Patents by Inventor Kwan-hua Lee

Kwan-hua Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • C20 and C22 acids to promote wound healing
    Patent number: 4048204
    Abstract: The C20 and C22 vinylogs of desmethyl retinoic acid has been found highly effective in promoting wound healing. The acid is applied to the wound as a solution, ointment or powder. These acids are the most effective yet found for healing wounds, yet do not have some of the undesirable side effects of retinoic acid.The compounds of this invention have the following formula: ##STR1## where X is an integer of from 5 to 6.
    Type: Grant
    Filed: September 10, 1976
    Date of Patent: September 13, 1977
    Assignee: The Regents of the University of California
    Inventor: Kwan-Hua Lee
  • Psoriasis treatment with retinoic acid analogs
    Patent number: 4021573
    Abstract: Skin diseases resulting from abnormal metabolic processes, such as acne and psoriasis, are treated on a repetitive basis, either internally or topically, with a dermatologically sufficient amount of 11-(2',6',6'-trimethylcyclohex-1'-enyl-1')-5,9-dimethylundeca-2,4,6,8,10-p entenoic acid or its physiologically acceptable salts to reduce the inflammation. The subject acid or its salts are found to provide remission of the dermatologically diseased condition, while avoiding side effects concommitant with the use of other analgous compounds.
    Type: Grant
    Filed: November 5, 1975
    Date of Patent: May 3, 1977
    Assignee: The Regents of the University of California
    Inventor: Kwan-Hua Lee
  • Compositions and methods of treating psoriasis with vinyligs of desmethyl retinoic acid
    Patent number: 3966967
    Abstract: The C20 and C22 vinylogs of desmethyl retinoic acid have been found highly effective in promoting wound healing, in the treatment of acne, psoriasis and related skin disorders. The acid is applied to the site as a solution, ointment or powder. These acids are the most effective yet found for such purposes yet do not have some of the undesirable side effects of retinoic acid.
    Type: Grant
    Filed: October 29, 1974
    Date of Patent: June 29, 1976
    Assignee: The Regents of the University of California
    Inventor: Kwan-Hua Lee
  • Acne and psoriasis treatment with retinoic acid analogs
    Patent number: 3934028
    Abstract: Skin diseases resulting from abnormal metabolic processes, such as acne and psoriasis, are treated on a repetitive basis, either internally or topically, with a dermatologically sufficient amount of 11-(2',6',6'-trimethylcyclohex-1'-enyl-1')-5,9-dimethylundeca-2,4,6,8,10-p entenoic acid or its physiologically acceptable salts to reduce the inflammation. The subject acid or its salts are found to provide remission of the dermatologically diseased condition, while avoiding side effects concommitant with the use of other analogous compounds.
    Type: Grant
    Filed: April 22, 1974
    Date of Patent: January 20, 1976
    Assignee: The Regents of the University of California
    Inventor: Kwan-hua Lee