-Shan CHAO
  • Publication number: 20190382522
    Abstract: A polycarbonate diol is provided. The polycarbonate diol includes repeating units represented by formula (A) and formula (B), and hydroxyl groups located at both ends of the polycarbonate diol. The molar ratio of formula (A) to formula (B) is in a range from 1:99 to 99:1. R1 is a linear, branched or cyclic C2-20 alkylene group. R2 is a linear or branched C2-10 alkylene group; m and n are independently and can be an integer from 0 to 10, and m+n?1. A is a C2-20 alicyclic hydrocarbon, aromatic ring or a structure represented by formula (C). R3 and R4 are independently and can be a hydrogen atom or a C1-6 alkyl group; S is 0 or 1; and Z is selected from R5 and R6 are independently and can be a hydrogen atom or a C1-12 hydrocarbon group.
    Type: Application
    Filed: November 19, 2018
    Publication date: December 19, 2019
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cheng-Po KUO, Kuo-Ching WU, Wen-Pin CHUANG, Shu-Jiuan HUANG, Hsi-Yen HSU, Chiou-Hwang LEE
  • Patent number: 10005068
    Abstract: A catalyst is provided. The catalyst includes a carrier and a metal. The carrier is represented by a formula: MxAl(1-x)O(3-x)/2, where M is an alkaline earth metal, and x is between 0.09 and 0.24. The metal is loaded on the carrier. A method for manufacturing the catalyst is also provided.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: June 26, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching Wu, Chiou-Hwang Lee
  • Patent number: 9875924
    Abstract: A spray coater is used to spray a photoresist on a front surface of a wafer. The spray coater includes a vacuum chuck, a flow guiding ring, and a positioning ring. The vacuum chuck has a top surface and a side surface adjacent to the top surface. The wafer is located on the top surface and protrudes from the top surface of the vacuum chuck. The flow guiding ring is disposed around the vacuum chuck and has a groove. The wafer protruding from the top surface covers the flow guiding ring, and an opening of the groove faces a back surface of the wafer opposite to the front surface. The positioning ring is disposed around the flow guiding ring, such that the flow guiding ring is between the positioning ring and the side surface of the vacuum chuck.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: January 23, 2018
    Assignee: XINTEC INC.
    Inventors: Tsou-Tso Tsai, Kuo-Ching Wu, Tzung-Heng Tsai
  • Publication number: 20170087536
    Abstract: A catalyst is provided. The catalyst includes a carrier and a metal. The carrier is represented by a formula: MxAl(1-x)O(3-x)/2, where M is an alkaline earth metal, and x is between 0.09 and 0.24. The metal is loaded on the carrier. A method for manufacturing the catalyst is also provided.
    Type: Application
    Filed: December 9, 2016
    Publication date: March 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching WU, Chiou-Hwang LEE
  • Patent number: 9545617
    Abstract: A catalyst is provided. The catalyst includes a carrier and a metal Pd. The carrier is represented by a formula: MxAl(1?x)O(3?x)/2, where M is an alkaline earth metal, and x is between 0.09 and 0.24. The metal Pd is loaded on the carrier. A method for manufacturing the catalyst and a method for manufacturing a hydrogenated bisphenol A or derivatives thereof using the catalyst are also provided.
    Type: Grant
    Filed: December 9, 2015
    Date of Patent: January 17, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Ching Wu, Chiou-Hwang Lee
  • Publication number: 20160250656
    Abstract: A spray coater is used to spray a photoresist on a front surface of a wafer. The spray coater includes a vacuum chuck, a flow guiding ring, and a positioning ring. The vacuum chuck has a top surface and a side surface adjacent to the top surface. The wafer is located on the top surface and protrudes from the top surface of the vacuum chuck. The flow guiding ring is disposed around the vacuum chuck and has a groove. The wafer protruding from the top surface covers the flow guiding ring, and an opening of the groove faces a back surface of the wafer opposite to the front surface. The positioning ring is disposed around the flow guiding ring, such that the flow guiding ring is between the positioning ring and the side surface of the vacuum chuck.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Tsou-Tso TSAI, Kuo-Ching WU, Tzung-Heng TSAI
  • Publication number: 20160158731
    Abstract: A catalyst is provided. The catalyst includes a carrier and a metal Pd. The carrier is represented by a formula: MxAl(1-x)O(3-x)/2, where M is an alkaline earth metal, and x is between 0.09 and 0.24. The metal Pd is loaded on the carrier. A method for manufacturing the catalyst and a method for manufacturing a hydrogenated bisphenol A or derivatives thereof using the catalyst are also provided.
    Type: Application
    Filed: December 9, 2015
    Publication date: June 9, 2016
    Inventors: Kuo-Ching Wu, Chiou-Hwang Lee
  • Patent number: 8722922
    Abstract: The disclosure provides a process for hydrogenation of polycarboxylic acids or derivatives thereof, including: hydrogenation of polycarboxylic acids or derivatives thereof in the presence of a catalyst, wherein the catalyst includes an active metal and a support, the support includes a Group IIA element and a Group IIIA element, and the active metal includes a Group VIIIB element.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: May 13, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Hsu-Kai Chang, Chion-Hwang Lee, Kuo-Ching Wu, Hsi-Yen Hsu
  • Publication number: 20100263977
    Abstract: A support apparatus for wheeled luggage, comprising a luggage case and a frame member, wherein the frame member further comprises a first frame having two main legs and multiple wheels, and a second frame having multiple pivot fasteners and multiple wheels. When pulling the second frame, the second frame and the first frame will be unfolded to form in a shape of cross, so that the structure of the luggage case and the frame member will transform into a platform type, the users do not need to bend down their back or squat down to sort out the articles in the luggage case; furthermore, since the wheels are pivoted to the bottom ends of the first frame and second frame, so that the stability of the wheels is secured.
    Type: Application
    Filed: May 7, 2009
    Publication date: October 21, 2010
    Inventor: Kuo Ching WU