Abstract: The present invention relates to compositions comprising(a) a titanocene photoinitiator of the formula I ##STR1## (b) a 3-ketocoumarin of the formula II ##STR2## in which both R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, R.sup.4 is a radical of the formula V ##STR3## R.sup.5 is C.sub.1 -C.sub.20 alkyl, cycloalkyl having 5-7 ring carbon atoms, phenyl or naphthyl which are unsubstituted or substituted by one to three C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms or by one diphenylamino or C.sub.1 -C.sub.6 dialkylamino group, or is C.sub.7 -C.sub.9 aralkyl, a radical --(CH.dbd.CH).sub.a --C.sub.6 H.sub.5 or a radical of the formula V, a is 1 or 2, preferably 1, and R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy, phenyl, tolyl, xylyl or benzyl, and R.sup.11 can additionally also be a group --NR.sup.15 R.sup.16 or --OR.sup.15, wherein R.sup.15 and R.sup.

Abstract: The present invention relates to a negative photoresist essentially comprising(a) at least one solid, film-folrming polyphenol,(b) at least one polyfunctional epoxy resin and/or one polyfunctional vinyl ether compound, each of which can be dissolved, in the uncured state, in aqueous alkaline media with salt formation,(c) at least one cationic photoinitiator for component (b) and(d) customary additives, if desired.Components (a) and (b) can also be combined in one molecule. The resist can be developed in aqueous alkaline media.

Abstract: The photopolymerizable mixture described contains(A) at least one ethylenically unsaturated photopolymerisable compound,(B) a photoinitiator of the formula I ##STR1## and (C) a photosensitiser from the group of aromatic carbonyl compounds having a triplet energy of 225-310 kJ/mol, for example xanthones, thioxianthones, coumarins, phthalimides, phenones and the like.Ar is phenyl substituted in the 4-position by a substituted amino group, R.sup.1 and R.sup.2 are alkyl, R.sup.3 and R.sup.4 are alkyl or alkoxyalkyl, or R.sup.3 and R.sup.4 together are 3-oxapentamethylene. Said sensitisers (C) raise the activity of said photoinitiators (B) without shortening the shelf life of the mixtures. The photocurable mixtures are used especially as binders for printing inks or paints.

Abstract: A process for the preparation of a laminate including the steps(i) preparation of a layer by bringing into contact a fibrous substrate with a curable mixture containing an epoxy resin having on average at least two 1,2-epoxide groups per molecule or a mixture of these epoxy resins and a compound of the formula I ##STR1## or a mixture of these compounds, in which a and b are independent of one another 1 or 2, R.sup.1 is a .pi.-arene, R.sup.2 is a .pi.-arene or an indenyl- or cyclopentadienyl anion, X.sup.- is an anion [LQ.sub.m ].sup.- or an anion of a partly fluorinated or perfluorinated aliphatic or aromatic sulfonic acid, L is P, As or Sb, Q is fluorine or some of the Q substituents may also be hydroxyl groups, and m corresponds to a value which exceeds the valence of L by unity,(ii) preparation of a laminated sequence from at least two layered materials which are to be bonded together(iii) compression moulding of the said laminate sequence at elevated temperature.

Abstract: The invention relates to mixtures containing:(a) cationically polymerizable compound and(b) a compound of the formula I[R.sup.1 (FE.sup.II R.sup.2).sub.a ].sub.q.sup..sym.an an X.sup..crclbar.(I)in which a is 1 or 2, n is 1 or 2, R.sup.1 is a substituted or unsubstituted .pi.-arene, R.sup.2 is a substituted or unsubstituted .pi.-arene or cyclopentadienyl anion or indenyl anion, q is an integer from 1 to 3 and X is FSO.sub.3.sup.- or a q-valent anion of an organic sulfonic acid or of a carobxylic acid; R.sup.1 can also be a polymeric, aromatic ligand. The invention also relates to the novel compounds of the formula I. The curable mixtures can be processed in particular for the production of coatings having a good resistance to heat.

Abstract: The invention relates to a process for the preparation of compounds of formula Ia[R.sup.1 FeR.sup.2' ].sup..sym..sub.q [LQ.sub.m ].sup.q.crclbar.(Ia),wherein R.sup.1 is a .pi.-arene, R.sup.2' is an anion of a .pi.-arene, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom, q is an integer from 1 to 3 and m is an integer corresponding to the valency of L+q, said process comprises reacting an uncharged .pi.-complex of the formula IIIa[(R.sup.2').sub.2 Fe] (IIIa)with a .pi.arene R.sup.1 is in the presence of Al and a Lewis-acid followed by treatment with an acid or a salt of an acid of the anion [LQ.sub.m ].sup.q-, the improvement consisting essentially of using TiCl.sub.4 as a Lewis-acid.

Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.

Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.

Abstract: A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.

Abstract: Copper, lead, mercury, tin, gold, silver, palladium, osmium and/or cadmium can be deposited by photoredox reaction on semiconductor sulfide powders by irradiating a suspension of semiconductor sulfide powder in the presence of oxygen and optionally CO.sub.2, of an oxidizable system which optionally protects the semiconductor from photocorrosion, and of a salt or complex of copper, lead, mercury, tin, gold, silver, palladium, osmium and/or cadmium.

Abstract: Gold, silver or palladium can be deposited by photoredox reaction on semiconductor oxide powders by irradiating a suspension of semiconductor oxide powder in the presence of oxygen, CO.sub.2 or mixtures thereof, of an oxidizable system which protects the semiconductor from photocorrosion, and of a salt or complex of copper, lead, mercury, tin, gold, silver or palladium.

Abstract: A process is described for the selective production of hydrogen by means of heterogeneous photoredox catalysis, in which mixtures of water and alkali metal sulfites or sulfides, alkaline earth metal sulfites or sulfides or ammonium sulfites or sulfides are reacted under the action of light in a suspension of a cadmium sulfide, cadmium sulfoselenide or titanium dioxide/semiconductor powder which is at least partially coated with Cu, Cr, Ni, Co or a noble metal or mixtures thereof. The catalysts which can be employed in this process (coated semiconductor powders) are in some cases novel.