Patents by Inventor Kwang-Hwyi Im

Kwang-Hwyi Im has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomers, polymers and photoresist compositions
    Patent number: 11487203
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: November 1, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
  • MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20180203352
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Application
    Filed: December 29, 2017
    Publication date: July 19, 2018
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im