Patents by Inventor Kyeong-Seok Jeong

Kyeong-Seok Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA PROCESSING APPARATUS
    Publication number: 20230047219
    Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.
    Type: Application
    Filed: October 27, 2022
    Publication date: February 16, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jun Soo Lee, Yoshihisa Hirano, Jae Hoon KIm, Young Jin Noh, Sung Moon Park, Seung Kyu Lim, Kyeong Seok Jeong, Hyung Kyu Choi
  • PLASMA PROCESSING APPARATUS
    Publication number: 20200258753
    Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.
    Type: Application
    Filed: October 9, 2019
    Publication date: August 13, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jun Soo LEE, Yoshihisa Hirano, Jae Hoon Kim, Young Jin Noh, Sung Moon Park, Seung Kyu Lim, Kyeong Seok Jeong, Hyung Kyu Choi
  • Plasma processing device
    Patent number: 10276349
    Abstract: A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: April 30, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hak-Young Kim, Ji-Myoung Lee, Ji-Hee Kim, Doug-Yong Sung, Kyeong-Seok Jeong, Seong-Chul Choi
  • PLASMA PROCESS APPARATUS HAVING VIEW PORT
    Publication number: 20160141148
    Abstract: A plasma process apparatus includes a process chamber including a view port, a window plate disposed in the view port of the process chamber, and a light guide disposed on a surface of the window plate facing toward an interior of the process chamber, the light guide including openings extending in one direction in parallel to each other.
    Type: Application
    Filed: July 2, 2015
    Publication date: May 19, 2016
    Inventors: Jongwoo SUN, Kyeong-Seok JEONG, Jihee KIM
  • Plasma Processing Device
    Publication number: 20160104604
    Abstract: A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.
    Type: Application
    Filed: April 29, 2015
    Publication date: April 14, 2016
    Inventors: Hak-Young Kim, Ji-Myoung Lee, Ji-Hee Kim, Doug-Yong Sung, Kyeong-Seok Jeong, Seong-Chul Choi