Abstract: The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.

Abstract: A docking station for connection between one or more portable electronic devices and an external device for networks. The docking station includes a docking surface having one or more connectors adapted to be connected to the portable electronic devices, the docking surface rotating with respect to a base section.