Patents by Inventor Kyeongran Yoo

Kyeongran Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for controlling critical dimensions during an etch process
    Publication number: 20050064714
    Abstract: A method for controlling dimensions of structures formed on a substrate using an etch process includes measuring pre-etch dimensions of the respective elements of a patterned etch mask and adjusting a process recipe of the etch process using the results of the pre-etch measurements. In one application, the method is used to control critical dimensions of a gate structure of a field effect transistor.
    Type: Application
    Filed: September 19, 2003
    Publication date: March 24, 2005
    Inventors: David Mui, Wei Liu, Hiroki Sasano, Kyeongran Yoo