Patents by Inventor Kurt Gielissen
Kurt Gielissen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9307624Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.Type: GrantFiled: June 15, 2009Date of Patent: April 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Givi Georgievich Zukakishvili, Vladimir Mihailovitch Krivtsun, Yurii Victorovitch Sidelnikov, Kurt Gielissen, Oleg Yakushev
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Patent number: 8736806Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: GrantFiled: October 8, 2009Date of Patent: May 27, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Patent number: 8263950Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.Type: GrantFiled: May 27, 2010Date of Patent: September 11, 2012Assignee: ASML Netherlands B.V.Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Kurt Gielissen, Martin Jacobus Johan Jak
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Patent number: 8071963Abstract: A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.Type: GrantFiled: December 27, 2006Date of Patent: December 6, 2011Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Kurt Gielissen
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Publication number: 20110242516Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: ApplicationFiled: October 8, 2009Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Publication number: 20110128519Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.Type: ApplicationFiled: May 27, 2010Publication date: June 2, 2011Applicant: ASML Netherlands B.V.Inventors: Wouter Anthon SOÉR, Maarten Marinus Johannes Wilhelmus VAN HERPEN, Kurt GIELISSEN, Martin Jacobus Johan JAK
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Patent number: 7928412Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.Type: GrantFiled: March 17, 2009Date of Patent: April 19, 2011Assignee: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
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Patent number: 7687788Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.Type: GrantFiled: July 16, 2007Date of Patent: March 30, 2010Assignee: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Kurt Gielissen
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Publication number: 20100002211Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.Type: ApplicationFiled: June 15, 2009Publication date: January 7, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Denis GLUSHKOV, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Konstantin Nikolaevich KOSHELEV, Givi Georgievich ZUKAKISHVILI, Vladimir Mihailovitch KRIVTSUN, Yurii Victorovitch SIDELNIKOV, Kurt GIELISSEN, Oleg YAKUSHEV
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Patent number: 7629594Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.Type: GrantFiled: October 10, 2006Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anthon Soer, Thomas Stein, Kurt Gielissen
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Publication number: 20090173360Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.Type: ApplicationFiled: March 17, 2009Publication date: July 9, 2009Applicants: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich BANINE, Johannes Peterus Henricus DE KUSTER, Johannes Hubertus Josephina MOORS, Lucas Henricus Johannes STEVENS, Bastiaan Theodoor WOLSCHRIJN, Yurii Victorovitch SIDELNIKOV, Marc Hubertus Lorenz VAN DER VELDEN, Wouter Anthon SOER, Thomas STEIN, Kurt Gielissen
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Publication number: 20090021705Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.Type: ApplicationFiled: July 16, 2007Publication date: January 22, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Kurt Gielissen
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Publication number: 20080157006Abstract: A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.Type: ApplicationFiled: December 27, 2006Publication date: July 3, 2008Applicants: ASML NETHERLANDS B.V., Koninklijke Philips Electronics B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Kurt Gielissen
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Publication number: 20080083885Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.Type: ApplicationFiled: October 10, 2006Publication date: April 10, 2008Applicants: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn, Yurii Victorovitch Sidelnikov, Marc Hubertus Lorenz Van Der Velden, Wouter Anton Soer, Thomas Stein, Kurt Gielissen