Abstract: Provided herein are etching, cleaning and drying methods using a supercritical fluid, and a chamber system for conducting the same. The etching method includes etching the material layer using a supercritical carbon dioxide in which an etching chemical is dissolved, and removing an etching by-product created from a reaction between the material layer and the etching chemical using a supercritical carbon dioxide in which a cleaning chemical is dissolved. Methods of manufacturing a semiconductor device are also provided.

Abstract: A domestic mediation server receives information of application for education from a user, provides offer information of domestic and foreign agents or education institutions, and is informed of at least one agent or education institution. In the case that the user selects an agent, the domestic mediation server receives a detailed information for entrance of education institutions corresponding to the application information from the agent. The detailed entrance information is ranked in order of matching with the application information and provided to the user. When the user determines to enter a specific education institution, the agent charges the user education expenses including an entrance fee of the education institution and its commission. When the user settles the education expenses, the user is provided with an insurance policy for guaranteeing safe settlement.