Patents by Inventor Kyoko Nagaoka

Kyoko Nagaoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5483217
    Abstract: An electronic circuit device decreases dispersion in the output of the circuit caused by changes in the resistance of the resistors resulting from stress. Resistor positions are selected on the circuit board so that a change in the circuit output caused by a change in resistance of a first resistor group becomes equal to a change caused by a change in resistance caused by a second resistor group, these changes being in opposite directions so as to cancel each other. Alternately, a plurality of resistors are connected to form a composite resistor such that the effect upon resistance of the composite resistor caused by the resistor having decreased resistance is cancelled by the effect upon resistance of the composite resistor caused by a resistor having an increased resistance.
    Type: Grant
    Filed: July 15, 1993
    Date of Patent: January 9, 1996
    Assignee: Nippondenso Co., Ltd.
    Inventors: Takashi Nagasaka, Mitsuhiro Saitou, Takahisa Koyasu, Hiroyuki Ban, Yuji Otani, Kengo Oka, Kyoko Nagaoka
  • Patent number: 5212043
    Abstract: A photoresist composition comprising:a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; anda photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
    Type: Grant
    Filed: October 17, 1990
    Date of Patent: May 18, 1993
    Assignee: Tosho Corporation
    Inventors: Takashi Yamamoto, Masaaki Todoko, Toru Seita, Kyoko Nagaoka, Kosaburo Matsumura
  • Patent number: 4983495
    Abstract: Positive resist patterns prepared by using a derivative of polyacrylic acid esters containing halogen expressed by the following general formula for the resist material; ##STR1## (where A is a structural unit which is derived from monomers having a copolymerable double bond, and X is either a halogen atom or a methyl group. m is a positive integer, n is 0 or a positive integer, n/m is 0 to 2 and m+n are 20 to 20,000. Y.sub.1 to Y.sub.5 are a fluorine or hydrogen atom and at least one of them is a fluorine atom).
    Type: Grant
    Filed: December 29, 1989
    Date of Patent: January 8, 1991
    Assignee: Tosoh Corporation
    Inventors: Yoshitaka Tsutsumi, Toru Seita, Kousaburou Matsumura, Kyoko Nagaoka, Toshimitsu Yanagihara