Patents by Inventor Kyeong Jang
Kyeong Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11046811Abstract: A method for preparing a thermal adhesive copolymerized polyester resin is disclosed. The method includes: a transesterification reaction in a reaction mixture of a diol compound according to Formula 1, for example, 2-Methyl-1,3-propanediol, an isophthalic acid (IPA) or an IPA derivative as an acid component, and polyethylene terephthalate; and a condensation polymerization reaction of the reaction mixture to prepare a copolymerized polyester resin. The copolymerized polyester resin has an intrinsic viscosity (I.V.) of 0.5 dL/g to 0.75 dL/g, a softening point (Ts) of 100° C. to 160° C., and a glass transition temperature (Tg) of 60° C. to 70° C. The copolymerized polyester resin can be effectively used in fields of clothing, automobile parts, as a thermal adhesive fiber. wherein R1 is an alkyl group having 1 to 4 carbon atoms, a and b are each independently an integer ranging from 0 to 3, and each solid line represents a single bond when a and b is 0.Type: GrantFiled: March 4, 2016Date of Patent: June 29, 2021Assignee: Hurvis CorporationInventors: Boo-Kyeong Jang, Hyun-Wook Shin, Seong-Yoon Park, Yo-Seung Ho
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Patent number: 10975219Abstract: Provided are an automobile interior/exterior material including a low-melting-point polyester resin fiber layer, and a method of manufacturing the same. More particularly, an automobile interior/exterior material having excellent processability and price competitiveness without deterioration of properties, such as strength and durability, is provided.Type: GrantFiled: September 8, 2016Date of Patent: April 13, 2021Assignee: Huvis CorporationInventors: Boo-Kyeong Jang, Hyun-Wook Shin, Seong-Yoon Park, Yo-Seung Ho
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Patent number: 10553438Abstract: A method for fabricating a semiconductor device includes stacking a semiconductor layer, a first sacrificial layer, and a second sacrificial layer, patterning the second sacrificial layer to form a second sacrificial pattern, forming a spacer pattern on both sides of the second sacrificial pattern, wherein a pitch of the spacer pattern is constant, and a width of the spacer pattern is constant, removing the second sacrificial pattern, forming a mask layer that covers the spacer pattern, forming a supporting pattern on the mask layer, wherein a width of the supporting pattern is greater than a width of the spacer pattern, and the supporting pattern is overlapped with the spacer pattern, transferring the supporting pattern and the spacer pattern onto the first sacrificial layer to form gate and supporting patterns, and transferring the gate and supporting patterns onto the semiconductor layer to form a gate and a supporting gate.Type: GrantFiled: January 19, 2017Date of Patent: February 4, 2020Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Yun Kyeong Jang, Sang Jin Kim, Dong Woon Park, Joon Soo Park, Chang Jae Yang, Kwang Sub Yoon, Hye Kyoung Jue
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Publication number: 20190048133Abstract: The present invention relates to a compound for preparing a copolymerized polyester resin and a method for preparing a copolymerized polyester resin using the same. The method for preparing a copolymerized polyester resin according to the present invention uses a compound represented by chemical formula 1, thereby exhibiting an excellent effect and reducing the manufacturing cost. In addition, the resin thus prepared has excellent thermal adhesion even at low temperatures and generates few byproducts during a polymerization procedure, so that the resin is advantageous in view of workability and processability.Type: ApplicationFiled: March 4, 2016Publication date: February 14, 2019Applicant: Huvis CorporationInventors: Boo-Kyeong Jang, Hyun-Wook Shin, Seang-Yoon Park, Yo-Seung Ho
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Patent number: 10168627Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.Type: GrantFiled: April 22, 2016Date of Patent: January 1, 2019Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sungjoo Kim, Yun kyeong Jang, Jinhong Park, Dohyun Seo, HyunHoon Lee
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Publication number: 20180346681Abstract: Provided are an automobile interior/exterior material including a low-melting-point polyester resin fiber layer, and a method of manufacturing the same. More particularly, an automobile interior/exterior material having excellent processability and price competitiveness without deterioration of properties, such as strength and durability, is provided.Type: ApplicationFiled: September 8, 2016Publication date: December 6, 2018Inventors: Boo-Kyeong JANG, Hyun-Wook SHIN, Seong-Yoon PARK, Yo-Seung HO
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Publication number: 20180291533Abstract: The present disclosure relates to a low-melting conjugate fiber prepared by complex radiation of: a general polyester as a core component; and a copolymer polyester resin for a low-melting binder prepared by copolymerizing an acid component composed of terephthalic acid and isophthalic acid or an ester-forming derivative thereof as a sheath component and a diol component composed of 2-methyl-1,3-propanediol, diethylene glycol, and ethylene glycol.Type: ApplicationFiled: February 29, 2016Publication date: October 11, 2018Inventors: BOO KYEONG JANG, HYUN WOOK SHIN, SEONG YOON PARK, YO SEUNG HO
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Publication number: 20170372906Abstract: A method for fabricating a semiconductor device includes stacking a semiconductor layer, a first sacrificial layer, and a second sacrificial layer, patterning the second sacrificial layer to form a second sacrificial pattern, forming a spacer pattern on both sides of the second sacrificial pattern, wherein a pitch of the spacer pattern is constant, and a width of the spacer pattern is constant, removing the second sacrificial pattern, forming a mask layer that covers the spacer pattern, forming a supporting pattern on the mask layer, wherein a width of the supporting pattern is greater than a width of the spacer pattern, and the supporting pattern is overlapped with the spacer pattern, transferring the supporting pattern and the spacer pattern onto the first sacrificial layer to form gate and supporting patterns, and transferring the gate and supporting patterns onto the semiconductor layer to form a gate and a supporting gate.Type: ApplicationFiled: January 19, 2017Publication date: December 28, 2017Inventors: Yun Kyeong JANG, Sang Jin KIM, Dong Woon PARK, Joon Soo PARK, Chang Jae YANG, Kwang Sub YOON, Hye Kyoung JUE
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Patent number: 9808005Abstract: The present invention relates to a composition for anti-green algae containing water-soluble free amine chitosan having the anti-algae activity against water-bloom forming algae as an active ingredient and a method for preparing the same. Particularly, the water-soluble free amine chitosan of the present invention can kill directly water-bloom forming algae, suggesting that it has excellent anti-green algae activity to inhibit water-bloom, and is non-toxic to freshwater organism cells. Therefore, the composition for anti-green algae containing the said water-soluble free amine chitosan as an active ingredient can be efficiently used as a safe anti-green algae composition applicable in the freshwater ecosystem including solidified dam, reservoir, lake, golf course water hazard, pond, freshwater fish farm, and fishing spot.Type: GrantFiled: September 30, 2015Date of Patent: November 7, 2017Assignee: SUNCHON INDUSTRY ACADEMIC COOPERATION FOUNDATIONInventors: Jae-Woon Nah, Mi-Kyeong Jang, Seong-Cheol Park
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Publication number: 20160357117Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.Type: ApplicationFiled: April 22, 2016Publication date: December 8, 2016Inventors: SUNGJOO KIM, YUN KYEONG JANG, JINHONG PARK, DOHYUN SEO, HyunHoon LEE
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Publication number: 20110227070Abstract: Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same.Type: ApplicationFiled: March 18, 2011Publication date: September 22, 2011Inventors: Jin-Young Yoon, Hyun-Woo Kim, Chan Hwang, Yun-Kyeong Jang
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Patent number: 7932019Abstract: Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same.Type: GrantFiled: November 13, 2007Date of Patent: April 26, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-Young Yoon, Hyun-Woo Kim, Chan Hwang, Yun-Kyeong Jang
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Patent number: 7883723Abstract: The present invention relates to a water soluble chitosan nanoparticle (WSC-NP) for delivering an anticancer agent and a preparing method thereof, more precisely, a water soluble chitosan nanoparticle for delivering an anticancer agent which has function of targeting on a wanted area by introducing a functional group in the location of highly reactive amine group and becomes an excellent gene carrier with the use of water soluble chitosan since the water soluble chitosan itself can combined with DNA having a negative electric charge(?) owing to the very strong positive electric charge(+) of its amine group, and a preparing method thereof. Therefore, a water-soluble chitosan nanoparticle for delivering an anticancer agent of the present invention can effectively envelope paclitaxel by introducing hydrophilic and hydrophobic groups in the position of highly reactive amine group of the water-soluble chitosan.Type: GrantFiled: May 13, 2005Date of Patent: February 8, 2011Inventors: Jae-Woon Nah, Teok Rae Jung, Mi-Kyeong Jang, Young-Il Jeong
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Publication number: 20100040694Abstract: Disclosed are low-molecular weight, water-soluble chitosan nanoparticles with folic acid conjugated thereto as a target ligand and a preparation method thereof. The nanoparticles can be simply prepared since the strong reactivity of the chitosan allows folic acid to be readily introduced thereinto. Also, the folic acid-conjugated, low-molecular weight, water-soluble chitosan nanoparticles can be useful as gene carriers because they are of low or zero-toxicity, have sizes suitable for use as gene carriers, can readily form complexes with DNA, allow high gene expression rates, and are excellent in targeting tumor cells which are rich in folic acid receptors.Type: ApplicationFiled: November 14, 2007Publication date: February 18, 2010Applicant: KITTO LIFEInventors: Jae Woon Nah, Teok Rae Jung, Mi Kyeong Jang, Dong Gon Kim, Sun Heang Heo
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Publication number: 20090191713Abstract: Provided is a method of forming a fine pattern using a block copolymer. The method comprises forming a coating layer including a block copolymer having a plurality of repeating units on a substrate. A mold is provided having a first pattern comprising a plurality of ridges and valleys. The first pattern is transferred from the mold into the coating layer. Then, a self-assembly structure is formed comprising a plurality of polymer blocks aligned in a direction guided by the ridges and valleys of the mold thereby rearranging the repeating units of the block copolymer within the coating layer by phase separation while the coating layer is located within the valleys of the mold. A portion of the polymer blocks are removed from among the plurality of polymer blocks and a self-assembly fine pattern of remaining polymer blocks is formed.Type: ApplicationFiled: September 22, 2008Publication date: July 30, 2009Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Dong-Ki YOON, Hyun-Woo KIM, Shi-Yong YI, Hai-Sub NA, Kyoung-Taek KIM, Yun-Kyeong JANG
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Publication number: 20080131817Abstract: Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same.Type: ApplicationFiled: November 13, 2007Publication date: June 5, 2008Inventors: Jin-Young Yoon, Hyun-Woo Kim, Chan Hwang, Yun-Kyeong Jang
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Patent number: 7345165Abstract: A method for the preparation of water-soluble chitosan with high purity and biological activity includes steps of: reacting chitosan oligo sugar acid salt, covalently bonded to an organic or inorganic acid, with trialkylamine in phosphate buffered saline followed by addition of an organic solvent to remove acid salt at C-2 position; adding the thus obtained reaction mixture to an inorganic acid to remove trialkylamine salt at C-6 position; and passing the thus obtained free amine chitosan through an activated carbon/ion exchange resin. The free amine chitosan is water-soluble and has a high bioavailability for application to the medicine and food industries.Type: GrantFiled: April 16, 2002Date of Patent: March 18, 2008Assignee: Jae Woon NahInventors: Mi Kyeong Jang, Chang Yong Choi, Won Seok Kim, Byeong Gi Kong, Young Il Jeong, Hyun Pil Yang, Ji Tae Jang
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Publication number: 20060013885Abstract: The present invention relates to a water soluble chitosan nanoparticle (WSC-NP) for delivering an anticancer agent and a preparing method thereof, more precisely, a water soluble chitosan nanoparticle for delivering an anticancer agent which has function of targeting on a wanted area by introducing a functional group in the location of highly reactive amine group and becomes an excellent gene carrier with the use of water soluble chitosan since the water soluble chitosan itself can combined with DNA having a negative electric charge(?) owing to the very strong positive electric charge(+) of its amine group, and a preparing method thereof. Therefore, a water-soluble chitosan nanoparticle for delivering an anticancer agent of the present invention can effectively envelope paclitaxel by introducing hydrophilic and hydrophobic groups in the position of highly reactive amine group of the water-soluble chitosan.Type: ApplicationFiled: May 13, 2005Publication date: January 19, 2006Inventors: Jae-Woon Nah, Teok Jung, Mi-Kyeong Jang, Young-Il Jeong
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Publication number: 20050200401Abstract: The present invention discloses an internal voltage generator which can restrict abnormal variations of an internal voltage resulting from a leakage current generated in a driving transistor. The internal voltage generator includes a comparator for receiving a reference voltage through its first input terminal, receiving the internal voltage through its second input terminal, and comparing the reference voltage with the internal voltage, a driving transistor for receiving the output signal from the comparator through its gate terminal, a first terminal of which being coupled to a driving voltage, a second terminal of which being an output terminal for outputting the internal voltage, a back bias circuit for supplying a predetermined potential of back bias voltage to a well region of the driving transistor, and a controller for receiving the output signal from the comparator, and controlling the operation of the back bias circuit.Type: ApplicationFiled: May 21, 2004Publication date: September 15, 2005Inventor: Kyeong Jang
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Publication number: 20040260077Abstract: A method for the preparation of water-soluble chitosan with high purity and biological activity includes steps of: reacting chitosan oligo sugar acid salt, covalently bonded to an organic or inorganic acid, with trialkylamine in phosphate buffered saline followed by addition of an organic solvent to remove acid salt at C-2 position; adding the thus obtained reaction mixture to an inorganic acid to remove trialkylamine salt at C-6 position; and passing the thus obtained free amine chitosan through an activated carbon/ion exchange resin. The free amine chitosan is water-soluble and has a high bioavailability for application to the medicine and food industries.Type: ApplicationFiled: March 12, 2004Publication date: December 23, 2004Inventors: Mi Kyeong Jang, Chang Yong Choi, Won Seok Kim, Byeong Gi Kong, Young Il Jeong, Hyun Pil Yang, Ji Tae Jang