Patents by Inventor Kwang Hyeon Lim

Kwang Hyeon Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6838120
    Abstract: A method for manufacturing carbon/silicon-carbide composite by a ‘One-shot’ process including carbonization, heat processing, infiltration, and forming an anti-oxidation layer on surface is provided through the steps of: 1) hardening a stacked carbon/phenolic preform; 2) carbonization and heat processing the preform until the temperature reaches at 2300° C.; 3) infiltrating and sintering the liquid metal silicon within the temperature of 1400˜1800° C.; and 4) inducting a compound including SiO2to gas phase and heat processing it while forming an anti-oxidation layer on the surface within temperature range of 2000° C.˜2700° C. (desirably, in the range of higher than 2300° C., and more desirably, at the temperature near 2500° C.). Herein, the carbonization, heat processing, and ultra-high heat processing might be performed at the same time in the step 2) and the step 4) might not be performed.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: January 4, 2005
    Assignee: Agency for Defense Development
    Inventors: Yun Chul Kim, Yong Gu Won, Hyung Sik Lee, Kwang Hyeon Lim, Dong Hyuk Sin
  • Publication number: 20020109250
    Abstract: A method for manufacturing carbon/silicon-carbide composite by a ‘One-shot’ process including carbonization, heat processing, infiltration, and forming an anti-oxidation layer on surface is provided through the steps of: 1) hardening a stacked carbon/phenolic preform; 2) carbonization and heat processing the preform until the temperature reaches at 2300° C.; 3) infiltrating and sintering the liquid metal silicon within the temperature of 1400˜1800° C.; and 4) inducting a compound including SiO2to gas phase and heat processing it while forming an anti-oxidation layer on the surface within temperature range of 2000° C.˜2700° C. (desirably, in the range of higher than 2300° C., and more desirably, at the temperature near 2500° C.). Herein, the carbonization, heat processing, and ultra-high heat processing might be performed at the same time in the step 2) and the step 4) might not be performed.
    Type: Application
    Filed: February 11, 2002
    Publication date: August 15, 2002
    Applicant: AGENCY FOR DEFENSE DEVELOPMENT
    Inventors: Yun Chul Kim, Yong Gu Won, Hyung Sik Lee, Kwang Hyeon Lim, Dong Hyuk Sin