Abstract: A multilayer dry film resist includes two or more organic films which can be patterned; the multilayer dry film resist includes a base substrate, a first organic film disposed on the base substrate, and a second organic film disposed on the first organic film and including a photosensitizer.

Abstract: A display substrate includes a plurality of color filters formed on a base substrate, a gate line formed in a trench defined by at least one of the color filters and extended along a first direction, an insulation layer formed on the color filters and the gate line, a data line formed on the insulation layer to be extended along a second direction crossing the first direction, and pixel electrodes formed on the base substrate having the data line formed thereon.

Abstract: A display substrate includes a plurality of color filters, a gate line, an insulation layer, a data line and a plurality of pixel electrodes. The color filters are formed on a base substrate. The gate line is formed in a trench defined by at least one of the color filters and extended along a first direction. The insulation layer is formed on the color filters and the gate line. The data line is formed on the insulation layer to be extended along a second direction crossing the first direction. The pixel electrodes are formed on the base substrate having the data line formed thereon. Therefore, a metal wiring is formed in a trench defined by color filters, so that the resistance of the metal wiring may be decreased and an aperture ratio may be enhanced.

Abstract: A multilayer dry film resist includes two or more organic films which can be patterned; the multilayer dry film resist includes a base substrate, a first organic film disposed on the base substrate, and a second organic film disposed on the first organic film and including a photosensitizer.

Abstract: A display substrate includes gate lines and source lines, a passivation layer, a light shielding layer, an overcoat layer, and a column spacer. The passivation layer includes a first hole, partially exposing the metal layer. The passivation layer is formed on the substrate having the metal layer formed thereon. The light shielding layer overlaps the metal pattern and includes a positive photosensitive material on the passivation layer. The light shielding layer includes a second hole corresponding to the first hole. The overcoat layer includes a positive photosensitive material on the substrate having the light shielding layer thereon. The overcoat layer includes a third hole corresponding to the second hole. The column spacer is protruded from the overcoat layer corresponding to a portion of the light shielding layer. Accordingly, the number of the exposing mask used for manufacturing the display substrate may be reduced.