Patents by Inventor Kyo-ll Koo

Kyo-ll Koo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR CALIBRATING A PHOTOLITHOGRAPHY PROCESS MODEL BY USING A PROCESS WINDOW PARAMETER
    Publication number: 20110185324
    Abstract: One embodiment of the present invention relates to a system that calibrates a photolithography process model. During operation, the system receives a process model which models a photolithography process. The system further receives measured critical dimension (CD) values for a first set of features that were printed by applying the photolithography process to a layout. The system then calibrates the process model using the measured CD values so that CD values predicted by the process model substantially match the measured CD values, and depth of focus (DOF) values predicted by the process model for a second set of features are substantially maximized.
    Type: Application
    Filed: January 28, 2010
    Publication date: July 28, 2011
    Applicant: SYNOPSYS, INC.
    Inventors: JenSheng Huang, Xin Zheng, Kyo-ll Koo