Patents by Inventor Kuo-Wei CHUANG

Kuo-Wei CHUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10825940
    Abstract: A polycrystalline silicon wafer is provided. The polycrystalline silicon wafer, includes a plurality of silicon grains, wherein the carbon content of the polycrystalline silicon wafer is greater than 4 ppma, and the resistivity of the polycrystalline silicon wafer is greater than or equal to 1.55 ?-cm.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: November 3, 2020
    Assignee: Sino-American Silicon Products Inc.
    Inventors: Cheng-Jui Yang, Huang Wei Lin, Yu-Min Yang, Kuo-Wei Chuang, Ming-Kung Hsiao, Yuan Hsiao Chang, Bo-Kai Wang, Wen-Huai Yu, Sung Lin Hsu, I-Ching Li, Wen-Ching Hsu
  • Patent number: 10297702
    Abstract: A polycrystalline silicon column is provided. The polycrystalline silicon column includes a plurality of silicon grains grown along a crystal-growing direction. In the crystal-growing direction, the average grain size of the silicon grains and the resistivity of the polycrystalline silicon column have opposite variation in their trends, the average grain size of the silicon grains and the oxygen content of the polycrystalline silicon column have opposite variation in their trends, and the average grain size of the silicon grains and the defect area ratio of the polycrystalline silicon column have the same variation in their trends. The overall average defect area ratio of the polycrystalline silicon column is less than or equal to 2.5%.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: May 21, 2019
    Assignee: Sino-American Silicon Products Inc.
    Inventors: Cheng-Jui Yang, Huang Wei Lin, Yu-Min Yang, Kuo-Wei Chuang, Ming-Kung Hsiao, Yuan Hsiao Chang, Bo-Kai Wang, Wen-Huai Yu, Sung Lin Hsu, I-Ching Li, Wen-Ching Hsu
  • Patent number: 9903043
    Abstract: The invention provides a crucible assembly and method of manufacturing a crystalline silicon ingot by use of such crucible assembly. The crucible assembly of the invention includes a crucible body and a fiber textile article. The fiber textile article is made of a plurality of carbon fibers, and is loaded on a bottom of the crucible body. The fiber textile article has a plurality of intrinsic pores randomly arranged.
    Type: Grant
    Filed: January 16, 2015
    Date of Patent: February 27, 2018
    Assignee: SINO-AMERICAN SULICON PRODUCTS INC.
    Inventors: Wen-Huai Yu, Hung-Sheng Chou, Yu-Min Yang, Kuo-Wei Chuang, Sung-Lin Hsu, I-Ching Li, Wen-Ching Hsu
  • Publication number: 20170058428
    Abstract: A polycrystalline silicon column is provided. The polycrystalline silicon column includes a plurality of silicon grains grown along a crystal-growing direction. In the crystal-growing direction, the average grain size of the silicon grains and the resistivity of the polycrystalline silicon column have opposite variation in their trends, the average grain size of the silicon grains and the oxygen content of the polycrystalline silicon column have opposite variation in their trends, and the average grain size of the silicon grains and the defect area ratio of the polycrystalline silicon column have the same variation in their trends. The overall average defect area ratio of the polycrystalline silicon column is less than or equal to 2.5%.
    Type: Application
    Filed: August 26, 2016
    Publication date: March 2, 2017
    Applicant: Sino-American Silicon Products Inc.
    Inventors: Cheng-Jui Yang, Huang Wei Lin, Yu-Min Yang, Kuo-Wei Chuang, Ming-Kung Hsiao, Yuan Hsiao Chang, Bo-Kai Wang, Wen-Huai Yu, Sung Lin Hsu, I-Ching Li, Wen-Ching Hsu
  • Publication number: 20170062635
    Abstract: A polycrystalline silicon wafer is provided. The polycrystalline silicon wafer, includes a plurality of silicon grains, wherein the carbon content of the polycrystalline silicon wafer is greater than 4 ppma, and the resistivity of the polycrystalline silicon wafer is greater than or equal to 1.55 ?-cm.
    Type: Application
    Filed: August 26, 2016
    Publication date: March 2, 2017
    Applicant: Sino-American Silicon Products Inc.
    Inventors: Cheng-Jui Yang, Huang Wei Lin, Yu-Min Yang, Kuo-Wei Chuang, Ming-Kung Hsiao, Yuan Hsiao Chang, Bo-Kai Wang, Wen-Huai Yu, Sung Lin Hsu, I-Ching Li, Wen-Ching Hsu
  • Publication number: 20150361577
    Abstract: A method of casting an ingot includes the following steps: place solid silicon raw materials on a bottom of a containing device, wherein the containing device includes a container and a graphite layer provided on a surrounding wall and an inner bottom of the container, and the solid silicon raw materials are stacked upon the graphite layer on the inner bottom; heat the container to melt the solid silicon raw material into liquid state; cool the container from the bottom up till all of the silicon raw materials are crystallized and solidified. The solidified silicon raw materials become an ingot. Whereby, the graphite layer can effectively prevent impurities of the container from contaminating the ingot.
    Type: Application
    Filed: June 8, 2015
    Publication date: December 17, 2015
    Inventors: Hung-Sheng CHOU, Kuo-Wei Chuang, Yu-Min Yang, Wen-Huai Yu, Sung-Lin Hsu, Wen-Ching Hsu
  • Publication number: 20150197873
    Abstract: The invention provides a crucible assembly and method of manufacturing a crystalline silicon ingot by use of such crucible assembly. The crucible assembly of the invention includes a crucible body and a fiber textile article. The fiber textile article is made of a plurality of carbon fibers, and is loaded on a bottom of the crucible body. The fiber textile article has a plurality of intrinsic pores randomly arranged.
    Type: Application
    Filed: January 16, 2015
    Publication date: July 16, 2015
    Inventors: Wen-Huai YU, Hung-Sheng CHOU, Yu-Min YANG, Kuo-Wei CHUANG, Sung-Lin HSU, I-Ching LI, Wen-Ching HSU