Patents by Inventor Kyle R. Tantiwong

Kyle R. Tantiwong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image-based in-situ process monitoring
    Patent number: 11908716
    Abstract: Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: February 20, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Guoheng Zhao, Venkatakaushik Voleti, Todd Egan, Kyle R. Tantiwong, Andreas Schulze, Niranjan Ramchandra Khasgiwale, Mehdi Vaez-Iravani
  • IMAGE-BASED IN-SITU PROCESS MONITORING
    Publication number: 20220367217
    Abstract: Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.
    Type: Application
    Filed: May 14, 2021
    Publication date: November 17, 2022
    Inventors: Guoheng Zhao, Venkatakaushik Voleti, Todd J. Egan, Kyle R. Tantiwong, Andreas Schulze, Niranjan Ramchandra Khasgiwale, Mehdi Vaez-Iravani
  • High efficiency triple-coil inductively coupled plasma source with phase control
    Patent number: 10271416
    Abstract: A plasma processing apparatus may include a process chamber having an interior processing volume, first, second and third RF coils disposed proximate the process chamber to couple RF energy into the processing volume, wherein the second RF coil disposed coaxially with respect to the first RF coil, and wherein the third RF coil disposed coaxially with respect to the first and second RF coils, at least one ferrite shield disposed proximate to at least one of the first, second or third RF coils, wherein the ferrite shield is configured to locally guide a magnetic field produced by an RF current flow through the first, second or third RF coils toward the process chamber, wherein the plasma processing apparatus is configured to control a phase of each RF current flow through each of the of the first, second or third RF coils.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: April 23, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Samer Banna, Waheb Bishara, Ryan Giar, Valentin Todorow, Dmitry Lubomirsky, Kyle R. Tantiwong
  • Multiple zone coil antenna with plural radial lobes
    Patent number: 9472378
    Abstract: A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: October 18, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vladimir Knyazik, Samer Banna, Kyle R. Tantiwong
  • Coil antenna with plural radial lobes
    Patent number: 9312104
    Abstract: A low inductance coil antenna for a plasma reactor has plural conductor lobes extending radially from respective RF supply connections.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: April 12, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vladimir Knyazik, Samer Banna, Kyle R. Tantiwong
  • MULTIPLE ZONE COIL ANTENNA WITH PLURAL RADIAL LOBES
    Publication number: 20150097479
    Abstract: A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 9, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Vladimir Knyazik, Samer Banna, Kyle R. Tantiwong
  • COIL ANTENNA WITH PLURAL RADIAL LOBES
    Publication number: 20150097478
    Abstract: A low inductance coil antenna for a plasma reactor has plural conductor lobes extending radially from respective RF supply connections.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 9, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Vladimir Knyazik, Samer Banna, Kyle R. Tantiwong