Abstract: A method of operating a blender having a rotatable cutting blade in a food preparation chamber includes providing a sensing light assembly, generating at least one sensing light beam below the food preparation chamber, inserting a cup containing food to be blended into the food preparation chamber, generating an error signal if a foreign object crosses the sensing light beam, and preventing or stopping rotation of the cutting blade in response to the error signal.

Abstract: An easily assembled blender with an internal frame holding a cupholder elevator assembly, a mix motor assembly, a food preparation chamber, a water heater assembly and a steamer assembly. The water heater and steamer assemblies are preferably on modular trays that slide into the internal frame. The water heater preferably also serves as a hot water reservoir and, to avoid overheating, has its heating coil located near its bottom. To resist scale deposits, polytetrafluoroethylene (PTFE) tubing is preferably used to transport steam from the steamer to the food preparation chamber. To expedite manufacture, a spring-biased idler assembly with a drive belt for the cupholder elevator assembly preferably snaps into a lower receiving port on the internal frame. Crisscrossing infrared light beams are preferably placed at the entrance of the food preparation chamber to detect whether the cup entering the chamber is the correct size and detect whether any foreign object is below the food preparation chamber.

Abstract: A cooling pedestal for supporting a substrate, comprises a support structure having cooling conduits to flow a fluid therethrough to cool the substrate, and a contact surface comprising a coating of a diamond-like carbon. The coating comprises (i) a coefficient of friction of less than about 0.3, (ii) an average surface roughness of less than about 0.4 micrometers, and (iii) a microhardness of at least about 8 GPa.

Abstract: An easily assembled blender with an internal frame holding a cupholder elevator assembly, a mix motor assembly, a food preparation chamber, a water heater assembly and a steamer assembly. The water heater and steamer assemblies are preferably on modular trays that slide into the internal frame. The water heater preferably also serves as a hot water reservoir and, to avoid overheating, has its heating coil located near its bottom. To resist scale deposits, polytetrafluoroethylene (PTFE) tubing is preferably used to transport steam from the steamer to the food preparation chamber. To expedite manufacture, a spring-biased idler assembly with a drive belt for the cupholder elevator assembly preferably snaps into a lower receiving port on the internal frame. Crisscrossing infrared light beams are preferably placed at the entrance of the food preparation chamber to detect whether the cup entering the chamber is the correct size and detect whether any foreign object is below the food preparation chamber.

Abstract: A cooling pedestal for supporting a substrate, comprises a support structure having cooling conduits to flow a fluid therethrough to cool the substrate, and a contact surface comprising a coating of a diamond-like carbon. The coating comprises (i) a coefficient of friction of less than about 0.3, (ii) an average surface roughness of less than about 0.4 micrometers, and (iii) a microhardness of at least about 8 GPa.

Abstract: A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure, the heat exchanger capable of heating or cooling a substrate.

Abstract: A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure, the heat exchanger capable of heating or cooling a substrate.

Abstract: A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon.

Abstract: A physical vapor deposition reactor includes a vacuum chamber with a sidewall, a ceiling and a retractable wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, the retractable wafer support pedestal having an internal electrode and a grounded base with a conductive annular flange extending from the base. A metal sputter target at the ceiling is energized by a high voltage D.C. source. The reactor has an RF plasma source power generator with a frequency suitable for exciting kinetic electrons is coupled to either the sputter target or to the internal electrode of the pedestal.