Abstract: Provided are an apparatus and method for controlling a robot. The apparatus includes an active force detector configured to detect an active force, to which a natural force caused by a physical interaction between a user and a robot and not reflecting an operation intention of the user is applied, applied by the user to the robot operating through the physical interaction with the user, a compensator configured to determine a compensation force for actively compensating for the natural force applied to the active force by using a method of optimizing an internal parameter of a predefined dynamics model, and a controller configured to determine an operation instruction for controlling an operation of the robot from a result obtained by applying the compensation force determined by the compensator to the active force detected by the active force detector and operate the robot.

Abstract: Provided are an apparatus and method for controlling a robot. The apparatus includes an active force detector configured to detect an active force, to which a natural force caused by a physical interaction between a user and a robot and not reflecting an operation intention of the user is applied, applied by the user to the robot operating through the physical interaction with the user, a compensator configured to determine a compensation force for actively compensating for the natural force applied to the active force by using a method of optimizing an internal parameter of a predefined dynamics model, and a controller configured to determine an operation instruction for controlling an operation of the robot from a result obtained by applying the compensation force determined by the compensator to the active force detected by the active force detector and operate the robot.

Abstract: A chemical vapor deposition unit is invented for forming a uniform thin film over the entire surface of a substrat by the vapor-deposition. The chemical vapor deposition unit comprises a reaction chamber isolated from the outside and kept under vacuum, a susceptor, on which at least one substrate is placed, installed in the reaction chamber such that it can rotate, and an injector, including independently formed first and second gas passages, and first and second gas injecting pipes that communicate with the respective gas passages and respective outlets, for injecting respective first and second gases onto the susceptor, the injector injecting the different gases independently. The injector further comprises a gas injecting part for communicating with the second gas passage so that only the second gas, which is a non-reactive carrier gas, is injected in a central region of the susceptor.