Abstract: The terminal device includes a touch panel that accepts a touch entry including a first touch on a first key corresponding to a first position and a second touch on a second key corresponding to a second position that is different from the first position, and a processor that detects the first touch and the second touch, determines elapsed time from the first touch to the second touch when detecting the second touch after detecting the first touch, and decides that the second touch is a touch to the first key when the elapsed time is less than a threshold.

Abstract: The terminal device includes a touch panel that accepts a touch entry including a first touch on a first key corresponding to a first position and a second touch on a second key corresponding to a second position that is different from the first position, and a processor that detects the first touch and the second touch, determines elapsed time from the first touch to the second touch when detecting the second touch after detecting the first touch, and decides that the second touch is a touch to the first key when the elapsed time is less than a threshold.

Abstract: Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminum (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it. The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).

Abstract: Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminium (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it. The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).

Abstract: An information processing apparatus capable of sending and receiving email messages includes a storage unit configured to store address book information relating to a user of the information processing apparatus, and to store transmission/reception information about the transmission and reception of email messages; a search-criterion setting unit configured to set search criteria for retrieving email addresses to which an email message is to be sent; a retrieving unit configured to retrieve email addresses from the transmission/reception information on the basis of the search criteria set by the search-criterion setting unit; and an email address selector configured to select email addresses included in the address book information from the retrieved email addresses.

Abstract: An apparatus, related method and computer-readable storage medium for preventing illegal picture taking, including an information processing apparatus having a picture-taking function to take a picture of an object on which a wireless IC tag is loaded. A signal-generating unit generates a picture-taking object check signal checking whether the wireless IC tag is loaded on the picture-taking object. A signal transmitting/receiving unit receives a response signal from the wireless IC tag, and the picture-taking function is controlled on the basis of the received response signal.