Abstract: A carrier apparatus for holding a shaped sheet material includes a first frame structure with a first front surface including a first outer peripheral region and a first inner peripheral region separated by a first step. The apparatus further includes a second frame structure with a second front surface including a second outer peripheral region and a second inner peripheral region separated by a second step. The second front surface is configured to engage with the first front surface so that the second outer peripheral region is at least partially in contact with the first outer peripheral region and the second step circumferentially mates the first step with the second inner peripheral region opposing to the first inner peripheral region by a gap. The carrier apparatus further includes one or more locking mechanisms and a shaped wing structure extended from outer peripheral edge of the first frame structure.

Abstract: A substrate polishing system includes a delivery arm having a nozzle configured to combine a rinse fluid and a gas into an atomized spray, and to direct the atomized spray toward a polishing pad. The atomization process causes droplets of the rinse agent in the atomized spray to become negatively charged. The negative charge causes in the rinse agent to adhere to waste particles and slurry, which facilitates removal thereof from the polishing pad.