Patents by Inventor Kyoko Minowa

Kyoko Minowa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Defect assessing apparatus and method, and semiconductor manufacturing method
    Patent number: 6226079
    Abstract: A defect assessing apparatus and method and a semiconductor manufacturing method for revealing the relationship between the size and depth of defects is disclosed. A detecting optical system is provided for detecting the intensity of scattered light from a defect generated by the shorter wavelength one of the light rays of at least two different wavelengths emitted from irradiating optical systems and that of scattered light from the defect generated by the longer wavelength one of same. A calculating means is provided for determining, from the scattered light intensity derived from the shorter wavelength ray and that derived form the longer wavelength ray, both detected by the detecting optical system, a value corresponding to the defect size and another value corresponding to the defect depth.
    Type: Grant
    Filed: September 29, 1998
    Date of Patent: May 1, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Takeda, Makoto Ohkura, Seiichi Isomae, Kyoko Minowa, Muneo Maeshima, Shigeru Matsui, Yasushi Matsuda, Hirofumi Shimizu