Abstract: Wet impregnation of active metal precursors into porous substrates, together with selective adsorption of the precursors on the pore surfaces, enables transition metal oxides derived from the precursors to disperse throughout the substrate, even at the nanoscale, without increased sintering or agglomeration, thereby forming oxygen carriers suitable for chemical looping. The porous substrate can be an oxide, for example SiO2. The oxygen carriers can comprise relatively large oxide loadings of over about 20 wt % and exhibit high reactivity over many regeneration cycles with substantially no loss in oxygen transport capacity or decrease in kinetics. The use of multiple transition metal oxides, for example NiO in addition to CuO, can greatly enhance chemical looping performance.

Abstract: Oxygen carriers for chemical looping and scalable methods of preparation thereof. Wet impregnation of active metal precursors into porous substrates, together with selective adsorption of the precursors on the pore surfaces, enables transition metal oxides derived from the precursors to disperse throughout the substrate, even at the nanoscale, without increased sintering or agglomeration. The porous substrate can be an oxide, for example SiO2. The oxygen carriers can comprise relatively large oxide loadings of over about 20 wt % and exhibit high reactivity over many regeneration cycles with substantially no loss in oxygen transport capacity or decrease in kinetics. The use of multiple transition metals, for example NiO in addition to CuO, can greatly enhance chemical looping performance.