Abstract: The present application describes an ocular inlay delivery system that can include a loader, forceps, and tray system. The loader can be configured to receive an ocular inlay, protect it during handling and shipment, and present it for removal during surgery, receive jaws of surgical forceps and align the jaws in relation to the inlay allowing the forceps to grip the inlay in a proper orientation. Forceps can be configured to fit within the channel of the loader, grip the inlay using a clamping motion, maintain a grip on the inlay during transfer to the eye of a patient, deposit the inlay in the eye of a patient, and release the inlay using a sliding motion. The tray can be configured to restrict movement of the loader mechanism during shipment and handling.

Abstract: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract: A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.

Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber.

Abstract: A method for applanating an anterior surface of a cornea and coupling the eye to a surgical laser is disclosed. A interface is provided which has a central orifice and top and bottom surfaces. A suction ring is removably coupled to the bottom surface of the interface. The interface is positioned over an operative area of an eye, such that the suction ring comes into proximate contact with the surface of the eye. A suction is applied to the suction ring to stabilize the position of the interface relative to the operative area of the eye. An applanation lens is positioned in proximate contact with the operative area of the eye. Finally, the applanation lens is coupled to the interface to stabilize the position of the lens relative to the operative area of the eye.

Abstract: A calibration method for radiometric imaging systems that relies on an absolute measurement of scene radiance (thereby requiring a baseline measurement of zero radiance), and a shutter assembly for taking the baseline measurement of zero radiance which is operable under cryogenic temperatures as low as 80.5K (?192.65° C.) in vacuums measuring <10?6 torr (mm Hg). The shutter assembly generally includes an actuator and a shutter mechanism. The actuator is preferably a miniature solenoid assembly capable of operation in extreme environments (e.g. vacuums of <10?6 torr, temperatures below 90K). The shutter mechanism preferably includes a single shutter blade and is also capable of operation when subjected to extreme environments. The method of using the shutter assembly provides a zero radiance reference measurement for an infrared imaging system, thereby providing a basis upon which absolute scene radiance may be determined.

Abstract: A method and apparatus for laser light pulse stretching is disclosed which may comprise a beam splitter in the path of a laser output light pulse beam; selected to pass a first percent of the energy of a first input pulse of the laser output light pulse beam along a laser output light pulse beam output path as a first output pulse and to reflect a second percent of the energy of the laser output light pulse beam into a first delayed beam; an optical delay path receiving the first delayed beam and returning the first delayed beam to the beam splitter in an orientation such that a third percent of the first delayed beam is reflected into the output path as a second output pulse and a fourth percent is passed into the optical delay path as a second delayed beam; the optical delay path receiving the second delayed beam and returning the second delayed beam to the beam splitter in an orientation such that the third percent of the second delayed beam is reflected into the output path as a third output pulse and the

Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation.

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

Abstract: An improved applanation lens and method for use in an interface between a patient's eye and a surgical laser system does not discolor or lose light transmittance when subjected to gamma radiation. The improved applanation lens has an applanation surface configured to contact the eye upon application of a pressure. The lens is formed of high purity silicon dioxide (SiO2) with purity great enough to resist discoloration upon prolonged irradiation by high-energy radiation such as UV, x-rays, gamma rays or neutrons, and is preferably a fused silica.

Abstract: A disposable stabilization and applanation device for reconfiguring the cornea of an eye for ophthalmic laser surgery, includes an applanation lens that is disposed in a particular spatial position with respect to an incident laser beam. The applanation lens is inserted into the central opening of an attachment ring and applanates the eye in response to pressure from a lens cone. The attachment ring is coupled to the eye and includes a skirt which surrounds the applanation lens and extends outwardly therefrom to define a chamber. The skirt is formed with a groove which defines a suction channel between the attachment ring skirt and the corneal surface of an eye. A vacuum source is connected and fluid communication with the suction channel and is selectively activated to create a partial vacuum in the channel. In operation, the attachment ring is coupled to the cornea by application of suction and the applanation lens lowered into contact with the cornea through the attachment ring's central opening.

Abstract: A beam delivery unit and method of delivering a laser beam from a lasr light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.

Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber.

Abstract: A method and apparatus for laser light pulse stretching is disclosed which may comprise a beam splitter in the path of a laser output light pulse beam; selected to pass a first percent of the energy of a first input pulse of the laser output light pulse beam along a laser output light pulse beam output path as a first output pulse and to reflect a second percent of the energy of the laser output light pulse beam into a first delayed beam; an optical delay path receiving the first delayed beam and returning the first delayed beam to the beam splitter in an orientation such that a third percent of the first delayed beam is reflected into the output path as a second output pulse and a fourth percent is passed into the optical delay path as a second delayed beam; the optical delay path receiving the second delayed beam and returning the second delayed beam to the beam splitter in an orientation such that the third percent of the second delayed beam is reflected into the output path as a third output pulse and the

Abstract: A closed-loop focusing system and method positions a focusing assembly to a desired positioned. A feedback positioning device, such as a linear encoder, provides an actual or “read” value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. Furthermore, when a laser source is utilized with the focusing system, then laser operation will be prevented where the two values are outside of tolerance.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

Abstract: A closed-loop focusing system and method positions a focusing assembly to a desired positioned. A feedback positioning device, such as a linear encoder, provides an actual or “read” value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. Furthermore, when a laser source is utilized with the focusing system, then laser operation will be prevented where the two values are outside of tolerance.