Abstract: The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.

Abstract: The present invention relates to a positive photosensitive resin composition for use in an LCD manufacturing process, and more particularly, to a composition comprising an alkali-soluble resin and novel quinonediazide sulfonic ester compound that has excellent development properties, leaves little residue, and has good chemical resistance, etc, and is also easily patterned and has high transmissivity, and thus is suitable for forming inter-insulating layers in LCDs and in integrated circuit devices.