Patents by Inventor Kyle Bartosh

Kyle Bartosh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Source reagent-based delivery of fluid with high material flux for batch deposition
    Patent number: 10385452
    Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: August 20, 2019
    Assignee: ENTEGRIS, INC.
    Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
  • SOURCE REAGENT-BASED DELIVERY OF FLUID WITH HIGH MATERIAL FLUX FOR BATCH DEPOSITION
    Publication number: 20150191819
    Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.
    Type: Application
    Filed: May 31, 2013
    Publication date: July 9, 2015
    Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
  • Copper passivating post-chemical mechanical polishing cleaning composition and method of use
    Publication number: 20080076688
    Abstract: Alkaline aqueous cleaning compositions and processes for cleaning post-chemical mechanical polishing (CMP) residue, post-etch residue and/or contaminants from a microelectronic device having said residue and contaminants thereon. The alkaline aqueous cleaning compositions include amine, passivating agent, and water. The composition achieves highly efficacious cleaning of the residue and contaminant material from the microelectronic device while simultaneously passivating the metal interconnect material.
    Type: Application
    Filed: September 21, 2006
    Publication date: March 27, 2008
    Inventors: Jeffrey A. Barnes, Elizabeth Walker, Darryl W. Peters, Kyle Bartosh, Ewa R. Oldak, Kevin P. Yanders