Patents by Inventor Kyeong-Jin Lee

Kyeong-Jin Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12258071
    Abstract: A method for manufacturing a lightweight cowl crossbar includes: producing an inner pipe, laminating a plurality of composite material layers wound around the inner pipe, and extruding an outer pipe on the winding layer, in which the plurality of composite material layers adjacent to each other are wound in different directions.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: March 25, 2025
    Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION, LG HAUSYS, LTD., HYUNDAI MOBIS CO., LTD.
    Inventors: Jae Hyun An, In Soo Han, Hee Seok Kim, Il Sang Kim, Ik Jin Jung, Kyeong Hoon Jang, Young Jin You, Sang Hyeon Park, Wook Hee Lee, Yong Woo Jung, Ik Keun Choi, Young Chan Cho
  • Publication number: 20250074928
    Abstract: The present invention relates to an organic compound represented by the following [Formula 1], and a high-efficiency and long-lifetime organic light emitting device enabling significantly improved low voltage driving and having long lifetime, excellent luminous efficiency and the like by employing the same as a light emitting layer host material in the device.
    Type: Application
    Filed: August 21, 2024
    Publication date: March 6, 2025
    Applicant: SFC CO., LTD.
    Inventors: Kyeong-hyeon KIM, Si-in KIM, Hyuk-woo JANG, Do-yeong CHOI, Seo-youn PARK, Yeon-jae CHOI, Kyeong-wan KIM, Se-jin LEE
  • Publication number: 20250066275
    Abstract: The present invention relates to an anthracene derivative compound having a characteristic structure in which an aryl group is introduced into a skeletal structure in which deuterium-substituted phenyl and anthracene are linked. In addition, the present invention relates to a high-efficiency, long-life organic light-emitting device of which the luminous efficiency and lifetime characteristics are significantly improved by employing a polycyclic compound having a characteristic structure as a dopant for a light-emitting layer while employing said compound as a host for the light-emitting layer.
    Type: Application
    Filed: December 14, 2022
    Publication date: February 27, 2025
    Applicant: SFC CO., LTD.
    Inventors: Se-jin LEE, Si-In KIM, Seok-bae PARK, Hee-dae KIM, Yeong-tae CHOI, Kyung-tae KIM, Ji-yung KIM, Seung-soo LEE, Kyeong-hyeon KIM, Tae-gyun LEE, Joon-ho KIM
  • Publication number: 20250063943
    Abstract: The present invention relates to an organic light-emitting device comprising, in a light-emitting layer thereof: a compound represented by [chemical formula A]; and a compound represented by any one of [chemical formula D-6] and [chemical formula D-7], wherein [chemical formula A], [chemical formula D-6], and [chemical formula D-7] are as described in the detailed description of the invention.
    Type: Application
    Filed: November 14, 2022
    Publication date: February 20, 2025
    Inventors: Seok-Bae PARK, Se-Jin LEE, Si-In KIM, Hee-Dae KIM, Yeong-Tae CHOI, Yu-Rim LEE, Ji-Yung KIM, Seung-Soo LEE, Kyungtae KIM, Myeong-Jun KIM, Kyeong-Hyeon KIM
  • Publication number: 20250063948
    Abstract: The present invention relates to an organic light-emitting diode in which a light-emitting layer comprises a compound represented by [chemical formula A] as a host and comprises a compound represented by [chemical formula 3], [chemical formula 4], [chemical formula 3-1] to [chemical formula 4-3] as a dopant, wherein [chemical formula 3], [chemical formula 4], [chemical formula 3-1] to [chemical formula 4-3] are the same as those described in the detailed description of the invention.
    Type: Application
    Filed: November 25, 2022
    Publication date: February 20, 2025
    Inventors: Kyung-Tae KIM, Se-Jin LEE, Si-In KIM, Seok-Bae PARK, Hee-Dae KIM, Yeong-Tae CHOI, Ji-Yung KIM, Seung-Soo LEE, Kyeong-Hyeon KIM, Tae-Gyun LEE, Joon-Ho KIM
  • Patent number: 12226845
    Abstract: An apparatus and method for cleaning an oxide film using a direct current reverse polarity are provided. The apparatus for cleaning an oxide film formed on a workpiece may include a power supply configured to apply direct current power and to include a positive electrode terminal and a negative electrode terminal, the workpiece configured to be electrically connected to the negative electrode terminal to act as a negative electrode to which a current is applied, and a torch having a positive electrode, which is spaced apart from the oxide film by a predetermined distance and is electrically connected to the positive electrode terminal, the torch being installed to be movable relative to the workpiece. The oxide film formed on the workpiece may be removed by applying a reverse polarity direct current between the workpiece, serving as the negative electrode, and the positive electrode to generate an arc.
    Type: Grant
    Filed: August 24, 2020
    Date of Patent: February 18, 2025
    Assignees: DOOSAN ENERBILITY CO., LTD., PUKYONG NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
    Inventors: Yoon Sang Lee, Hyun Sang Kong, Jae Yun Shin, Sang Myung Cho, Hyo Jin Baek, Chang Ik Lee, Hyeong Chang Ryu, Kyeong Seob Lim
  • Publication number: 20090093119
    Abstract: A method of fabricating a semiconductor device is disclosed, by which thickness of a gate oxide layer can be controlled for uniformity. Embodiments include sequentially forming a pad oxide layer and a nitride layer over a semiconductor substrate having an epi-layer grown thereon, the semiconductor substrate having a backside over which a backside nitride layer and a backside oxide layer are formed, forming a trench on the semiconductor substrate, depositing an oxide layer over a front side the semiconductor substrate to fill the trench with the oxide layer, selectively etching the oxide layer, performing a chemical mechanical polishing process on the front side of the semiconductor substrate, performing a chemical mechanical polishing process on the backside of the semiconductor substrate, and forming a gate oxide layer over the semiconductor substrate.
    Type: Application
    Filed: October 5, 2008
    Publication date: April 9, 2009
    Inventor: Kyeong-Jin Lee