Abstract: An embodiment of the invention pertains to a two stage process that facilitates the formation of a substantially uniform layer. A material is isotropically deposited on a re-entry shaped surface topography and a substrate resulting in a non-wetting film on the re-entry shaped surface topography and the substrate. Regions of the non-wetting film that are not shadowed by the re-entry shaped surface topography are anisotropically removed resulting in non-wetting shadowed films only in the regions that are shadowed by the re-entry shaped surface topography. The non-wetting shadowed films are non-wetting to a subsequently deposited layer. The non-wetting shadowed films reduce pileup at the edges, and so the subsequently deposited layer has a substantially uniform layer thickness.

Abstract: An electronic device can include a substrate, a lid, a getter material adhered to at least a portion of at least one surface of the electronic device, wherein the portion of the surface will be an interior surface of the electronic device, and a sealing material adhered to at least a portion of the substrate and a portion of the lid. The sealing material includes a spacer material. A method for sealing the electronic device includes includes attaching the substrate and the lid in an inert atmosphere under an absolute pressure of less than 760 torr wherein the sealing material contacts both the substrate and the lid, and raising the pressure on the exterior of the device to ambient pressure.

Abstract: In one embodiment of the invention, a first absorbing layer is on a substrate and/or a second absorbing layer is on a heat-activated adhesive. If the IR source that supplies IR radiation is present on the substrate-side, then the absorption percentage of the substrate is less than the absorption percentage of the first absorbing layer if present and less than the absorption percentage of the second absorbing layer if present. If the IR source that supplies IR radiation is present on the “encapsulation cover”-side, then the absorption percentage of the encapsulation cover is less than the absorption percentage of the first absorbing layer if present and less than an absorption percentage of the second absorbing layer if present. The substrate and the encapsulation cover have a low thermal conductivity.

Abstract: An embodiment of an encapsulated organic optoelectronic device is described. The encapsulated device includes an organic optoelectronic device on a substrate and that organic optoelectronic device has a cathode. The encapsulated device further includes a diffusion layer that is on the organic optoelectronic device and that diffusion layer covers exposed areas of the organic optoelectronic device. An adhesive layer is on the substrate and is around a perimeter of the diffusion layer. An encapsulation lid is on the adhesive layer, and a getter is on the encapsulation lid such that the getter overlies the organic optoelectronic device. The diffusion layer slows a rate of absorption of reactive gasses by the cathode and increases a proportion of the reactive gasses absorbed by the getter relative to the cathode.