Abstract: The present invention relates to an image encoding and decoding technique, and more particularly, to an image encoder and decoder using unidirectional prediction. The image encoder includes a dividing unit to divide a macro block into a plurality of sub-blocks, a unidirectional application determining unit to determine whether an identical prediction mode is applied to each of the plurality of sub-blocks, and a prediction mode determining unit to determine a prediction mode with respect to each of the plurality of sub-blocks based on a determined result of the unidirectional application determining unit.

Abstract: Disclosed are: a reinforced composite membrane-type polymer electrolyte membrane which can prevent the loss of an ion conductor even when the ion conductor is chemically deteriorated due to long-term use, and thus has remarkably enhanced mechanical and chemical durability; a method for manufacturing same; and an electrochemical device comprising same. The polymer electrolyte membrane of the present invention comprises: a non-crosslinked ion conductor; and a porous support having a plurality of pores filled with the ion conductor, wherein the porous support comprises a polymer having at least one crosslinking functional group, and the crosslinking functional group is a functional group which, when the ion conductor is deteriorated, can cause crosslinking of the ion conductor by binding to the deteriorated ion conductor.

Abstract: The present invention relates to a method and device for predicting aneurysm rupture using artificial intelligence based on morphological and hemodynamic factors of aneurysms. The method for predicting aneurysm rupture according to one embodiment of the present disclosure may comprises acquiring an image of a blood vessel; deriving moment of inertia based on the image of the blood vessel; acquiring a hemodynamic factor; outputting the rupture risk when the moment of inertia and the hemodynamic factor are inputted to a pre-trained artificial neural network; and predicting the possibility of rupture as possible when the rupture risk is greater than a predetermined rupture threshold value, and predicting the possibility of rupture as absent when the rupture risk is not greater than the predetermined rupture threshold value.

Abstract: Power semiconductor device with reduced loss and manufacturing method the same disclosed. Power semiconductor device include a first drift region of a first conductivity type, a second drift region of the first conductivity type formed by epitaxially growing on the first drift region and a plurality of buried ion regions of a second conductivity type formed to be buried in the second drift region.

Abstract: Silicon carbide power semiconductor device having uniform channel length and manufacturing method thereof disclosed. The power semiconductor device includes a drift region of a first conductivity type, a plurality of body regions of a second conductivity type, being formed to be spaced apart from each other with a preset WS in a horizontal direction in an upper region of the drift region, a JFET region of the first conductivity type and a low-resistance region of the first conductivity type, being formed in a separation space between adjacent body regions to contact their side surfaces with the adjacent body regions and a source region of the first conductivity type, being formed in a surface region in the body region in contact with the low-resistance region to be spaced apart from the low-resistance region by a preset channel length.

Abstract: Silicon carbide power semiconductor device having uniform channel length and manufacturing method thereof disclosed. The power semiconductor device includes a drift region of a first conductivity type, a plurality of body regions of a second conductivity type, being formed to be spaced apart from each other with a preset WS in a horizontal direction in an upper region of the drift region, a JFET region of the first conductivity type and a low-resistance region of the first conductivity type, being formed in a separation space between adjacent body regions to contact their side surfaces with the adjacent body regions and a source region of the first conductivity type, being formed in a surface region in the body region in contact with the low-resistance region to be spaced apart from the low-resistance region by a preset channel length.

Abstract: Power semiconductor device with dual shield structure in silicon carbide and manufacturing method thereof disclosed.

Abstract: Power semiconductor device with reduced loss and manufacturing method the same disclosed. Power semiconductor device include a first drift region of a first conductivity type, a second drift region of the first conductivity type formed by epitaxially growing on the first drift region and a plurality of buried ion regions of a second conductivity type formed to be buried in the second drift region.

Abstract: Power semiconductor device capable of controlling slope of current and voltage during dynamic switching disclosed. The power semiconductor device may include a semiconductor substrate and a cell array being consisted of a plurality of transistor cells on an active area, wherein each of the plurality of transistor cells may include an emitter region, a body region, a contact region and a gate region, wherein non-uniform threshold voltages may be respectively set in the plurality of transistor cells constituting the cell array, wherein a gate signal may be applied to each of the plurality of transistor cells through an input/output unit, wherein the input/output unit may include a first gate signal path configured for supplying a gate charging current to the gate regions in each of the plurality of transistor cells and a second gate signal path configured for discharging a gate discharging current from the gate region.

Abstract: A hybrid comparator includes an analog signal combiner and a dynamic latch. The analog signal combiner is configured to receive an input analog signal and an input reference signal, and generate an analog output signal by combining the input analog signal and the input reference signal. The dynamic latch is configured to receive the analog output signal and a clock signal, and generate a digital output signal.

Abstract: A MOS-gate power semiconductor device includes: a main device area including an active area and an edge termination area; and an auxiliary device area horizontally formed outside the main device area so as to include one or more diodes. Accordingly, it is possible to protect a circuit from an overcurrent and thus to prevent deterioration and/or destruction of a device due to the overcurrent.

Abstract: A charge-balance power device and a method of manufacturing the charge-balance power device are provided. The charge-balance power device includes: a charge-balance body region in which one or more first conductive type pillars as a first conductive type impurity region and one or more second conductive type pillars as a second conductive type impurity region are arranged; a first conductive type epitaxial layer that is formed on the charge-balance body region; and a transistor region that is formed in the first conductive type epitaxial layer. With this invention, it is possible to form the same charge-balance body region regardless of the structure of the transistor region formed on the top side of wafer.

Abstract: A MOS-gate power semiconductor device includes: a main device area including an active area and an edge termination area; and an auxiliary device area horizontally formed outside the main device area so as to include one or more diodes. Accordingly, it is possible to protect a circuit from an overcurrent and thus to prevent deterioration and/or destruction of a device due to the overcurrent.

Abstract: A MOS-gate power semiconductor device is provided which includes: one or more P-type wells formed under one or more of a gate metal electrode and a gate bus line and electrically connected to an emitter metal electrode; and one or more N-type wells formed in the P-type well and electrically connected to one or more of the gate metal electrode and the gate bus line. According to this configuration, it is possible to suppress deterioration and/or destruction of a device due to an overcurrent.

Abstract: Provided are a power semiconductor device using a silicon substrate as a FS layer and a method of manufacturing the same. A semiconductor substrate of a first conductivity type is prepared. An epitaxial layer is grown on one surface of the semiconductor substrate. Here, the epitaxial layer is doped at a concentration lower than that of the semiconductor substrate and is intended to be used as a drift region. A base region of a second conductivity type is formed in a predetermined region of the epitaxial layer. An emitter region of the first conductivity type is formed in a predetermined region of the base region. A gate electrode with a gate insulating layer is formed on the base region between the emitter region and the drift region of the epitaxial layer. A rear surface of the semiconductor substrate is ground to reduce the thickness of the semiconductor substrate, thereby setting an FS region of the first conductivity type.

Abstract: Provided are a power semiconductor device using a silicon substrate as a FS layer and a method of manufacturing the same. A semiconductor substrate of a first conductivity type is prepared. An epitaxial layer is grown on one surface of the semiconductor substrate. Here, the epitaxial layer is doped at a concentration lower than that of the semiconductor substrate and is intended to be used as a drift region. A base region of a second conductivity type is formed in a predetermined region of the epitaxial layer. An emitter region of the first conductivity type is formed in a predetermined region of the base region. A gate electrode with a gate insulating layer is formed on the base region between the emitter region and the drift region of the epitaxial layer. A rear surface of the semiconductor substrate is ground to reduce the thickness of the semiconductor substrate, thereby setting an FS region of the first conductivity type.

Abstract: An MOS transistor in the surface of a semiconductor substrate (180) of a first conductivity type, which has a grid of isolations (171) in the surface, each grid unit surrounding a rectangular semiconductor island (102). Each island contains three parallel regions of the opposite conductivity type: the center region (104) is operable as the transistor drain and the two other regions (103 and 105), abutting the isolations, are operable as transistor sources. Transistor gates (106 and 107) are between the parallel regions, completing the formation of two transistors having one common drain. Electrical contacts (108) are placed on both source regions and the drain region. The source contacts are placed so that the spacing (120) between each contact and its respective isolation is at least twice as large as the spacing (121) between each contact and the gate.

Abstract: An MOS transistor in the surface of a semiconductor substrate (180) of a first conductivity type, which has a grid of isolations (171) in the surface, each grid unit surrounding a rectangular semiconductor island (102). Each island contains three parallel regions of the opposite conductivity type: the center region (104) is operable as the transistor drain and the two other regions (103 and 105), abutting the isolations, are operable as transistor sources. Transistor gates (106 and 107) are between the parallel regions, completing the formation of two transistors having one common drain. Electrical contacts (108) are placed on both source regions and the drain region. The source contacts are placed so that the spacing (120) between each contact and its respective isolation is at least twice as large as the spacing (121) between each contact and the gate.

Abstract: An MOS transistor in the surface of a semiconductor substrate (180) of a first conductivity type, which has a grid of isolations (171) in the surface, each grid unit surrounding a rectangular substrate island (102). Each island contains two parallel regions of the opposite conductivity type: one region (174) is operable as the transistor drain and the other region (173) is operable as the transistor drain, each region abutting the isolation. A transistor gate (105) is between the parallel regions, completing the formation of a transistor. Electrical contacts (106) are placed on the source region (173) so that the spacing (120) between each contact and the adjacent isolation is at least twice as large as the spacing (121) between each contact and the gate. A plurality of these islands are interconnected to form a multi-finger MOS transistor.

Abstract: An insulated gate bipolar transistor according to the present invention has a first and a second emitter regions. A diffusion region of the first conductive type is formed in the first emitter region of the second conductive type. The second emitter region has a region having a high concentration compared with the remaining portion of the second emitter region. The high concentration region is adjacent to the diffusion region and positioned towards the center of a first conductive type well. In addition, the junction depth of the high concentration region is similar to the diffusion region.