Patents by Inventor Kyoung-hee HWANG

Kyoung-hee HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240186515
    Abstract: Provided are an electrolyte solution for a redox flow battery including an organic active material having improved solubility and potential and a redox flow battery using the same.
    Type: Application
    Filed: January 13, 2024
    Publication date: June 6, 2024
    Inventors: Seung Hae Hwang, Kyoung-hee Shin, Chang-soo Jin, Sun-hwa Yeon, Dong Ha Kim, Se-Kook Park
  • Patent number: 11996538
    Abstract: A method for preparing a positive electrode active material precursor includes preparing a metal aqueous solution including a nickel raw material, a cobalt raw material, and a manganese raw material (step 1); adding the metal aqueous solution, an ammonium cation complex forming agent, and a basic aqueous solution into a reactor, co-precipitating the mixture at pH 11 to less than pH 12 to form nuclei of first positive electrode active material precursor particles and growing the nuclei (step 2); adjusting input amount of the basic aqueous solution to increase the pH in the reactor to a range of 0.8 to 1.5 compared to that of step 2; and adjusting input amount of the basic aqueous solution to change the pH in the reactor to pH 11 to less than pH 12 (step 4). A positive electrode active material precursor prepared by the above preparation method has an improved packing density.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: May 28, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Cho Hee Hwang, Seong Bae Kim, Kyoung Wan Park, Eun Hee Kim
  • Publication number: 20180173199
    Abstract: Disclosed is an apparatus for protecting a copyright of a 3D object model and method therefor, the apparatus including: a first module generating an original 3D object model by combining voxels in a 3D space of X, Y, and Z axes; a second module calculating voxel lengths of the axes and based on a voxel length of a longest axis among the lengths, the second module extending lengths of the remaining axes, thereby obtaining a 3D space area; a third module generating an obfuscation unique key; a fourth module generating at least one rotation axis position, rotation voxel range, and rotation frequency based on the key; and a fifth module axially rotating at least one voxel structure included in each rotation voxel range at a rotation angle by each rotation frequency to distort a shape of the model, thereby performing obfuscation. Accordingly, the copyright can be effectively protected.
    Type: Application
    Filed: November 24, 2017
    Publication date: June 21, 2018
    Applicant: MARKANY INC.
    Inventors: Hyoung-jun KIM, Hong-joon HA, Mun-hee WON, Kyoung-hee HWANG, Jae-hong KIM, Jong-uk CHOI