Patents by Inventor Kurt Haller

Kurt Haller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11703460
    Abstract: Methods and systems for detecting and classifying defects based on the phase of dark field scattering from a sample are described herein. In some embodiments, throughput is increased by detecting and classifying defects with the same optical system. In one aspect, a defect is classified based on the measured relative phase of scattered light collected from at least two spatially distinct locations in the collection pupil. The phase difference, if any, between the light transmitted through any two spatially distinct locations at the pupil plane is determined from the positions of the interference fringes in the imaging plane. The measured phase difference is indicative of the material composition of the measured sample. In another aspect, an inspection system includes a programmable pupil aperture device configured to sample the pupil at different, programmable locations in the collection pupil.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: July 18, 2023
    Assignee: KLA Corporation
    Inventors: Zhiwei Xu, Kurt Haller, J. K. Leong, Christian Wolters
  • Publication number: 20210010949
    Abstract: Methods and systems for detecting and classifying defects based on the phase of dark field scattering from a sample are described herein. In some embodiments, throughput is increased by detecting and classifying defects with the same optical system. In one aspect, a defect is classified based on the measured relative phase of scattered light collected from at least two spatially distinct locations in the collection pupil. The phase difference, if any, between the light transmitted through any two spatially distinct locations at the pupil plane is determined from the positions of the interference fringes in the imaging plane. The measured phase difference is indicative of the material composition of the measured sample. In another aspect, an inspection system includes a programmable pupil aperture device configured to sample the pupil at different, programmable locations in the collection pupil.
    Type: Application
    Filed: June 26, 2020
    Publication date: January 14, 2021
    Inventors: Zhiwei Xu, Kurt Haller, J.K. Leong, Christian Wolters
  • Patent number: 9970873
    Abstract: A luminescent tag based defect detection system comprises a luminescent tag attachment assembly, an illumination source, one or more detectors, and a set of optical elements. The luminescent tag attachment assembly exposes a sample to one or more luminescent tag materials selectively attached to one or more defects on the sample. The illumination source generates illumination including one or more wavelengths corresponding to the one or more absorption spectra associated with the one or more luminescent tags. At least a portion of the set of optical elements directs illumination from the illumination source to the sample, and at least a portion of the set of optical elements directs illumination emitted from the one or more luminescent tag materials to the one or more detectors. A luminescent tag based defect detection system may also include a luminescent tag removal assembly to remove the luminescent tags after detection.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: May 15, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Donald Pettibone, Chuanyong Huang, Kurt Haller
  • Patent number: 9314827
    Abstract: A method for applying a lubricant while rolling metallic rolled stock, e.g., a rolled strip guided through a roll gap between two work rolls, may include the following steps: producing a mixture of lubricant and a carrier gas in an atomization device; supplying the mixture to individual spray nozzles of an arrangement of spray nozzles, in order to produce a continuous overall spray jet in the direction of the width of the rolled strip; and applying the mixture by means of the overall spray jet to the surface of at least one of the work rolls and/or to the surface of the rolled strip.
    Type: Grant
    Filed: September 2, 2011
    Date of Patent: April 19, 2016
    Assignee: SIEMENS VAI METALS TECHNOLOGIES GMBH
    Inventors: Valentin Atalla, Jian Chen, Gernot Dirisamer, Manfred Eder, Kurt Haller, Konrad Krimpelstätter, Krzysztof Mazurowski
  • Patent number: 8830464
    Abstract: The present disclosure is directed to a method for inspecting a wafer, the wafer including a film deposited on a surface of the wafer. The film may have a thickness that varies over the surface of the wafer. The method includes the step of measuring the thickness, refractive index, and extinction coefficient of the film across the surface of the wafer. With this data a film curve is created in real time. The method also includes the step of determining a size of a defect on the surface based on at least the film curve.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: September 9, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: David Feiler, Kurt Haller
  • Publication number: 20130298627
    Abstract: A method for applying a lubricant while rolling metallic rolled stock, e.g., a rolled strip guided through a roll gap between two work rolls, may include the following steps: producing a mixture of lubricant and a carrier gas in an atomization device; supplying the mixture to individual spray nozzles of an arrangement of spray nozzles, in order to produce a continuous overall spray jet in the direction of the width of the rolled strip; and applying the mixture by means of the overall spray jet to the surface of at least one of the work rolls and/or to the surface of the rolled strip.
    Type: Application
    Filed: September 2, 2011
    Publication date: November 14, 2013
    Inventors: Valentin Atalla, Jian Chen, Gernot Dirisamer, Manfred Eder, Kurt Haller, Krzysztof Mazurowski
  • Patent number: 7968354
    Abstract: Computer-implemented methods that include correlating a backside defect with a frontside defect detected on a specimen are provided. The defects are correlated if a portion of the backside defect on the backside of the specimen is opposite to a portion of the frontside defect on the frontside of the specimen. In particular, the defects are correlated if the portion of the backside defect is aligned with the portion of the frontside defect along an axis perpendicular to the frontside and the backside of the specimen. The method may also include altering a parameter of a process tool in response to the backside defect to reduce frontside defects on additional specimen processed in the process tool. Computer-implemented methods for analyzing data representing spatial characteristics of backside defects detected on a specimen to classify the backside defects are also provided. Analyzing the data may include spatial signature analysis of the data.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: June 28, 2011
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Kurt Haller, Susan S. Lopez
  • Publication number: 20070229809
    Abstract: Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.
    Type: Application
    Filed: April 4, 2006
    Publication date: October 4, 2007
    Applicant: KLA-Tencor Technologies Corp.
    Inventors: Alexander Belyaev, Daniel Kavaldjiev, Amith Murali, Aleksey Petrenko, Mike Kirk, David Shortt, Brian Haas, Kurt Haller
  • Publication number: 20070132987
    Abstract: Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.
    Type: Application
    Filed: December 14, 2005
    Publication date: June 14, 2007
    Inventors: Kurt Haller, David Shortt, Christian Wolters
  • Publication number: 20060274304
    Abstract: Systems and methods for inspecting an edge of a specimen are provided. One system includes an illumination subsystem configured to direct light to the edge of the specimen at an oblique angle of incidence. The plane of incidence of the light is substantially perpendicular to a plane substantially tangent to the edge of the specimen. The system also includes a detection subsystem configured to collect light scattered from the edge and to generate signals responsive to the scattered light. One method includes directing light to the edge of the specimen at an oblique angle of incidence. The plane of incidence is substantially perpendicular to a plane substantially tangent to the edge of the specimen. The method also includes collecting light scattered from the edge and generating signals responsive to the scattered light. The signals described above can be used to detect defects on the edge of the specimen.
    Type: Application
    Filed: June 6, 2005
    Publication date: December 7, 2006
    Inventors: Kurt Haller, Steve Cui, Jared Lera
  • Patent number: 6191338
    Abstract: A bandage strip and method for application and removal of the bandage is described. The bandage is tappered to induce the user to remove the bandage from the tappered end versus a wide end according to a particular direction. The bandage also contains a novel matrix which assists in diminishing the pain and skin maceration associated with removal of adhesive bandages.
    Type: Grant
    Filed: November 19, 1998
    Date of Patent: February 20, 2001
    Inventor: Kurt Haller
  • Patent number: D275897
    Type: Grant
    Filed: February 22, 1982
    Date of Patent: October 9, 1984
    Assignee: EFKA Werke Fritz Kiehn GmbH
    Inventors: Gunter Schutze, Kurt Haller