Patents by Inventor Kyohei Arayama

Kyohei Arayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160033680
    Abstract: An object of the present invention is to provide a composition for forming a far-infrared radiation shielding layer which is able to form a layer having excellent far-infrared radiation shielding properties. A composition for forming a far-infrared radiation shielding layer of the present invention contains at least inorganic fine particles and a dispersant.
    Type: Application
    Filed: October 9, 2015
    Publication date: February 4, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke HAMADA, Yuki NARA, Makoto KUBOTA, Kazuto SHIMADA, Kyohei ARAYAMA
  • Patent number: 9116426
    Abstract: The invention provides a dye compound having a partial structure represented by the following formula (5): wherein in formula (5), Dye represents a dye structure; G1 represents NR or an oxygen atom; G2 represents a monovalent substituent group having an ?Es? value as a steric parameter of 1.5 or more; p represents an integer from 1 to 8; when p is 2 or greater, the two or more structures represented by p may be the same or different from each other; and R represents a hydrogen atom or a monovalent substituent group.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: August 25, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Arayama, Hiroaki Idei, Shinichi Kanna, Kenta Ushijima, Akiyoshi Goto
  • Patent number: 8506853
    Abstract: The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: August 13, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Kenji Wada, Kyohei Arayama, Akiyoshi Goto
  • Publication number: 20110089385
    Abstract: The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.
    Type: Application
    Filed: October 14, 2010
    Publication date: April 21, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Kenji Wada, Kyohei Arayama, Akiyoshi Goto