Abstract: An inflatable light concentrating mirror (10) comprising a first transparent sheet (1) and a second reflective sheet (2), wherein the first sheet and second sheet are connected or sealed to each other, whereby a void is provided there-between, the void being adapted to receive a gas so as to inflate the light concentrating mirror, characterized in that the mirror further comprises tensioning means (14) adapted to produce a defined longitudinal tension (11) in at least the second sheet (2) such that wrinkles or creases therein are significantly reduced. The tensioning means comprises one or more tensioning devices (14) adapted to be attached to at least one mirror end or one free end of the second sheet, the tensioning device is configured to provide a pulling force (11) on the second sheet so as to provide the longitudinal tension.

Abstract: An inflatable light concentrating mirror (10) comprising a first transparent sheet (1) and a second reflective sheet (2), wherein the first sheet and second sheet are connected or sealed to each other, whereby a void is provided there-between, the void being adapted to receive a gas so as to inflate the light concentrating mirror, characterized in that the mirror further comprises tensioning means (14) adapted to produce a defined longitudinal tension (11) in at least the second sheet (2) such that wrinkles or creases therein are significantly reduced. The tensioning means comprises one or more tensioning devices (14) adapted to be attached to at least one mirror end or one free end of the second sheet, the tensioning device is configured to provide a pulling force (11) on the second sheet so as to provide the longitudinal tension.

Abstract: An apparatus (1) for the optical inspection of wafers is disclosed, which comprises an assembly unit (10) which carries optical elements (30, 31, 32, 33) of at least one illumination path (3) for a bright field illumination and optical elements (50, 51, 52, 60, 61, 62, 70, 71, 72, 80, 81, 82) of at least one illumination path (5, 6, 7, 8) for a dark field illumination. The assembly unit (10) furthermore carries plural optical elements (91, 92, 93, 94, 95, 96, 97, 98, 99, 100) of at least one detection path (91, 92). An imaging optical element (32) of the at least one illumination path (3) for the bright field illumination (30), imaging optical elements (51, 61, 71, 81) of the at least one illumination path for the dark field illumination, and imaging optical elements (91, 95, 96) of the at least one detection path (9) are designed in such a way that all illumination paths (3, 5, 6, 7, 8) and all detection paths (91, 92) are telecentric.

Abstract: An illumination mean for the inspection of flat substrates is disclosed. The flat substrate includes an upper edge area, a lower edge area and a front area. The illumination means is formed as an annular segment and comprises an opening into which at least the edge area of the flat substrate extends. A plurality of light sources are arranged on an annular segment in a housing. Inside the housing, a reflective element is provided so that the light from the light sources does not impinge perpendicularly on the upper edge area, the lower edge area and the front area of the flat substrate.

Abstract: An apparatus (1) for the optical inspection of wafers is disclosed, which comprises an assembly unit (10) which carries optical elements (30, 31, 32, 33) of at least one illumination path (3) for a bright field illumination and optical elements (50, 51, 52, 60, 61, 62, 70, 71, 72, 80, 81, 82) of at least one illumination path (5, 6, 7, 8) for a dark field illumination. The assembly unit (10) furthermore carries plural optical elements (91, 92, 93, 94, 95, 96, 97, 98, 99, 100) of at least one detection path (91, 92). An imaging optical element (32) of the at least one illumination path (3) for the bright field illumination (30), imaging optical elements (51, 61, 71, 81) of the at least one illumination path for the dark field illumination, and imaging optical elements (91, 95, 96) of the at least one detection path (9) are designed in such a way that all illumination paths (3, 5, 6, 7, 8) and all detection paths (91, 92) are telecentric.

Abstract: An illumination mean for the inspection of flat substrates is disclosed. The flat substrate includes an upper edge area, a lower edge area and a front area. The illumination means is formed as an annular segment and comprises an opening into which at least the edge area of the flat substrate extends. A plurality of light sources are arranged on an annular segment in a housing. Inside the housing, a reflective element is provided so that the light from the light sources does not impinge perpendicularly on the upper edge area, the lower edge area and the front area of the flat substrate.

Abstract: The invention concerns an apparatus for grasping and transporting wafers (1), having a two-armed grasping apparatus (7), pivotable about a central rotation point (13), at whose two free ends grasping/retaining elements (12) equipped with vacuum suction devices (11) are arranged. In order to make available an apparatus of the kind cited initially, as well as a transport arrangement equipped with such an apparatus, that make possible faster transport of the wafers (1) without long dead times and thus permit an increase in overall throughput, it is proposed according to the present invention that the two arms (10) of the grasping apparatus (7) be angled with respect to one another at an angle (&agr;) 90°<&agr;<180°. The invention furthermore concerns a complete transport arrangement equipped with such an apparatus, as well as a method for operating said transport arrangement.