Patents by Inventor Kwang-Ja Park

Kwang-Ja Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the deposition of diamond film on an electroless-plated nickel layer
    Patent number: 5824367
    Abstract: A method for the deposition of a diamond film, which includes the steps of immersing metallic or nonmetallic substrate in and electroless nickel plating bath containing a reducing agent to form a nickel layer; and depositing the diamond film on the electroless nickel plated substrate. As a result, employing electroless plating to form an inter layer is improved. In addition, the diamond film can be formed regardless of the type of materials used.
    Type: Grant
    Filed: February 21, 1997
    Date of Patent: October 20, 1998
    Assignee: National Institute of Technology and Quality
    Inventors: Jung-Il Park, Kwang-Ja Park