Patents by Inventor Kwang-Mo Choi

Kwang-Mo Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition comprising amide compound and pattern formation methods using the same
    Patent number: 11874603
    Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.
    Type: Grant
    Filed: September 15, 2021
    Date of Patent: January 16, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Philjae Kang, Kwang Mo Choi, Yoo Jung Yoon, Won Seok Lee, Hae-Jin Lim
  • PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME
    Publication number: 20230099348
    Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.
    Type: Application
    Filed: September 15, 2021
    Publication date: March 30, 2023
    Inventors: Philjae Kang, Kwang Mo Choi, Yoo Jung Yoon, Won Seok Lee, Hae-Jin Lim
  • Monomers, polymers and photoresist compositions
    Patent number: 11480878
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 25, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
  • MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20180059545
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim