Abstract: The present disclosure relates to a method for fabricating an ion-implanted bit-patterned medium. The method includes providing a medium, the medium having a magnetic layer and a substrate and the magnetic layer includes migrating components. The method further includes forming a patterned mask layer on the surface of the magnetic layer and then ion-implanting the medium through the patterned mask layer, wherein the exposed portions of the magnetic layer comprise trench regions, the covered portions of the magnetic layer comprise island regions, and the transition areas between the trench regions and the island regions comprise boundary regions, wherein the island regions have more favorable magnetic properties than the trench regions. The method also includes annealing the medium, wherein the migrating components diffuse from inside the island regions towards the trench regions.

Abstract: A method for polishing a carbon overcoat of a magnetic media that results in a smooth surface free of carbon cluster debris. The method involves forming a magnetic disk having a carbon overcoat formed thereon. The carbon overcoat is then polished in the presence of ozone (O3). The heat from the polishing process along with the presence of the ozone, cause any carbon particles removed by the polishing to form CO2 gas so that there is no remaining carbon particle debris on the surface of the disk.

Abstract: The present disclosure relates to a magnetic medium that includes a substrate and a bit patterned magnetic layer applied to the substrate. The bit-patterned magnetic layer includes islands and each island includes a first magnetic material having a first magnetic anisotropy and that has a top surface, a bottom surface, and a peripheral surface. Each island also includes a second magnetic material covering the peripheral surface of the first magnetic material and having a second magnetic anisotropy that is higher than the first magnetic anisotropy. In one embodiment, the first magnetic material may comprise a nucleation domain in a centrally located surface portion of the magnetic islands and/or the second magnetic material may comprise an outer shell on the peripheral surface of the islands.

Abstract: The present disclosure relates to a planarized bit-patterned magnetic medium that has a magnetic layer, including island regions and trench regions, a first carbon layer applied over the magnetic layer, and a second carbon layer applied over the first carbon layer, wherein the second carbon layer has been removed in the island regions. The first carbon layer may have a lower material removal rate when exposed to chemical-mechanical polishing than the second carbon layer. The present disclosure also relates to a method for planarizing a bit-patterned magnetic medium and a slurry composition for the chemical-mechanical polishing of carbon layers, the slurry composition including an oxidizer component, a catalyst component, a particulate component, and a reaction control component.

Abstract: According to one embodiment, a patterned magnetic storage medium is disclosed herein. The magnetic storage medium includes a magnetic domain, a substantially non-magnetic region laterally adjacent to the magnetic domain, and an exchange spring structure disposed between the magnetic domain and the laterally adjacent non-magnetic region wherein the exchange spring structure comprises implanted ions.

Abstract: A method for polishing a carbon overcoat of a magnetic media that results in a smooth surface free of carbon cluster debris. The method involves forming a magnetic disk having a carbon overcoat formed thereon. The carbon overcoat is then polished in the presence of ozone (O3). The heat from the polishing process along with the presence of the ozone, cause any carbon particles removed by the polishing to form CO2 gas so that there is no remaining carbon particle debris on the surface of the disk.

Abstract: The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.

Abstract: The present disclosure relates to a planarized bit-patterned magnetic medium that has a magnetic layer, including island regions and trench regions, a first carbon layer applied over the magnetic layer, and a second carbon layer applied over the first carbon layer, wherein the second carbon layer has been removed in the island regions. The first carbon layer may have a lower material removal rate when exposed to chemical-mechanical polishing than the second carbon layer. The present disclosure also relates to a method for planarizing a bit-patterned magnetic medium and a slurry composition for the chemical-mechanical polishing of carbon layers, the slurry composition including an oxidizer component, a catalyst component, a particulate component, and a reaction control component.

Abstract: An apparatus, system, and method are provided for reducing edge damage of a disk during chemical mechanical polishing. The apparatus includes a disk carrier configured to receive a disk, the disk having an outside edge and an inside edge, a raised ring adjacent the outside edge of the disk and extending from a surface of the disk carrier to a height greater than a height of the disk, and a raised column adjacent the inside edge of the disk and having a height greater than a height of the disk. The system includes a disk carrier for receiving a disk, a raised ring adjacent the outside edge of each opening, and plugs insertable into a central opening in the disk and having a height greater than a height of the disk. The method includes providing the apparatus, inserting a disk into the apparatus, and polishing the disk.

Abstract: A method of storing data in a storage medium includes determining a compensation unit for a portion of the storage medium, reading a first set of bit values from the portion of the storage medium, determining a compensation value based at least in part on an erroneous bit value of the first set of bit values and the compensation unit, and storing the compensation value in association with the portion of the storage medium.

Abstract: A method of fabricating workpieces includes one or more layers on a substrate that are masked with an ion implantation mask comprising two or more layers. The mask layers include a first mask layer closer to the substrate, and a second mask layer on the first mask layer. The method also comprises ion implanting one or more of the layers on the substrate. Ion implantation may form portions with altered physical properties from the layers under the mask. The portions may form a plurality of non-magnetic regions corresponding to apertures in the mask.

Abstract: According to one embodiment, a method for patterning a medium having a patterned hard mask applied thereon is disclosed herein. The patterned hard mark includes a plurality of apertures exposing portions of the medium. The method includes directing ions toward the medium, implanting a portion of the ions into the exposed portions of the medium, removing a layer of the patterned hard mask with another portion of the ions, and depositing hard mask material onto the patterned hard mask. Depositing hard mask material onto the exposed portions of the medium may follow implantation of the portion of the ions into the exposed portions of the medium.

Abstract: The present disclosure relates to a method for fabricating an ion-implanted bit-patterned medium. The method includes providing a medium, the medium having a magnetic layer and a substrate and the magnetic layer includes migrating components. The method further includes forming a patterned mask layer on the surface of the magnetic layer and then ion-implanting the medium through the patterned mask layer, wherein the exposed portions of the magnetic layer comprise trench regions, the covered portions of the magnetic layer comprise island regions, and the transition areas between the trench regions and the island regions comprise boundary regions, wherein the island regions have more favorable magnetic properties than the trench regions. The method also includes annealing the medium, wherein the migrating components diffuse from inside the island regions towards the trench regions.

Abstract: The present disclosure relates to a magnetic medium that includes a substrate and a bit patterned magnetic layer applied to the substrate. The bit-patterned magnetic layer includes islands and each island includes a first magnetic material having a first magnetic anisotropy and that has a top surface, a bottom surface, and a peripheral surface. Each island also includes a second magnetic material covering the peripheral surface of the first magnetic material and having a second magnetic anisotropy that is higher than the first magnetic anisotropy. In one embodiment, the first magnetic material may comprise a nucleation domain in a centrally located surface portion of the magnetic islands and/or the second magnetic material may comprise an outer shell on the peripheral surface of the islands.

Abstract: The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.

Abstract: A method of storing data in a storage medium includes determining a compensation unit for a portion of the storage medium, reading a first set of bit values from the portion of the storage medium, determining a compensation value based at least in part on an erroneous bit value of the first set of bit values and the compensation unit, and storing the compensation value in association with the portion of the storage medium.

Abstract: According to one embodiment, a patterned medium is disclosed herein. The patterned medium includes a patterned layer, a stop layer, and a fill layer. The patterned layer includes plurality of grooves. The stop layer is positioned on the patterned layer. The stop layer is at least partially positioned within the plurality of grooves and a portion of the stop layer may be positioned on walls of the grooves of the patterned layer. The fill layer is at least partially positioned within the grooves between portions of the stop layer. The stop layer substantially separates the fill layer from the patterned layer.

Abstract: According to one embodiment, a patterned medium is disclosed herein. The patterned medium includes a patterned layer, a stop layer, and a fill layer. The patterned layer includes plurality of grooves. The stop layer is positioned on the patterned layer. The stop layer is at least partially positioned within the plurality of grooves and a portion of the stop layer may be positioned on walls of the grooves of the patterned layer. The fill layer is at least partially positioned within the grooves between portions of the stop layer. The stop layer substantially separates the fill layer from the patterned layer.

Abstract: An apparatus, system, and method are provided for reducing edge damage of a disk during chemical mechanical polishing. The apparatus includes a disk carrier configured to receive a disk, the disk having an outside edge and an inside edge, a raised ring adjacent the outside edge of the disk and extending from a surface of the disk carrier to a height greater than a height of the disk, and a raised column adjacent the inside edge of the disk and having a height greater than a height of the disk. The system includes a disk carrier for receiving a disk, a raised ring adjacent the outside edge of each opening, and plugs insertable into a central opening in the disk and having a height greater than a height of the disk. The method includes providing the apparatus, inserting a disk into the apparatus, and polishing the disk.

Abstract: A method of fabricating workpieces includes one or more layers on a substrate that are masked with an ion implantation mask comprising two or more layers. The mask layers include a first mask layer closer to the substrate, and a second mask layer on the first mask layer. The method also comprises ion implanting one or more of the layers on the substrate. Ion implantation may form portions with altered physical properties from the layers under the mask. The portions may form a plurality of non-magnetic regions corresponding to apertures in the mask.