Patents by Inventor Kwok M. Wong

Kwok M. Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6726804
    Abstract: A plasma processing apparatus and a method of operating a plasma processing apparatus are disclosed. In one embodiment, a first RF signal at a carrier frequency and a second RF signal at a second frequency are generated. An amplitude modulated signal is formed by modulating the first RF signal with the second RF signal. A plasma is generated within the plasma processing chamber using the amplitude modulated signal. Generating plasma using a frequency modulated signal is also disclosed.
    Type: Grant
    Filed: January 22, 2001
    Date of Patent: April 27, 2004
    Inventors: Liang-Guo Wang, Kwok M. Wong, Shamouil Shamouilian, Kartik Ramaswamy
  • Publication number: 20020096257
    Abstract: A plasma processing apparatus and a method of operating a plasma processing apparatus are disclosed. In one embodiment, a first RF signal at a carrier frequency and a second RF signal at a second frequency are generated. An amplitude modulated signal is formed by modulating the first RF signal with the second RF signal. A plasma is generated within the plasma processing chamber using the amplitude modulated signal. Generating plasma using a frequency modulated signal is also disclosed.
    Type: Application
    Filed: January 22, 2001
    Publication date: July 25, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Liang-Guo Wang, Kwok M. Wong, Shamouil Shamouilian, Kartik Ramaswamy