Abstract: A substrate transmission apparatus is provided. The substrate transmission apparatus includes two supporting stands, a transmission shaft having two end portions, a supporting shaft having two end portions, first rollers, and second rollers. Two end portions of the transmission shaft are respectively connected to the two supporting stands. Two end portions of the supporting shaft are respectively connected to the two supporting stands, and the supporting shaft is located above the transmission shaft. The first rollers are fixed at intervals on the transmission shaft and rotate with the transmission shaft to convey a substrate placed thereon. The second rollers are rotatably connected to the supporting shaft and are in contact with an upper surface of the substrate, such that the substrate is conveyed and sandwiched between the first rollers and the second rollers.

Abstract: A mask management and bar code reading apparatus thereof are disclosed. The mask management method comprises providing a bar code reading apparatus, scanning a mask bar code on the mask by the bar code reading apparatus, transferring scanned information to a mask management system, producing a box bar code, moving the mask to a mask pod from a mask protective case, sticking the box bar code on the mask pod, inputting the data recorded in the box bar code into an exposure equipment, and exposing the mask by the exposure equipment. The bar code reading apparatus includes at least a clamping element to clamp the mask protective case, at least a reading head disposed on the clamping element to read a mask bar code, and a first light source providing a first light to irradiate the mask protective case to increase reading accuracy of the reading head.

Abstract: A method for performing a visual inspection of a wafer is described. First, a visual inspection system for a wafer comprising at least a wafer carrying apparatus, a light source and a reflecting element is provided. The wafer carrying apparatus is used for carrying a wafer. The light source is disposed relative to the wafer carrying apparatus for illuminating the backside of the wafer. The reflecting element is disposed relative to the wafer carrying apparatus for receiving the reflection from the backside of the wafer. Then, a wafer is placed on the wafer carrying apparatus and the backside of the wafer is illuminated using the light source. Thereafter, the wafer surface and the backside of the wafer reflected to the reflecting element are inspected.

Abstract: A mask management and bar code reading apparatus thereof are disclosed. The mask management method comprises providing a bar code reading apparatus, scanning a mask bar code on the mask by the bar code reading apparatus, transferring scanned information to a mask management system, producing a box bar code, moving the mask to a mask pod from a mask protective case, sticking the box bar code on the mask pod, inputting the data recorded in the box bar code into an exposure equipment, and exposing the mask by the exposure equipment. The bar code reading apparatus includes at least a clamping element to clamp the mask protective case, at least a reading head disposed on the clamping element to read a mask bar code, and a first light source providing a first light to irradiate the mask protective case to increase reading accuracy of the reading head.