Patents by Inventor Kursat Bal

Kursat Bal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
    Publication number: 20230063156
    Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
    Type: Application
    Filed: December 24, 2020
    Publication date: March 2, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Lithographic apparatus
    Patent number: 9513566
    Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: December 6, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han-Kwang Nienhuys, Maikel Bernardus Theodorus Leenders
  • Lithographic Apparatus
    Publication number: 20150049323
    Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
    Type: Application
    Filed: February 28, 2013
    Publication date: February 19, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han-Kwang Nienhuys, Maikel Bernardus Theodorus Leenders
  • Lithographic apparatus and device manufacturing method
    Patent number: 8797504
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: August 5, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • Lithographic apparatus and device manufacturing method
    Patent number: 8730448
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: May 20, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120229782
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 13, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120229783
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Application
    Filed: March 1, 2012
    Publication date: September 13, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux