Patents by Inventor Kyoung-Chul Kim

Kyoung-Chul Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240101803
    Abstract: Disclosed are a thermoplastic elastomeric composition for vehicle mounts which has improved surface energy and compression set while solving reduction in wear strength, by blending EPDM rubber, polypropylene, silicon, and poly(styrene-ethylene-butadiene-styrene) (SEBS) in appropriate amounts, and a molded article including the same.
    Type: Application
    Filed: May 2, 2023
    Publication date: March 28, 2024
    Inventors: Sang Hyun Lee, Young Chul Shin, Ji Hye Park, Ki Hyun Cho, Han Sang Lee, Kyoung Min Hong, Ki Jae Kim
  • Publication number: 20240081099
    Abstract: An organic light emitting diode display according to an exemplary embodiment includes: a substrate; a first buffer layer on the substrate; a first semiconductor layer on the first buffer layer; a first gate insulating layer on the first semiconductor layer; a first gate electrode and a blocking layer on the first gate insulating layer; a second buffer layer on the first gate electrode; a second semiconductor layer on the second buffer layer; a second gate insulating layer on the second semiconductor layer; and a second gate electrode on the second gate insulating layer.
    Type: Application
    Filed: November 9, 2023
    Publication date: March 7, 2024
    Applicant: Samsung Display Co., Ltd.
    Inventors: Joon Woo BAE, So Young KOO, Han Bit KIM, Thanh Tien NGUYEN, Kyoung Won LEE, Yong Su LEE, Jae Seob LEE, Gyoo Chul JO
  • Publication number: 20240079249
    Abstract: An atomic layer etching method using a ligand exchange reaction may include a substrate providing step of putting a substrate with a thin film formed thereon into a reaction chamber, a halogenated thin film forming step of forming a halogenated thin film on a surface of the thin film by infusing a halogenated gas into the reaction chamber, and an etching step of etching the halogenated thin film by infusing a ligand without a metal or metal precursor into the reaction chamber with the substrate with the halogenated thin film.
    Type: Application
    Filed: January 17, 2023
    Publication date: March 7, 2024
    Inventors: Jae Chul LEE, Hyun Sik NOH, Dong Kyun LEE, Eun Ae JUNG, Kyoung-Mun KIM, Jooyong KIM, Younghun BYUN, Byeong Il YANG, Changhyun JIN
  • Patent number: 11871658
    Abstract: The present disclosure provides: a compound capable of enabling high luminous efficiency, a low driving voltage, and an improved lifetime of an element; an organic electric element using the same; and an electronic device thereof.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: January 9, 2024
    Inventors: Ki Ho So, Yun Suk Lee, Jong Gwang Park, Yeon Hee Choi, Kyoung Chul Kim
  • Patent number: 11871657
    Abstract: Compounds capable of improving high luminous efficiency, low driving voltage, and a service life of a device such as an organic electric device and electronic devices that include the organic electric device.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: January 9, 2024
    Inventors: Jong Gwang Park, Yun Suk Lee, Yu Ri Kim, Yeon Hee Choi, Kyoung Chul Kim
  • Patent number: 11758806
    Abstract: The present invention provides the compound represented by Formula 1, an organic electric element comprising a first electrode, a second electrode, and an organic material layer formed between the first electrode and the second electrode, and electronic device thereof, and by employing the compound represented by Formula 1 in the organic material layer, the driving voltage of the organic electric element can be lowered, and the luminous efficiency and life time of the electric element can be improved.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: September 12, 2023
    Assignee: DUK SAN NEOLUX CO., LTD.
    Inventors: Jong Gwang Park, Yun Suk Lee, Jung Hwan Park, Kyoung Chul Kim, Sun Hee Lee, Bum Sung Lee
  • Publication number: 20220282035
    Abstract: Provided herein are a touch panel with excellent sensitivity by implementing an insulating film for a touch panel with a low dielectric constant from a photo-sensitive composition using hollow silica particles, and an organic light emitting display device to which the touch panel is applied.
    Type: Application
    Filed: February 25, 2022
    Publication date: September 8, 2022
    Applicant: DUK SAN NEOLUX CO., LTD.
    Inventors: Changmin LEE, Yun Jong KO, Hyunsang CHO, Jaehyun LIM, Seo Jeong JEON, Kyoung Chul KIM, Soung Yun MUN
  • Publication number: 20210098719
    Abstract: The present invention provides the compound represented by Formula 1, an organic electric element comprising a first electrode, a second electrode, and an organic material layer formed between the first electrode and the second electrode, and electronic device thereof, and by employing the compound represented by Formula 1 in the organic material layer, the driving voltage of the organic electric element can be lowered, and the luminous efficiency and life time of the electric element can be improved.
    Type: Application
    Filed: December 17, 2018
    Publication date: April 1, 2021
    Applicant: DUK SAN NEOLUX CO., LTD.
    Inventors: Jong Gwang PARK, Yun Suk LEE, Jung Hwan PARK, Kyoung Chul KIM, Sun Hee LEE, Bum Sung LEE
  • Publication number: 20200152874
    Abstract: Provided in the present invention are a compound capable of improving high luminous efficiency, low driving voltage, and a service life of a device; and organic electric device using the same; and an electronic device thereof.
    Type: Application
    Filed: June 1, 2018
    Publication date: May 14, 2020
    Inventors: Jong Gwang PARK, Yun Suk LEE, Yu Ri KIM, Yeon Hee CHOI, Kyoung Chul KIM
  • Publication number: 20200136052
    Abstract: The present disclosure provides: a compound capable of enabling high luminous efficiency, a low driving voltage, and an improved lifetime of an element; an organic electric element using the same; and an electronic device thereof.
    Type: Application
    Filed: March 9, 2018
    Publication date: April 30, 2020
    Inventors: Ki Ho SO, Yun Suk LEE, Jong Gwang PARK, Yeon Hee CHOI, Kyoung Chul KIM
  • Patent number: 10047491
    Abstract: Provided is a ground reinforcement structure installed on a ground (10) in which a sandy soil layer (11) having a weak surface layer is provided and thus large-caliber excavation is difficult to be performed, the ground reinforcement structure including a ground reinforcement material (100) including: an expansion-type steel pipe (110) inserted to be installed in a small-caliber drilled portion (A) having a diameter of 51 mm to 61 mm and expanded by hydraulic pressure; and a settlement member (120) coupled to a rear end of the expansion-type steel pipe (110). Here, the expansion-type steel pipe (110) is inserted into the sandy soil layer (11), and the settlement member (120) is inserted into a rock layer (12). In this case, the settlement member (120) of the ground reinforcement structure according to the present invention is fixed to the rock layer (12), fixing force is excellent.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: August 14, 2018
    Assignee: KOLON GLOBAL CORPORATION
    Inventors: Kyoung Chul Kim, Se Jin Kim, Sung Gon Son, Jae Seo Choi, Sang Heon Choi
  • Publication number: 20180100280
    Abstract: Provided is a ground reinforcement structure installed on a ground (10) in which a sandy soil layer (11) having a weak surface layer is provided and thus large-caliber excavation is difficult to be performed, the ground reinforcement structure including a ground reinforcement material (100) including: an expansion-type steel pipe (110) inserted to be installed in a small-caliber drilled portion (A) having a diameter of 51 mm to 61 mm and expanded by hydraulic pressure; and a settlement member (120) coupled to a rear end of the expansion-type steel pipe (110). Here, the expansion-type steel pipe (110) is inserted into the sandy soil layer (11), and the settlement member (120) is inserted into a rock layer (12). In this case, the settlement member (120) of the ground reinforcement structure according to the present invention is fixed to the rock layer (12), fixing force is excellent.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 12, 2018
    Applicant: KOLON GLOBAL CORPORATION
    Inventors: Kyoung Chul KIM, Se Jin KIM, Sung Gon SON, Jae Seo CHOI, Sang Heon CHOI
  • Patent number: 9435321
    Abstract: The present invention provides a seawater resistant grout material composition and a method for constructing an offshore wind turbine structure using the same, the seawater resistant grout material composition comprising: 2˜10 wt % of high strength admixture; 25˜35 wt % of type I Portland cement; 30˜45 wt % of silica sand having a particle size of 30˜60 mesh; 5˜15 wt % of silica sand having a particle size of 60˜100 mesh; and 5˜10 wt % of silica sand having a particle size of 100˜200 mesh, wherein the high strength admixture is obtained by mixing and pulverizing 45˜99 wt % of slag and 1˜55 wt % of anhydrite, thus the present invention has excellent seawater resistance, excellent strength development characteristics at a low temperature, and increased compressive strength and durability to allow withstanding cyclic loads due to wind and wave pressure.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: September 6, 2016
    Assignee: KOLON GLOBAL CORPORATION
    Inventors: Kyoung Chul Kim, Se Jin Kim, Jae Uk Sim
  • Publication number: 20160108897
    Abstract: The present invention provides a seawater resistant grout material composition and a method for constructing an offshore wind turbine structure using the same, the seawater resistant grout material composition comprising: 2˜10 wt % of high strength admixture; 25˜35 wt % of type I Portland cement; 30˜45 wt % of silica sand having a particle size of 30˜60 mesh; 5˜15 wt % of silica sand having a particle size of 60˜100 mesh; and 5˜10 wt % of silica sand having a particle size of 100˜200 mesh, wherein the high strength admixture is obtained by mixing and pulverizing 45˜99 wt % of slag and 1˜55 wt % of anhydrite, thus the present invention has excellent seawater resistance, excellent strength development characteristics at a low temperature, and increased compressive strength and durability to allow withstanding cyclic loads due to wind and wave pressure.
    Type: Application
    Filed: July 8, 2013
    Publication date: April 21, 2016
    Applicant: KOLON GLOBAL CORPORATION
    Inventors: Kyoung Chul KIM, Se Jin KIM, Jae Uk SIM
  • Publication number: 20080220375
    Abstract: In a method of reworking a substrate, an organic anti-reflection coating (ARC) layer is formed on the substrate having an amorphous carbon pattern. A photoresist pattern is formed on the organic ARC layer. The photoresist pattern is entirely exposed when the photoresist pattern has a selected level of defects, and then the photoresist pattern is removed by a developing process. The substrate may be reworked without damaging the organic ARC layer, and the amorphous carbon pattern may include an alignment key and/or an overlay key.
    Type: Application
    Filed: March 4, 2008
    Publication date: September 11, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Kyoung-Chul Kim, Bong-Chan Kim, In-Seak Hwang, Kwang-Wook Lee
  • Publication number: 20070298596
    Abstract: In a method of removing a photoresist pattern, a photoresist pattern may be formed on an object layer. Impurities may be implanted into the object layer by a first ion implantation process employing the first photoresist pattern as a first ion implantation mask. The photoresist pattern hardened by the first ion implantation process may be transformed into a first water-soluble photoresist pattern. The water-soluble photoresist pattern may be removed from the object layer.
    Type: Application
    Filed: June 15, 2007
    Publication date: December 27, 2007
    Inventors: Keum-Joo Lee, Kyoung-Chul Kim, Byoung-Yong Gwak
  • Publication number: 20060270241
    Abstract: In a method of removing a photoresist pattern from a substrate without deteriorating a lower electrode or increasing processing time, ozone gas may be provided onto a substrate on which a photoresist pattern may be formed. An oxidation-decomposition process may be carried out using the ozone gas, to thereby decompose the photoresist pattern on the substrate. The decomposed photoresist pattern may be dissolved into water and removed from the substrate in a rinsing process. Accordingly, a photoresist pattern in an opening having a relatively high aspect ratio may be sufficiently removed from a substrate without deteriorating the lower electrode or increasing processing time.
    Type: Application
    Filed: May 30, 2006
    Publication date: November 30, 2006
    Inventors: Kyoung-Chul Kim, Dae-Keun Kang, Se-Ho Cha, In-Seak Hwang, Keum-Joo Lee
  • Publication number: 20040242015
    Abstract: Etching compositions for selectively etching silicon germanium faster than other silicon containing compositions may be produced by controlling the ratios of de-ionized water used in the etching compositions with respect to the amounts of nitric acid, hydrofluoric acid, and/or acetic acid. Methods for selectively etching silicon germanium without damaging a silicon substrate or a silicon layer are possible using the etching compositions.
    Type: Application
    Filed: March 4, 2004
    Publication date: December 2, 2004
    Inventors: Kyoung-Chul Kim, Dong-Gun Park, Yong-Sun Ko, In-Seak Hwang, Byoung-Moon Yoon, Sung-Min Kim, Jeong-Dong Choe