Patents by Inventor Kuo-Wei Yang

Kuo-Wei Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8681049
    Abstract: A built-in FM transmitting antenna applied to a mobile device, includes a substrate unit, a first antenna unit, a conducting unit and a second antenna unit. The substrate unit has a circuit substrate, at least one grounding layer disposed on the circuit substrate, and a plurality of conducting pads disposed on the circuit substrate. The first antenna unit is disposed above the substrate unit and substantially parallel to the substrate unit. The conducting unit is electrically connected between the substrate unit and the first antenna unit. The second antenna unit is directly disposed on the edge of the top surface of the circuit substrate. The second antenna unit has two ends electrically connected between two of the conducting pads, respectively. The two ends of the second antenna unit are electrically connected to an FM chip module and the conducting unit through the two of the conducting pads, respectively.
    Type: Grant
    Filed: March 24, 2010
    Date of Patent: March 25, 2014
    Assignee: Lite-On Technology Corporation
    Inventors: Saou-Wen Su, Chao-Hsu Chen, Kuo-Wei Yang
  • Patent number: 8142258
    Abstract: A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: March 27, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Kuo-Wei Yang, Hui-Shen Shih, Chih-Jen Mao, Cho-Long Lin
  • Publication number: 20110175774
    Abstract: A built-in FM transmitting antenna applied to a mobile device, includes a substrate unit, a first antenna unit, a conducting unit and a second antenna unit. The substrate unit has a circuit substrate, at least one grounding layer disposed on the circuit substrate, and a plurality of conducting pads disposed on the circuit substrate. The first antenna unit is disposed above the substrate unit and substantially parallel to the substrate unit. The conducting unit is electrically connected between the substrate unit and the first antenna unit. The second antenna unit is directly disposed on the edge of the top surface of the circuit substrate. The second antenna unit has two ends electrically connected between two of the conducting pads, respectively. The two ends of the second antenna unit are electrically connected to an FM chip module and the conducting unit through the two of the conducting pads, respectively.
    Type: Application
    Filed: March 24, 2010
    Publication date: July 21, 2011
    Applicant: LITE-ON TECHNOLOGY CORPORATION
    Inventors: Saou-Wen Su, Chao-Hsu Chen, Kuo-Wei Yang
  • Publication number: 20110076129
    Abstract: A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
    Type: Application
    Filed: December 9, 2010
    Publication date: March 31, 2011
    Inventors: Kuo-Wei Yang, Hui-Shen Shih, Chih-Jen Mao, Cho-Long Lin
  • Patent number: 7909677
    Abstract: A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: March 22, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Kuo-Wei Yang, Hui-Shen Shih, Chih-Jen Mao, Cho-Long Lin
  • Patent number: 7732009
    Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: June 8, 2010
    Assignee: United Microelectronics Corp.
    Inventors: Chih-Jen Mao, Chun-Hung Hsia, Ta-Ching Yang, Chun-Cheng Yu, Chien-Fu Chu, Kuo-Wei Yang, Chun-Han Chuang, Hui-Shen Shih
  • Patent number: 7510964
    Abstract: The invention is directed to a method for manufacturing semiconductor device. The method comprises steps of providing a substrate and then forming a dielectric material-containing device over the substrate. A plasma vapor deposition process is performed to form a dielectric layer over the substrate. A first baking process is performed.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: March 31, 2009
    Assignee: United Microelectronics Corp.
    Inventors: Chih-Jen Mao, Kuo-Wei Yang, Hui-Shen Shih, Chun-Han Chuang
  • Patent number: 7482244
    Abstract: A wafer including a high stressed thin film thereon is lifted, and a pre-heating process is performed while the wafer is lifted. Subsequently, a dielectric layer is deposited on the high stressed thin film.
    Type: Grant
    Filed: September 16, 2005
    Date of Patent: January 27, 2009
    Assignee: United Microelectronics Corp.
    Inventors: Chih-Jen Mao, Hui-Shen Shih, Kuo-Wei Yang, Chun-Han Chuang, Chun-Hung Hsia
  • Publication number: 20080287044
    Abstract: A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
    Type: Application
    Filed: May 14, 2007
    Publication date: November 20, 2008
    Inventors: Kuo-Wei Yang, Hui-Shen Shih, Chih-Jen Mao, Cho-Long Lin
  • Publication number: 20080075852
    Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.
    Type: Application
    Filed: September 26, 2006
    Publication date: March 27, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chih-Jen Mao, Chun-Hung Hsia, Ta-Ching Yang, Chun-Cheng Yu, Chien-Fu Chu, Kuo-Wei Yang, Chun-Han Chuang, Hui-Shen Shih
  • Publication number: 20080032737
    Abstract: A presentation apparatus includes a power management module, a storage unit, an amplifier amplifying an audio signal based on an audio control signal, a socket receiving the amplified audio signal from the amplifier, a detection circuit, a plurality of buttons, a wireless receiver/transmitter and a processing chip which connects with the power management module, the storage unit, the amplifier, the detection circuit, the buttons, the wireless receiver/transmitter to control the movement of a cursor, receive/transmit an audio signal, output the audio control signal, and determine the type of plug plugged into the socket according to the detection circuit connecting with the socket.
    Type: Application
    Filed: August 4, 2006
    Publication date: February 7, 2008
    Inventors: Liang-Yi Liu, Chun-Hsin Liu, I-Ming Chou, Chien-Chung Chien, Kuo-Wei Yang
  • Publication number: 20070173065
    Abstract: The invention is directed to a method for manufacturing semiconductor device. The method comprises steps of providing a substrate and then forming a dielectric material-containing device over the substrate. A plasma vapor deposition process is performed to form a dielectric layer over the substrate. A first baking process is performed.
    Type: Application
    Filed: January 26, 2006
    Publication date: July 26, 2007
    Inventors: Chih-Jen Mao, Kuo-Wei Yang, Hui-Shen Shih, Chun-Han Chuang
  • Publication number: 20070066026
    Abstract: A wafer including a high stressed thin film thereon is lifted, and a pre-heating process is performed while the wafer is lifted. Subsequently, a dielectric layer is deposited on the high stressed thin film.
    Type: Application
    Filed: September 16, 2005
    Publication date: March 22, 2007
    Inventors: Chih-Jen Mao, Hui-Shen Shih, Kuo-Wei Yang, Chun-Han Chuang, Chun-Hung Hsia
  • Patent number: 6278617
    Abstract: A shield adapted to be fit into an opening defined in a casing of an electronic device to protect the electronic device from electromagnetic interference, includes a shielding panel dimensioned to be received in the opening of the casing. The shielding panel has outward flanges contacting support flanges extending from a periphery of the opening of the casing for retaining the shield in the opening. The outward flanges of the shielding panel form at least one retaining tongue extending therefrom and receivable in a gap defined in the support flanges of the casing for securely retaining the shield in the opening.
    Type: Grant
    Filed: April 14, 1999
    Date of Patent: August 21, 2001
    Assignee: Hon Hai Precision Ind. Co., Ltd.
    Inventors: Chric Kuo-Wei Yang, Jen-Jou Chang
  • Patent number: 6181575
    Abstract: A shield adapted to protect an electronic device from electromagnetic interference includes a shielding panel having two board support arms extending from opposite sides thereof. Each board support arm defines an elongate slot therein extending in a direction substantially normal to the panel from a remote end to a proximal end. An expanded hole is defined in the board support arm at the remote end of the slot and communicates with the slot by means of a converging section whereby a mounting extension of a circuit board of the electronic device is received in the slot by being inserted in the expanded hole and guided by the converging section into the slot toward the proximal end thereof. The expanded hole facilitates the insertion of the mounting extension into the slot thus the width of the slot may be dimensioned to securely retain the circuit board without interfering with the insertion of the circuit board. The expanded hole also facilitates removal of the circuit board from the slot.
    Type: Grant
    Filed: April 14, 1999
    Date of Patent: January 30, 2001
    Assignee: Hon Hai Preicision Ind. Co., Ltd.
    Inventor: Chris Kuo-Wei Yang