Patents by Inventor Kyong Ho Yoon

Kyong Ho Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same
    Patent number: 9116429
    Abstract: A resist underlayer polymer, a resist underlayer composition including the same, and a method of patterning using the same, the resist underlayer polymer including a repeating unit represented by at least one of Chemical Formula 1 and Chemical Formula 2:
    Type: Grant
    Filed: September 21, 2010
    Date of Patent: August 25, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Jee-Yun Song, Hwan-Sung Cheon, Sung-Wook Cho, Kyong-Ho Yoon, Min-Soo Kim, Seung-Bae Oh
  • Aromatic ring containing polymer, underlayer composition including the same, and associated methods
    Patent number: 8697341
    Abstract: An aromatic ring-containing polymer, an underlayer composition including the same, and associated methods, the aromatic ring-containing polymer including a group represented by one of the following Chemical Formulae 1-1, 1-2, 2-1, and 2-2:
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: April 15, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong-Ho Yoon, Jin-Kuk Lee, Hwan-Sung Cheon, Min-Soo Kim, Jee-Yun Song
  • Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same
    Patent number: 8617792
    Abstract: An aromatic ring-containing polymer for a resist underlayer, the polymer including a unit represented by the following Chemical Formula 1: wherein, R1 and R2 are independently hydrogen, a C1 to C10 alkyl group, or an aromatic group, A is a functional group derived from an aromatic compound with a heteroatom or without a heteroatom, and n is an integer of one or more.
    Type: Grant
    Filed: August 2, 2010
    Date of Patent: December 31, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Sung-Wook Cho, Kyong-Ho Yoon, Min-Soo Kim, Seung-Bae Oh, Jee-Yun Song, Hwan-Sung Cheon
  • Hardmask composition having antireflective properties and method of patterning material on substrate using the same
    Patent number: 8445187
    Abstract: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: May 21, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Hwan Sung Cheon, Chang Il Oh, Min Soo Kim, Jin Kuk Lee
  • Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods
    Patent number: 8420289
    Abstract: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.
    Type: Grant
    Filed: October 1, 2009
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Min Soo Kim, Dong Seon Uh, Chang Il Oh, Kyong Ho Yoon, Kyung Hee Hyung, Jin Kuk Lee, Jong-Seob Kim, Hwan Sung Cheon, Irina Nam, Nataliya Tokareva
  • Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
    Patent number: 8263321
    Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: September 11, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • Polymer composition, hardmask composition having antireflective properties, and associated methods
    Patent number: 8153349
    Abstract: A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: wherein m and n satisfy the relations 1?m<190, 0?n<190, and 1?m+n<190.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: April 10, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Hwan Sung Cheon, Jong Seob Kim, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee, Jee Yun Song
  • HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTIES AND METHOD OF PATTERNING MATERIAL ON SUBSTRATE USING THE SAME
    Publication number: 20110275019
    Abstract: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
    Type: Application
    Filed: July 14, 2011
    Publication date: November 10, 2011
    Applicant: CHEIL INDUSTRIES, INC.
    Inventors: Kyong Ho YOON, Jong Seob Kim, Dong Seon Uh, Hwan Sung Cheon, Chang Il Oh, Min Soo Kim, Jin Kuk Lee
  • AROMATIC RING CONTAINING POLYMER, UNDERLAYER COMPOSITION INCLUDING THE SAME, AND ASSOCIATED METHODS
    Publication number: 20110229828
    Abstract: An aromatic ring-containing polymer, an underlayer composition including the same, and associated methods, the aromatic ring-containing polymer including a group represented by one of the following Chemical Formulae 1-1, 1-2, 2-1, and 2-2:
    Type: Application
    Filed: June 2, 2011
    Publication date: September 22, 2011
    Inventors: Kyong-Ho YOON, Jin-Kuk Lee, Hwan-Sung Cheon, Min-Soo Kim, Jee-Yun Song
  • Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
    Patent number: 7981594
    Abstract: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formula 1, 2 and 3:
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: July 19, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Hwan Sung Cheon, Chang Il Oh, Min Soo Kim, Jin Kuk Lee
  • RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME
    Publication number: 20110117501
    Abstract: A resist underlayer polymer, a resist underlayer composition including the same, and a method of patterning using the same, the resist underlayer polymer including a repeating unit represented by at least one of Chemical Formula 1 and Chemical Formula 2:
    Type: Application
    Filed: September 21, 2010
    Publication date: May 19, 2011
    Inventors: Jee Yun SONG, Hwan-Sung Cheon, Sung-Wook Cho, Kyong-Ho Yoon, Min-Soo Kim, Seung-Bae Oh
  • Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
    Publication number: 20110097672
    Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
    Type: Application
    Filed: December 29, 2010
    Publication date: April 28, 2011
    Applicant: CHEIL INDUSTRIES, INC.,
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • AROMATIC RING-CONTAINING POLYMER FOR RESIST UNDERLAYER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING DEVICE USING THE SAME
    Publication number: 20110027722
    Abstract: An aromatic ring-containing polymer for a resist underlayer, the polymer including a unit represented by the following Chemical Formula 1: wherein, R1 and R2 are independently hydrogen, a C1 to C10 alkyl group, or an aromatic group, A is a functional group derived from an aromatic compound with a heteroatom or without a heteroatom, and n is an integer of one or more.
    Type: Application
    Filed: August 2, 2010
    Publication date: February 3, 2011
    Inventors: Sung-Wook Cho, Kyong-Ho Yoon, Min-Soo Kim, Seung-Bae Oh, Jee-Yun Song, Hwan-Sung Cheon
  • Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
    Patent number: 7862990
    Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: January 4, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • ORGANOSILANE POLYMERS, HARDMASK COMPOSITIONS INCLUDING THE SAME AND METHODS OF PRODUCING SEMICONDUCTOR DEVICES USING ORGANOSILANE HARDMASK COMPOSITIONS
    Publication number: 20100320573
    Abstract: Provided herein, according to some embodiments of the invention, are organosilane polymers prepared by reacting organosilane compounds including (a) at least one compound of Formula I Si(OR1)(OR2)(OR3)R4??(I) wherein R1, R2 and R3 may each independently be an alkyl group, and R4 may be —(CH2)nR5, wherein R5 may be an aryl or a substituted aryl, and n may be 0 or a positive integer; and (b) at least one compound of Formula II Si(OR6)(OR7)(OR8)R9??(II) wherein R6, R7 and R8 may each independently an alkyl group or an aryl group; and R9 may be an alkyl group. Also provided are hardmask compositions including an organosilane compound according to an embodiment of the invention, or a hydrolysis product thereof. Methods of producing semiconductor devices using a hardmask compostion according to an embodiment of the invention, and semiconductor devices produced therefrom, are also provided.
    Type: Application
    Filed: August 25, 2010
    Publication date: December 23, 2010
    Inventors: Dong Seon Uh, Hui Chan Yun, Jin Kuk Lee, Chang Il Oh, Jong Seob Kim, Sang Kyun Kim, Sang Hak Lim, Min Soo Kim, Kyong Ho Yoon, Irina Nam
  • Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer
    Patent number: 7659051
    Abstract: A naphthalene-backbone polymer represented by Formula 1: wherein n and m are independently at least 1 and less than about 190, R1 is a hydrogen, a hydroxyl, a hydrocarbon group of about 10 carbons or less, or a halogen, R2 is methylene or includes an aryl linking group, R3 is a conjugated diene group, and R4 is an unsaturated dienophile group.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: February 9, 2010
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
    Patent number: 7655386
    Abstract: An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: February 2, 2010
    Assignee: Cheil Industries, Inc.
    Inventors: Kyung Hee Hyung, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee
  • Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods
    Publication number: 20100021830
    Abstract: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.
    Type: Application
    Filed: October 1, 2009
    Publication date: January 28, 2010
    Inventors: Min Soo Kim, Dong Seon Uh, Chang Il Oh, Kyong Ho Yoon, Kyung Hee Hyung, Jin Kuk Lee, Jong-Seob Kim, Hwan Sung Cheon, Irina Nam, Nataliya Tokareva
  • Polymer composition, hardmask composition having antireflective properties, and associated methods
    Publication number: 20090176165
    Abstract: A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: wherein m and n satisfy the relations 1?m<190, 0?n<190, and 1?m+n<190.
    Type: Application
    Filed: December 23, 2008
    Publication date: July 9, 2009
    Inventors: Hwan Sung Cheon, Jong Seob Kim, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee, Jee Yun Song
  • Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
    Publication number: 20080305441
    Abstract: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
    Type: Application
    Filed: June 5, 2008
    Publication date: December 11, 2008
    Inventors: Kyong Ho YOON, Jong Seob KIM, Dong Seon UH, Hwan Sung CHEON, Chang Il OH, Min Soo KIM, Jin Kuk LEE