Abstract: A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.

Abstract: The present invention relates to a slurry for fabricating an electrode, an electrode, and an electrochemical cell including same. The slurry for fabricating an electrode according to the present invention includes: an electrode material; an organic binder; and two or more solvents having different solubility parameters. The electrode fabricated using the slurry for fabricating an electrode according to the present invention may have a structure in which electrode materials are dispersed and bound to a porous matrix in a network configuration.

Abstract: An eco-friendly power source such as a battery module is provided for a transportation vehicle, including: a first sub-module and a second sub-module respectively including a cell stack in which a plurality of battery cells are stacked; and a central wall disposed between the first sub-module and the second sub-module, wherein the central wall includes a first central wall facing the first sub-module and a second central wall facing the second sub-module, wherein the first central wall has a rotationary symmetrical shape of the second central wall around a first axis.

Abstract: A display device includes a display panel, a driving board disposed on a side of the display panel, and a vapor chamber disposed between the display panel and the driving board, wherein the vapor chamber includes an external member, a first wick and a second wick which are disposed on at least parts of inner surfaces of the external member and face each other, a refrigerant which is contained in the external member, and a refrigerant dense part in which the refrigerant densely resides, and an area occupied by the first wick on the inner surfaces of the external member is greater than an area occupied by the second wick on the inner surfaces of the external member.

Abstract: The present invention relates to an apparatus for checking legislation on chemicals, and a method therefor, and the objective of the present invention is to: discriminate analysis information so that nation-specific legislation on chemicals can be responded to; and, according to the result of discrimination, automatically provide, for each use, the required obligations according to legislation, on a corresponding chemical, of a corresponding nation.

Abstract: A portable apparatus for monitoring urinary bladder internal pressure includes: a urinary catheter being provided with a pressure measuring sensor and a fixing member for dwelling the pressure measuring sensor in a bladder and being inserted into the bladder to discharge urine; and a display device which is connected to the pressure measuring sensor and displays a measured signal measured by the pressure measuring sensor. Since a urinary catheter having a fixing member on which a pressure measuring sensor of a thin-film-type is attached is inserted into a patient and at the same time the pressure of the bladder is monitored in real time by connecting the pressure measuring sensor to a portable display device, urination according to the pressure information of the bladder can be performed in a precise timing.

Abstract: The present invention relates to an artificial nephron device. The artificial nephron device comprising a multi micro channel in which while blood containing waste and water are passing therethrough the waste is separated so as to purify the blood and the separated waste is concentrated into the water to be discharged, wherein the multi micro channel comprises a glomerulus micro channel simulating a Glomerulus, a tubule micro channel simulating a Tubule, and a Henle's loop micro channel simulating a Henle's loop. According to the present invention, the device can be made smaller and can be optimized, and an artificial kidney of high efficiency can be made by the series or parallel combination of the devices, so the demand for a portable artificial kidney and the domiciliary hemodialysis system can be increased and life quality of patients suffering from chronic renal insufficiency can be improved.

Abstract: The present invention relates to an artificial nephron device. The artificial nephron device comprising a multi micro channel in which while blood containing waste and water are passing therethrough the waste is separated so as to purify the blood and the separated waste is concentrated into the water to be discharged, wherein the multi micro channel comprises a glomerulus micro channel simulating a Glomerulus, a tubule micro channel simulating a Tubule, and a Henle's loop micro channel simulating a Henle's loop. According to the present invention, the device can be made smaller and can be optimized, and an artificial kidney of high efficiency can be made by the series or parallel combination of the devices, so the demand for a portable artificial kidney and the domiciliary hemodialysis system can be increased and life quality of patients suffering from chronic renal insufficiency can be improved.

Abstract: A method for fabricating an extreme ultraviolet (EUV) lithography mask comprises forming a reflecting layer, an absorber layer, and a resist layer over a substrate; defining a plurality of split regions by partially splitting the resist layer with regular spacing; performing an exposure process, wherein the exposure region is irradiated with an electron beam at different intensities on the split regions to generate a difference in electron beam doses implanted into the resist layer; forming a resist layer pattern which selectively exposes the absorber layer and has a slanted side wall profile by performing a development process to remove a portion of the resist layer, into which the electron beam doses are implanted; and forming an absorber layer pattern with a slanted side wall profile by sequentially etching the portion of the absorber layer exposed by the resist layer pattern.

Abstract: The present invention relates to a surface acoustic wave (SAW) transponder for sensing pressure, and more particularly, to a SAW transponder for sensing pressure, in which a pressure sensor is connected to a SAW transponder receiving an applied radio frequency (RF) signal to generate a surface acoustic wave (SAW) and which can detect a change of a pressure through an amplitude change of a SAW. According to the present invention, a structure of a surface acoustic wave (SAW) transponder for sensing pressure is improved, and thus the change of an external pressure can be effectively detected. In addition, since the variations of the external pressure and the pressure sensor have a linear relationship with each other, the change of the external can be easily and quantitatively detected, and an external transmit/receive device can easily analyze a pressure signal.

Abstract: Provided are a method and apparatus for inspecting mask defects. The method may include preparing a mask with a defect inspecting pattern, formed on a transparent substrate. The method may further include preparing a wafer defect inspecting apparatus including a defect inspecting unit capable of detecting defects through radiating light on a surface of a mask and obtaining an image based on reflected light, and a mask stage on which the mask is mounted facing the defect inspecting unit. The mask stage may replace the wafer stage of a wafer defect inspecting apparatus, and the mask stage may support the mask at a surface height substantially equal to a surface height of the wafer mounted on the wafer stage. The method may also include mounting the mask on the mask stage and detecting mask defects through operating the defect inspecting unit to radiate light on a surface of the mask and obtain an image based on reflected light.

Abstract: A method for fabricating an extreme ultraviolet (EUV) lithography mask comprises forming a reflecting layer, an absorber layer, and a resist layer over a substrate; defining a plurality of split regions by partially splitting the resist layer with regular spacing; performing an exposure process, wherein the exposure region is irradiated with an electron beam at different intensities on the split regions to generate a difference in electron beam doses implanted into the resist layer; forming a resist layer pattern which selectively exposes the absorber layer and has a slanted side wall profile by performing a development process to remove a portion of the resist layer, into which the electron beam doses are implanted; and forming an absorber layer pattern with a slanted side wall profile by sequentially etching the portion of the absorber layer exposed by the resist layer pattern.

Abstract: Provided are a method and apparatus for inspecting mask defects. The method may include preparing a mask with a defect inspecting pattern, formed on a transparent substrate. The method may further include preparing a wafer defect inspecting apparatus including a defect inspecting unit capable of detecting defects through radiating light on a surface of a mask and obtaining an image based on reflected light, and a mask stage on which the mask is mounted facing the defect inspecting unit. The mask stage may replace the wafer stage of a wafer defect inspecting apparatus, and the mask stage may support the mask at a surface height substantially equal to a surface height of the wafer mounted on the wafer stage. The method may also include mounting the mask on the mask stage and detecting mask defects through operating the defect inspecting unit to radiate light on a surface of the mask and obtain an image based on reflected light.

Abstract: An object of the present invention is to provide a home appliance which enables power line communication therewith for remote monitoring of progress of the home appliance, such as a washing machine or dryer. For this, the present invention provides a home appliance which enables power cable communication therewith, including a body (10) forming an exterior of the home appliance, a main control unit (20) at the body (10), for making various kinds of control of the home appliance, and a power cable communication modem (230) at the body (10), for transmission/reception of various kinds of data to/from a remote monitor which monitors the home appliance, remotely.

Abstract: Disclosed is a method for patterning a chemical amplified photoresist which improves resolution by adjusting a diffusion direction of photo acid. The method for patterning a chemical amplified photoresist includes the steps of depositing a chemical amplified photoresist on an etching target layer, selectively exposing the chemical amplified photoresist to generate photo acid on a surface of the exposed chemical amplified photoresist, diffusing the photo acid in only one direction by performing PEB process on condition that electric field is applied to the chemical amplified photoresist, and patterning the chemical amplified photoresist by developing process to remove only a portion where the photo acid is diffused.

Abstract: The present invention relates to a lithography mask and a fabricating method thereof, more particularly, to a mask or an aperture for lithography using electron or ion beams in a semiconductor device and a fabricating method thereof which improve thermal stability of a mask by forming a stencil mask of double structures comprised of an upper mask that absorbs and releases most of electron energy and a lower mask that defines patterns with electron/ion beams, thereby improving the reliance of fine patterns on an exposure process.

Abstract: A method for etching a semiconductor device suitable for forming micron contact hole having a size of less than limit resolution power of exposure equipments is disclosed, including coating a layer for an etch mask on an etched object layer; selectively patterning the layer to form an open area; and swelling side part of the patterned layer and forming the etch mask.

Abstract: A deformable mirror device and manufacturing method therefore. The method includes the steps of forming an electrode layer on a substrate in a predetermined pattern, forming a thick film on the upper surfaces of the substrate and the electrode layer, forming a support plate on the upper surface of the thick film, and partially etching the thick film to form at least one through hole. The method further includes separating the support plate into single portions, forming a post on one side of the inner surface of the through hole, forming a reflecting plate on the upper surface of the support plate, and removing the thick film.

Abstract: A fabrication method of a mask for a semiconductor device includes the steps of: applying a first photoresist film on a silicone wafer; sequentially stacking a first insulation film, a second insulation film, and a second photoresist film on the first photoresist film; patterning the second photoresist film by an etching process; etching and patterning the first and second insulation films by using the patterned second photoresist film as a mask; etching and patterning the first photoresist film by using the patterned first and second insulation films, and patterned second photoresist film as a mask; removing the second photoresist film; etching a predetermined portion of the patterned first insulation film; depositing a metal on the wafer including the first photoresist film, the first insulation film having the predetermined etched portion, and the second insulation film; and removing the first photoresist film, and first and second insulation films from the wafer.

Abstract: A deformable mirror device and manufacturing method therefor. The method includes the steps of forming an electrode layer on a substrate in a predetermined pattern, forming a thick film on the upper surfaces of the substrate and the electrode layer, forming a support plate on the upper surface of the thick film, and partially etching the thick film to form at least one through hole. The method further includes separating the support plate into single portions, forming a post on one side of the inner surface of the through hole, forming a reflecting plate on the upper surface of the support plate, and removing the thick film.