Patents by Inventor Kyoung-jin Park

Kyoung-jin Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130250697
    Abstract: A semiconductor memory device and the operating method thereof use a low pass voltage to boost a channel of unselected cell strings during a program operation, and boost the channel of the cell string by using the GIDL phenomenon, thereby reducing a disturbance influence on the memory cells connected to the unselected cell strings due to a high pass voltage.
    Type: Application
    Filed: September 7, 2012
    Publication date: September 26, 2013
    Inventor: Kyoung Jin PARK
  • Patent number: 6988316
    Abstract: A manufacturing method of a fluid jetting apparatus, including: forming a heat driving part, a membrane, and a nozzle part; and forming a nozzle and jetting fluid chambers sequentially by using one nozzle plate, and assembling the heat driving part, the membrane, and the nozzle part, sequentially.
    Type: Grant
    Filed: December 6, 1999
    Date of Patent: January 24, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Soon-cheol Kweon, Byoung-chan Lee, Kyoung-jin Park
  • Patent number: 6557968
    Abstract: A fluid jetting apparatus for a print head employed in an output apparatus, and a manufacturing process thereof. The process for manufacturing a fluid jetting apparatus includes: (1) forming a heat driving part having a sacrificial layer; (2) forming a membrane on the heat driving part which includes the sacrificial layer; (3) forming a nozzle part on the membrane; and (4) removing the sacrificial layer. The step (1) further includes: (i) forming an electrode and an exothermic body on a substrate; (ii) laminating a working fluid barrier on the electrode and the exothermic body, and forming a working fluid chamber in the working fluid barrier; (iii) forming a protective layer on the working fluid barrier, the electrode, and the exothermic body; (iv) forming a sacrificial layer within the working fluid chamber at a same height as the working fluid barrier.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: May 6, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byoung-chan Lee, Soon-cheol Kweon, Kyoung-jin Park
  • Publication number: 20020089571
    Abstract: A fluid jetting apparatus for a print head employed in an output apparatus, and a manufacturing process thereof. The process for manufacturing a fluid jetting apparatus includes: (1) forming a heat driving part having a sacrificial layer; (2) forming a membrane on the heat driving part which includes the sacrificial layer; (3) forming a nozzle part on the membrane; and (4) removing the sacrificial layer. The step (1) further includes: (i) forming an electrode and an exothermic body on a substrate; (ii) laminating a working fluid barrier on the electrode and the exothermic body, and forming a working fluid chamber in the working fluid barrier; (iii) forming a protective layer on the working fluid barrier, the electrode, and the exothermic body; (iv) forming a sacrificial layer within the working fluid chamber at a same height as the working fluid barrier.
    Type: Application
    Filed: January 11, 2002
    Publication date: July 11, 2002
    Inventors: Byoung-chan Lee, Soon-cheol Kweon, Kyoung-jin Park
  • Patent number: 6367705
    Abstract: A fluid jetting apparatus for a print head employed in an output apparatus, and a manufacturing process thereof. The process for manufacturing a fluid jetting apparatus includes: (1) forming a heat driving part having a sacrificial layer; (2) forming a membrane on the heat driving part which includes the sacrificial layer; (3) forming a nozzle part on the membrane; and (4) removing the sacrificial layer. The step (1) further includes: (i) forming an electrode and an exothermic body on a substrate; (ii) laminating a working fluid barrier on the electrode and the exothermic body, and forming a working fluid chamber in the working fluid barrier; (iii) forming a protective layer on the working fluid barrier, the electrode, and the exothermic body; (iv) forming a sacrificial layer within the working fluid chamber at a same height as the working fluid barrier.
    Type: Grant
    Filed: December 6, 1999
    Date of Patent: April 9, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byoung-chan Lee, Soon-cheol Kweon, Kyoung-jin Park
  • Patent number: 6345884
    Abstract: An electrostatic attraction type inkjetting apparatus including aboard having an ink chamber for receiving ink and a nozzle hole extending from the ink chamber to the extreme end of the board and thus open at the extreme end of the board; a membrane laminated on the board; a lower electrode received in the ink chamber; and an upper electrode disposed on the outer surface of the membrane. By the electrostatic attraction generated during an electric potential difference application between the upper and lower electrodes, the membrane is deformed inward to the ink chamber to press the ink of the ink chamber. Thus, the ink is jetted outward through the nozzle hole. Since the membrane and the driving section are integrally formed with each other, the manufacturing process becomes simpler, and electrostatic attraction generation, and ink discharge are performed efficiently.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: February 12, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Seop Yoon, Hee-Kwon Ko, Kyoung-Jin Park